SLM Lithography: Printing to below K1=.30 without previous OPC processing

0 0.2 0.4 0.6 0.8 1 1.2

radius, normalised to the system aperture

Figure 5 Conversion of merit fences:
creates the distributions of
"white" and "black" points.
Resolution CDmin is determined
by the condition W>B of positive
intensity gap

-200

•100 0

coordinate, nm

100

200

300

Figure 7

Example of optimized CD linearity for 65nm mode: CDmin=81nm
X=248nm; final lens has NA=0.82 and 16% obscuration
Both S- and P- pupils are used

E

03

Q
O

-40

Example of optimized CD linearity for 45nm mode: CDmin=105nm X=248nm; final lens has NA=0.9 and 11% obscuration non-polarized pupil is used

o

t

QJ

Q
O

100 I8O11111

1000

Figure 9

CD target, nm