A process for coating the inside surfaces of silicon microflow devices, such as electrophoresis microchannels, with a low-stress, conformal (uniform) silicon nitride film which has the ability to uniformly coat deeply-recessed cavities with, for example, aspect ratios of up to 40:1 or higher. The silicon...http://www.google.co.uk/patents/US6562404?utm_source=gb-gplus-sharePatent US6562404 - Conformal chemically resistant coatings for microflow devices
