A system and method are provided for using an organic solvent to clean chamber parts used in semiconductor manufacturing. The chamber parts are exposed to the solvent using a dipping system or a vapor contact system in order to soften or dissolve the organic polymers. The solvent may be heated up to...http://www.google.co.uk/patents/US6607605?utm_source=gb-gplus-sharePatent US6607605 - Cleaning of semiconductor process equipment chamber parts using organic solvents
