Previously disclosed methods and devices are extended in this application by two-dimensional analysis of optical proximity interactions and by fashioning a computationally efficient kernel for rapid calculation of adjustments to be made. The computations can be made in realtime, whereby the use of OPC...http://www.google.co.uk/patents/US20070209029?utm_source=gb-gplus-sharePatent US20070209029 - SLM Lithography: Printing to below K1=.30 without previous OPC processing
