A method of depositing a ruthenium (Ru) thin film on a substrate includes: (i) treating a surface of the substrate with a metal-organic precursor; (ii) adsorbing a ruthenium precursor onto the treated surface of the substrate; (iii) treating the adsorbed ruthenium precursor with an excited reducing gas;...http://www.google.co.uk/patents/US20080124484?utm_source=gb-gplus-sharePatent US20080124484 - METHOD OF FORMING RU FILM AND METAL WIRING STRUCTURE
