A technique for creating an improved mask used in the semiconductor industry for replicating desired images in semiconductor bodies. The invention has application in both direct writing and blind writing processes and employs the steps of writing, in a sacrificial photoresist, a selected pattern of marks...http://www.google.co.uk/patents/US5424548?utm_source=gb-gplus-sharePatent US5424548 - Pattern specific calibration for E-beam lithography
