The present invention relates to methods and systems that define feature boundaries in a radiation sensitive medium on a workpiece using a diffraction-type micromirror array, extending to production of patterns and structures on a semiconductor substrate. Workpieces include lithographic masks, integrated...http://www.google.co.uk/patents/US20040053143?utm_source=gb-gplus-sharePatent US20040053143 - Methods and systems for improved boundary contrast
