This invention relates to a method and an apparatus for forming a film, which are suitable for forming a film of a semiconductor, dielectric, metal, insulator, or organic substance. In order to form a film of high purity and quality at high speed, a particle beam such as an ion beam, an electron beam,...http://www.google.co.uk/patents/US5064520?utm_source=gb-gplus-sharePatent US5064520 - Method and apparatus for forming a film
