A temperature control system 10 is used to control the temperature of a chamber surface 15, such as a convoluted external surface, of a process chamber 25 that is used to process a semiconductor substrate 30. The temperature control system 10 comprises a vapor chamber 100 that forms an enclosure adjoining...http://www.google.co.uk/patents/US6015465?utm_source=gb-gplus-sharePatent US6015465 - Temperature control system for semiconductor process chamber
