WO2008077100A3 - Systems and methods for creating inspection recipes - Google Patents
Systems and methods for creating inspection recipes Download PDFInfo
- Publication number
- WO2008077100A3 WO2008077100A3 PCT/US2007/088129 US2007088129W WO2008077100A3 WO 2008077100 A3 WO2008077100 A3 WO 2008077100A3 US 2007088129 W US2007088129 W US 2007088129W WO 2008077100 A3 WO2008077100 A3 WO 2008077100A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- design
- systems
- methods
- creating
- inspection
- Prior art date
Links
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/7065—Defects, e.g. optical inspection of patterned layer for defects
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
- G03F7/70525—Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure
Abstract
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009543184A JP5427609B2 (en) | 2006-12-19 | 2007-12-19 | Inspection recipe creation system and method |
IL198416A IL198416A0 (en) | 2006-12-19 | 2009-04-27 | Systems and methods for creating inspection recipes |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US87072406P | 2006-12-19 | 2006-12-19 | |
US60/870,724 | 2006-12-19 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2008077100A2 WO2008077100A2 (en) | 2008-06-26 |
WO2008077100A3 true WO2008077100A3 (en) | 2009-09-24 |
Family
ID=39402574
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2007/088129 WO2008077100A2 (en) | 2006-12-19 | 2007-12-19 | Systems and methods for creating inspection recipes |
Country Status (4)
Country | Link |
---|---|
US (1) | US7877722B2 (en) |
JP (2) | JP5427609B2 (en) |
IL (1) | IL198416A0 (en) |
WO (1) | WO2008077100A2 (en) |
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