WO2007061963A3 - Method of making an x-y axis dual-mass tuning fork gyroscope with vertically integrated electronics and wafer-scale hermetic packaging - Google Patents

Method of making an x-y axis dual-mass tuning fork gyroscope with vertically integrated electronics and wafer-scale hermetic packaging Download PDF

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Publication number
WO2007061963A3
WO2007061963A3 PCT/US2006/044919 US2006044919W WO2007061963A3 WO 2007061963 A3 WO2007061963 A3 WO 2007061963A3 US 2006044919 W US2006044919 W US 2006044919W WO 2007061963 A3 WO2007061963 A3 WO 2007061963A3
Authority
WO
WIPO (PCT)
Prior art keywords
wafer
making
tuning fork
vertically integrated
integrated electronics
Prior art date
Application number
PCT/US2006/044919
Other languages
French (fr)
Other versions
WO2007061963A2 (en
Inventor
Steven S Nasiri
Joseph Seeger
Martin Lim
Jr Anthony Francis Flannery
Alexander Castro
Original Assignee
Invensense Inc
Steven S Nasiri
Joseph Seeger
Martin Lim
Jr Anthony Francis Flannery
Alexander Castro
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Invensense Inc, Steven S Nasiri, Joseph Seeger, Martin Lim, Jr Anthony Francis Flannery, Alexander Castro filed Critical Invensense Inc
Priority to JP2008541409A priority Critical patent/JP5567272B2/en
Priority to KR1020087014745A priority patent/KR101105059B1/en
Priority to CN2006800489191A priority patent/CN101663586B/en
Publication of WO2007061963A2 publication Critical patent/WO2007061963A2/en
Publication of WO2007061963A3 publication Critical patent/WO2007061963A3/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01C—MEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
    • G01C19/00—Gyroscopes; Turn-sensitive devices using vibrating masses; Turn-sensitive devices without moving masses; Measuring angular rate using gyroscopic effects
    • G01C19/56—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01C—MEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
    • G01C19/00—Gyroscopes; Turn-sensitive devices using vibrating masses; Turn-sensitive devices without moving masses; Measuring angular rate using gyroscopic effects
    • G01C19/56—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces
    • G01C19/5607—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces using vibrating tuning forks
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01C—MEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
    • G01C19/00—Gyroscopes; Turn-sensitive devices using vibrating masses; Turn-sensitive devices without moving masses; Measuring angular rate using gyroscopic effects
    • G01C19/56—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces
    • G01C19/5705—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces using masses driven in reciprocating rotary motion about an axis
    • G01C19/5712—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces using masses driven in reciprocating rotary motion about an axis the devices involving a micromechanical structure
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01C—MEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
    • G01C19/00—Gyroscopes; Turn-sensitive devices using vibrating masses; Turn-sensitive devices without moving masses; Measuring angular rate using gyroscopic effects
    • G01C19/56—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces
    • G01C19/5719—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces using planar vibrating masses driven in a translation vibration along an axis
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01C—MEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
    • G01C19/00—Gyroscopes; Turn-sensitive devices using vibrating masses; Turn-sensitive devices without moving masses; Measuring angular rate using gyroscopic effects
    • G01C19/56—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces
    • G01C19/5719—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces using planar vibrating masses driven in a translation vibration along an axis
    • G01C19/5733—Structural details or topology
    • G01C19/574—Structural details or topology the devices having two sensing masses in anti-phase motion

Abstract

A dual-axis sensor for measuring X and Y components of angular velocity in an X-Y sensor plane is provided. The dual-axis sensor includes a first subsensor for measuring the X component of angular velocity, and a second subsensor for measuring the Y component of angular velocity. The first subsensor and the second subsensor are contained within a single hermetic seal within the dual-axis sensor.
PCT/US2006/044919 2005-11-18 2006-11-17 Method of making an x-y axis dual-mass tuning fork gyroscope with vertically integrated electronics and wafer-scale hermetic packaging WO2007061963A2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2008541409A JP5567272B2 (en) 2005-11-18 2006-11-17 XY-axis double mass tuning fork gyroscope manufacturing method by vertically integrated electronic equipment and wafer scale hermetic sealing
KR1020087014745A KR101105059B1 (en) 2005-11-18 2006-11-17 Method of making an x-y axis dual-mass tuning fork gyroscope with vertically integrated electronics and wafer-scale hermetic packaging
CN2006800489191A CN101663586B (en) 2005-11-18 2006-11-17 Method of making an x-y axis dual-mass tuning fork gyroscope with vertically integrated electronics and wafer-scale hermetic packaging

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/283,083 2005-11-18
US11/283,083 US7458263B2 (en) 2003-10-20 2005-11-18 Method of making an X-Y axis dual-mass tuning fork gyroscope with vertically integrated electronics and wafer-scale hermetic packaging

Publications (2)

Publication Number Publication Date
WO2007061963A2 WO2007061963A2 (en) 2007-05-31
WO2007061963A3 true WO2007061963A3 (en) 2009-05-07

Family

ID=38067829

Family Applications (2)

Application Number Title Priority Date Filing Date
PCT/US2006/044919 WO2007061963A2 (en) 2005-11-18 2006-11-17 Method of making an x-y axis dual-mass tuning fork gyroscope with vertically integrated electronics and wafer-scale hermetic packaging
PCT/IB2009/005063 WO2009130554A2 (en) 2005-11-18 2009-02-05 X-y axis dual-mass tuning fork gyroscope with vertically integrated electronics and wafer-scale hermetic packaging

Family Applications After (1)

Application Number Title Priority Date Filing Date
PCT/IB2009/005063 WO2009130554A2 (en) 2005-11-18 2009-02-05 X-y axis dual-mass tuning fork gyroscope with vertically integrated electronics and wafer-scale hermetic packaging

Country Status (5)

Country Link
US (1) US7458263B2 (en)
JP (1) JP5567272B2 (en)
KR (1) KR101105059B1 (en)
CN (1) CN101663586B (en)
WO (2) WO2007061963A2 (en)

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WO2009130554A3 (en) 2010-01-14
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KR101105059B1 (en) 2012-01-17
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US7458263B2 (en) 2008-12-02
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