WO2007025013A3 - Nanoscale optical microscope - Google Patents

Nanoscale optical microscope Download PDF

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Publication number
WO2007025013A3
WO2007025013A3 PCT/US2006/033023 US2006033023W WO2007025013A3 WO 2007025013 A3 WO2007025013 A3 WO 2007025013A3 US 2006033023 W US2006033023 W US 2006033023W WO 2007025013 A3 WO2007025013 A3 WO 2007025013A3
Authority
WO
WIPO (PCT)
Prior art keywords
nanoscale optical
optical microscope
dielectric material
nanoscale
inner conductor
Prior art date
Application number
PCT/US2006/033023
Other languages
French (fr)
Other versions
WO2007025013A2 (en
Inventor
Michael J Naughton
Krzysztof J Kempa
Zhifeng Ren
Original Assignee
Trustees Boston College
Michael J Naughton
Krzysztof J Kempa
Zhifeng Ren
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Trustees Boston College, Michael J Naughton, Krzysztof J Kempa, Zhifeng Ren filed Critical Trustees Boston College
Publication of WO2007025013A2 publication Critical patent/WO2007025013A2/en
Publication of WO2007025013A3 publication Critical patent/WO2007025013A3/en

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216Mask projection systems
    • G03F7/70325Resolution enhancement techniques not otherwise provided for, e.g. darkfield imaging, interfering beams, spatial frequency multiplication, nearfield lenses or solid immersion lenses
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00Nanooptics, e.g. quantum optics or photonic crystals
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216Mask projection systems
    • G03F7/70275Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216Mask projection systems
    • G03F7/70308Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01QSCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q60/00Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
    • G01Q60/18SNOM [Scanning Near-Field Optical Microscopy] or apparatus therefor, e.g. SNOM probes
    • G01Q60/22Probes, their manufacture, or their related instrumentation, e.g. holders
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B2207/00Coding scheme for general features or characteristics of optical elements and systems of subclass G02B, but not including elements and systems which would be classified in G02B6/00 and subgroups
    • G02B2207/101Nanooptics
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S385/00Optical waveguides
    • Y10S385/902Nonbundle fiberscope devices

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Engineering & Computer Science (AREA)
  • Biophysics (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Measuring Leads Or Probes (AREA)

Abstract

Nanoscale optical probes for use with nanoscale optical microscopy are disclosed herein. A nanoscale optical probe (200) for use with a near-field scanning optical microscope includes an inner conductor (230) having a top end, a bottom end, and a body; a dielectric material (240) engaging the inner conductor (230); and an outer conductor (250) engaging the dielectric material (240), wherein the inner conductor (230) is longer at a tip surface (210) of the probe (200) than the dielectric material (240) and the outer conductor (250).
PCT/US2006/033023 2005-08-24 2006-08-24 Nanoscale optical microscope WO2007025013A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US71100305P 2005-08-24 2005-08-24
US60/711,003 2005-08-24

Publications (2)

Publication Number Publication Date
WO2007025013A2 WO2007025013A2 (en) 2007-03-01
WO2007025013A3 true WO2007025013A3 (en) 2007-10-11

Family

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Family Applications (2)

Application Number Title Priority Date Filing Date
PCT/US2006/033010 WO2007025004A2 (en) 2005-08-24 2006-08-24 Apparatus and methods for nanolithography using nanoscale optics
PCT/US2006/033023 WO2007025013A2 (en) 2005-08-24 2006-08-24 Nanoscale optical microscope

Family Applications Before (1)

Application Number Title Priority Date Filing Date
PCT/US2006/033010 WO2007025004A2 (en) 2005-08-24 2006-08-24 Apparatus and methods for nanolithography using nanoscale optics

Country Status (2)

Country Link
US (2) US7634162B2 (en)
WO (2) WO2007025004A2 (en)

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