WO2007025004A3 - Apparatus and methods for nanolithography using nanoscale optics - Google Patents

Apparatus and methods for nanolithography using nanoscale optics Download PDF

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Publication number
WO2007025004A3
WO2007025004A3 PCT/US2006/033010 US2006033010W WO2007025004A3 WO 2007025004 A3 WO2007025004 A3 WO 2007025004A3 US 2006033010 W US2006033010 W US 2006033010W WO 2007025004 A3 WO2007025004 A3 WO 2007025004A3
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WO
WIPO (PCT)
Prior art keywords
film
nanolithography
methods
nanoscale optics
carbon nanotubes
Prior art date
Application number
PCT/US2006/033010
Other languages
French (fr)
Other versions
WO2007025004A2 (en
Inventor
Krzysztof J Kempa
Michael J Naughton
Zhifeng Ren
Jakub A Rybczynski
Original Assignee
Trustees Boston College
Krzysztof J Kempa
Michael J Naughton
Zhifeng Ren
Jakub A Rybczynski
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Trustees Boston College, Krzysztof J Kempa, Michael J Naughton, Zhifeng Ren, Jakub A Rybczynski filed Critical Trustees Boston College
Publication of WO2007025004A2 publication Critical patent/WO2007025004A2/en
Publication of WO2007025004A3 publication Critical patent/WO2007025004A3/en

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216Mask projection systems
    • G03F7/70325Resolution enhancement techniques not otherwise provided for, e.g. darkfield imaging, interfering beams, spatial frequency multiplication, nearfield lenses or solid immersion lenses
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00Nanooptics, e.g. quantum optics or photonic crystals
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216Mask projection systems
    • G03F7/70275Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216Mask projection systems
    • G03F7/70308Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01QSCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q60/00Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
    • G01Q60/18SNOM [Scanning Near-Field Optical Microscopy] or apparatus therefor, e.g. SNOM probes
    • G01Q60/22Probes, their manufacture, or their related instrumentation, e.g. holders
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B2207/00Coding scheme for general features or characteristics of optical elements and systems of subclass G02B, but not including elements and systems which would be classified in G02B6/00 and subgroups
    • G02B2207/101Nanooptics
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S385/00Optical waveguides
    • Y10S385/902Nonbundle fiberscope devices

Abstract

An apparatus and methods for nanolithography using nanoscale optics are disclosed herein. Submicron-scale structures may be obtained using standard photolithography systems (710) with a de-magnifying lens (600). A de-magnifying lens (600) for use in a standard photolithography system (710) includes a film (670) having a top surface (610), a bottom surface (620) and a plurality of cylindrical channels (160) containing a dielectric material (280); and an array of carbon nanotubes (640) penetrating the film (670) through the plurality of cylindrical channels (160), wherein an image on the top surface (610) of the film (670) is converted into a de-magnified image on the bottom surface (620) of the film (670) by the carbon nanotubes (640).
PCT/US2006/033010 2005-08-24 2006-08-24 Apparatus and methods for nanolithography using nanoscale optics WO2007025004A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US71100305P 2005-08-24 2005-08-24
US60/711,003 2005-08-24

Publications (2)

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WO2007025004A2 WO2007025004A2 (en) 2007-03-01
WO2007025004A3 true WO2007025004A3 (en) 2007-04-19

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PCT/US2006/033023 WO2007025013A2 (en) 2005-08-24 2006-08-24 Nanoscale optical microscope
PCT/US2006/033010 WO2007025004A2 (en) 2005-08-24 2006-08-24 Apparatus and methods for nanolithography using nanoscale optics

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PCT/US2006/033023 WO2007025013A2 (en) 2005-08-24 2006-08-24 Nanoscale optical microscope

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US (2) US7634162B2 (en)
WO (2) WO2007025013A2 (en)

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