WO2006074106A3 - A system capable of determining applied and anodized coating thickness of a coated-anodized product - Google Patents

A system capable of determining applied and anodized coating thickness of a coated-anodized product Download PDF

Info

Publication number
WO2006074106A3
WO2006074106A3 PCT/US2005/047585 US2005047585W WO2006074106A3 WO 2006074106 A3 WO2006074106 A3 WO 2006074106A3 US 2005047585 W US2005047585 W US 2005047585W WO 2006074106 A3 WO2006074106 A3 WO 2006074106A3
Authority
WO
WIPO (PCT)
Prior art keywords
anodized
coating thickness
radiation
coated
system capable
Prior art date
Application number
PCT/US2005/047585
Other languages
French (fr)
Other versions
WO2006074106A2 (en
Inventor
Joseph K Price
Original Assignee
Sensory Analytics
Joseph K Price
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sensory Analytics, Joseph K Price filed Critical Sensory Analytics
Priority to JP2007550408A priority Critical patent/JP2008527173A/en
Priority to CA002594331A priority patent/CA2594331A1/en
Publication of WO2006074106A2 publication Critical patent/WO2006074106A2/en
Publication of WO2006074106A3 publication Critical patent/WO2006074106A3/en

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/02Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0675Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating using interferometry
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/005Apparatus specially adapted for electrolytic conversion coating
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02Anodisation
    • C25D11/022Anodisation on selected surface areas
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00Processes for servicing or operating cells for electrolytic coating
    • C25D21/12Process control or regulation
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/02Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0683Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating measurement during deposition or removal of the layer
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/35Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
    • G01N21/3563Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light for analysing solids; Preparation of samples therefor
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/8422Investigating thin films, e.g. matrix isolation method

Abstract

A system for forming an anodized coating on at least a portion of a substrate thereby creating an anodized substrate is disclosed. The system includes a bath, a coating thickness monitor, at least one probe and at least one controller. The coating thickness monitor includes at least one radiation source directed at at least a portion of the anodized substrate; at least one probe for capturing at least a portion of the radiation reflected and refracted by the anodized coating on the anodized substrate, the captured radiation being at least a portion of the radiation directed the anodized substrate from the radiation source; and at least one detector in communication with the at least one probe, the at least one detector capable of processing the captured radiation to allow a determination of at least the thickness.
PCT/US2005/047585 2005-01-07 2005-12-30 A system capable of determining applied and anodized coating thickness of a coated-anodized product WO2006074106A2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2007550408A JP2008527173A (en) 2005-01-07 2005-12-30 Coating anodized product coating and anodized coating thickness measurement system
CA002594331A CA2594331A1 (en) 2005-01-07 2005-12-30 A system capable of determining applied and anodized coating thickness of a coated-anodized product

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/031,967 2005-01-07
US11/031,967 US7365860B2 (en) 2000-12-21 2005-01-07 System capable of determining applied and anodized coating thickness of a coated-anodized product

Publications (2)

Publication Number Publication Date
WO2006074106A2 WO2006074106A2 (en) 2006-07-13
WO2006074106A3 true WO2006074106A3 (en) 2006-10-12

Family

ID=36218538

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2005/047585 WO2006074106A2 (en) 2005-01-07 2005-12-30 A system capable of determining applied and anodized coating thickness of a coated-anodized product

Country Status (4)

Country Link
US (1) US7365860B2 (en)
JP (1) JP2008527173A (en)
CA (1) CA2594331A1 (en)
WO (1) WO2006074106A2 (en)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6674533B2 (en) * 2000-12-21 2004-01-06 Joseph K. Price Anodizing system with a coating thickness monitor and an anodized product
US20060177566A1 (en) * 2005-01-07 2006-08-10 Price Joseph K Anodizing system with a coating thickness monitor and an anodized product
US7147634B2 (en) 2005-05-12 2006-12-12 Orion Industries, Ltd. Electrosurgical electrode and method of manufacturing same
US8814861B2 (en) 2005-05-12 2014-08-26 Innovatech, Llc Electrosurgical electrode and method of manufacturing same
JP4762702B2 (en) * 2005-12-08 2011-08-31 富士フイルム株式会社 Plating thickness monitor device and plating stop device
GB0525021D0 (en) * 2005-12-08 2006-01-18 Scalar Technologies Ltd Coating thickness gauge
US20070222460A1 (en) * 2006-03-07 2007-09-27 Price Joseph K Mobile apparatus capable of surface measurements
BR112012029474A2 (en) * 2010-05-19 2017-01-24 Sharp Kk matrix inspection method
KR101233687B1 (en) * 2010-10-28 2013-02-15 삼성디스플레이 주식회사 Apparatus of etching a glass substrate
US9617652B2 (en) * 2012-12-11 2017-04-11 Lam Research Corporation Bubble and foam solutions using a completely immersed air-free feedback flow control valve
CN104535000A (en) * 2014-12-18 2015-04-22 陕西科技大学 Leather thickness measuring device based on FBG sensors
US11125549B2 (en) 2016-01-07 2021-09-21 Arkema Inc. Optical intensity method to measure the thickness of coatings deposited on substrates
MX2018008315A (en) 2016-01-07 2018-12-06 Arkema Inc Optical method to measure the thickness of coatings deposited on substrates.
WO2017120161A1 (en) 2016-01-07 2017-07-13 Arkema Inc. Object position independent method to measure the thickness of coatings deposited on curved objects moving at high rates
GB201704447D0 (en) * 2017-03-21 2017-05-03 Asterope Ltd Wire coating determination
CA3069855C (en) 2017-07-12 2021-08-10 Sensory Analytics, Llc Methods and systems for real-time, in-process measurement of coatings on metal substrates using optical systems
WO2020106590A1 (en) 2018-11-19 2020-05-28 Lam Research Corporation Cross flow conduit for foaming prevention in high convection plating cells

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5291269A (en) * 1991-12-06 1994-03-01 Hughes Aircraft Company Apparatus and method for performing thin film layer thickness metrology on a thin film layer having shape deformations and local slope variations
EP0601580A1 (en) * 1992-12-10 1994-06-15 Hughes Aircraft Company Apparatus and method for measuring the thickness of thin films
US5337150A (en) * 1992-08-04 1994-08-09 Hughes Aircraft Company Apparatus and method for performing thin film layer thickness metrology using a correlation reflectometer
US6128081A (en) * 1996-11-22 2000-10-03 Perceptron, Inc. Method and system for measuring a physical parameter of at least one layer of a multilayer article without damaging the article and sensor head for use therein
US20020112967A1 (en) * 2000-12-21 2002-08-22 Price Joseph K. Anodizing system with a coating thickness monitor and an anodized product

Family Cites Families (47)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3328774A (en) * 1963-02-04 1967-06-27 Louvel Bernard Automatic programming in the utilization of a variable electrical response
US4396976A (en) * 1972-09-11 1983-08-02 Hyatt Gilbert P System for interfacing a computer to a machine
US3959091A (en) * 1973-12-14 1976-05-25 The Boeing Company Method of anodizing titanium to promote adhesion
JPS5334107B2 (en) * 1974-04-23 1978-09-19
US4068156A (en) * 1977-03-01 1978-01-10 Martin Marietta Corporation Rate control system for manipulator arms
US4251330A (en) * 1978-01-17 1981-02-17 Alcan Research And Development Limited Electrolytic coloring of anodized aluminium by means of optical interference effects
JPS5950474B2 (en) * 1979-06-30 1984-12-08 ファナック株式会社 industrial robot
US4344127A (en) * 1980-08-28 1982-08-10 The Bendix Corporation Microprocessor based process control system
US4417845A (en) * 1981-05-29 1983-11-29 Rimrock Corporation Programmable positioning and operating mechanism for industrial operating head
US4478689A (en) * 1981-07-31 1984-10-23 The Boeing Company Automated alternating polarity direct current pulse electrolytic processing of metals
US4555767A (en) * 1982-05-27 1985-11-26 International Business Machines Corporation Method and apparatus for measuring thickness of epitaxial layer by infrared reflectance
FR2528189B1 (en) * 1982-06-04 1985-07-26 Ropelato Michel MODULAR DEVICE FOR STEERING INDUSTRIAL PROCESSES
JPS59222098A (en) * 1983-05-30 1984-12-13 Kanaasu Data Kk Electric device drive control system
US4537664A (en) * 1984-04-06 1985-08-27 Sprague Electric Company Method for continuously monitoring oxide thickness on moving aluminum foil
JPS6176904A (en) 1984-09-21 1986-04-19 Oak Seisakusho:Kk Method for measuring film thickness
US4777603A (en) * 1985-03-08 1988-10-11 Cybermation, Inc. Controller for multiple-axis machine
DE3526553A1 (en) * 1985-07-25 1987-01-29 Zeiss Carl Fa REMISSION MEASURING DEVICE FOR CONTACTLESS MEASUREMENT
DE3701721A1 (en) * 1987-01-22 1988-08-04 Zeiss Carl Fa REMISSION MEASURING DEVICE FOR CONTACTLESS MEASUREMENT
US4748329A (en) * 1987-02-17 1988-05-31 Canadian Patents And Development Ltd. Method for on-line thickness monitoring of a transparent film
DE3707331A1 (en) * 1987-03-07 1988-09-15 Zeiss Carl Fa INTERFEROMETER FOR MEASURING OPTICAL PHASE DIFFERENCES
DE8704679U1 (en) * 1987-03-30 1987-05-27 Fa. Carl Zeiss, 7920 Heidenheim, De
US4979093A (en) * 1987-07-16 1990-12-18 Cavro Scientific Instruments XYZ positioner
US4835710A (en) * 1987-07-17 1989-05-30 Cincinnati Milacron Inc. Method of moving and orienting a tool along a curved path
JPH0252205A (en) * 1988-08-17 1990-02-21 Dainippon Screen Mfg Co Ltd Film thickness measuring method
US5042949A (en) * 1989-03-17 1991-08-27 Greenberg Jeffrey S Optical profiler for films and substrates
US5586275A (en) * 1989-05-04 1996-12-17 Texas Instruments Incorporated Devices and systems with parallel logic unit operable on data memory locations, and methods
US4894127A (en) * 1989-05-24 1990-01-16 The Boeing Company Method for anodizing aluminum
US5289266A (en) 1989-08-14 1994-02-22 Hughes Aircraft Company Noncontact, on-line determination of phosphate layer thickness and composition of a phosphate coated surface
US5351200A (en) * 1991-11-22 1994-09-27 Westinghouse Electric Corporation Process facility monitor using fuzzy logic
GB9211539D0 (en) * 1992-06-01 1992-07-15 Ducost Eng Ltd Control of paint spraying machines and the like
JPH074922A (en) 1993-06-21 1995-01-10 Jasco Corp Apparatus and method for measurement of film thickness of semiconductor multilayer thin film
JP2840181B2 (en) 1993-08-20 1998-12-24 大日本スクリーン製造株式会社 Method for measuring film thickness of multilayer film sample
US5452953A (en) * 1993-10-12 1995-09-26 Hughes Aircraft Company Film thickness measurement of structures containing a scattering surface
CH689395A5 (en) * 1995-03-16 1999-03-31 Alusuisse Lonza Services Ag Process for the continuous anodic oxidation of strip or wire of aluminum.
US5691897A (en) * 1995-05-30 1997-11-25 Roy-G-Biv Corporation Motion control systems
JP2853615B2 (en) * 1995-08-09 1999-02-03 富士ゼロックス株式会社 Apparatus and method for evaluating electrophotographic photoreceptor, apparatus and method for manufacturing electrophotographic photoreceptor
JPH09243556A (en) * 1996-03-11 1997-09-19 Sharp Corp Apparatus and method for inspecting metal oxide
DE19615366B4 (en) * 1996-04-19 2006-02-09 Carl Zeiss Jena Gmbh Method and device for detecting physical, chemical, biological or biochemical reactions and interactions
JP3705457B2 (en) * 1996-07-02 2005-10-12 富士写真フイルム株式会社 Method for anodizing aluminum material
KR100202064B1 (en) * 1996-08-31 1999-06-15 전주범 Ice tray removing apparatus of ice maker
US5726912A (en) * 1996-09-06 1998-03-10 Honeywell Iac Control system monitor
US5872892A (en) * 1997-02-03 1999-02-16 Motoman, Inc. Process and apparatus for imparting linear motion to tooling attached to the end of a manipulator device having two different length arms
US5980078A (en) * 1997-02-14 1999-11-09 Fisher-Rosemount Systems, Inc. Process control system including automatic sensing and automatic configuration of devices
US6278809B1 (en) * 1997-05-30 2001-08-21 Ion Optics, Inc. Fiber optic reflectance apparatus for in situ characterization of thin films
JP3357596B2 (en) * 1998-03-05 2002-12-16 インターナショナル・ビジネス・マシーンズ・コーポレーション Film deposition apparatus and method for measuring film thickness in-situ in film deposition process
US6052191A (en) * 1998-10-13 2000-04-18 Northrop Grumman Corporation Coating thickness measurement system and method of measuring a coating thickness
US6038027A (en) * 1998-10-29 2000-03-14 Eastman Kodak Company Method for measuring material thickness profiles

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5291269A (en) * 1991-12-06 1994-03-01 Hughes Aircraft Company Apparatus and method for performing thin film layer thickness metrology on a thin film layer having shape deformations and local slope variations
US5337150A (en) * 1992-08-04 1994-08-09 Hughes Aircraft Company Apparatus and method for performing thin film layer thickness metrology using a correlation reflectometer
EP0601580A1 (en) * 1992-12-10 1994-06-15 Hughes Aircraft Company Apparatus and method for measuring the thickness of thin films
US6128081A (en) * 1996-11-22 2000-10-03 Perceptron, Inc. Method and system for measuring a physical parameter of at least one layer of a multilayer article without damaging the article and sensor head for use therein
US20020112967A1 (en) * 2000-12-21 2002-08-22 Price Joseph K. Anodizing system with a coating thickness monitor and an anodized product
US20040231993A1 (en) * 2000-12-21 2004-11-25 Price Joseph K. Anodizing system with a coating thickness monitor and an anodized product

Also Published As

Publication number Publication date
US20050196522A1 (en) 2005-09-08
US7365860B2 (en) 2008-04-29
WO2006074106A2 (en) 2006-07-13
JP2008527173A (en) 2008-07-24
CA2594331A1 (en) 2006-07-13

Similar Documents

Publication Publication Date Title
WO2006074106A3 (en) A system capable of determining applied and anodized coating thickness of a coated-anodized product
WO2008067528A3 (en) Molecular interferometric imaging process and apparatus
WO2006127190A3 (en) Use of optical skin measurements to determine cosmetic skin properties
WO2011016892A3 (en) Range imaging lidar
WO2009131892A3 (en) Methods and apparatus for measuring substrate edge thickness during polishing
TW200625496A (en) Patterned wafer thickness detection system
MX2009006226A (en) Method and system for measuring an object.
WO2007095119A3 (en) Methods and systems for simultaneous real-time monitoring of optical signals from multiple sources
WO2007103304A3 (en) A mobile apparatus capable of surface measurements of a coating thickness
ATE556397T1 (en) SENSOR FOR PRESENCE DETECTION
WO2006074412A3 (en) Anodizing system with a coating thickness monitor and an anodized product
WO2012158279A3 (en) Reconfigurable spectroscopic ellipsometer
EP1939931A3 (en) Method and apparatus for integrating metrology with etch processing
WO2006116356A3 (en) Method and apparatus for measuring dimensional changes in transparent substrates
MX2012003227A (en) Methods and devices for classifying objects.
WO2010065477A3 (en) A method for rotating an object attached to a surface of a substrate
TW200629365A (en) Substrate transfer and processing apparatus, obstacle measure method in substrate transfer and processing apparatus and program for an obstacle measure in the substrate transfer and processing apparatus
EA201000088A1 (en) OPTICAL CUVETA
WO2012051222A3 (en) Coordinate fusion and thickness calibration for semiconductor wafer edge inspection
EP1693141A3 (en) Arrangement and process for localised temperature measurement in a laser treatment process
WO2009143131A3 (en) Mobile frame structure with passive/active sensor arrays for non-invasive identification of hazardous materials
EP2722714A3 (en) Detection device, exposure apparatus and device manufacturing method using such an exposure apparatus
WO2009096592A3 (en) Information processing apparatus and method
WO2014029839A3 (en) Optoelectronic device
WO2008116767A3 (en) A motion classification device

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application
ENP Entry into the national phase

Ref document number: 2594331

Country of ref document: CA

WWE Wipo information: entry into national phase

Ref document number: 2007550408

Country of ref document: JP

NENP Non-entry into the national phase

Ref country code: DE

32PN Ep: public notification in the ep bulletin as address of the adressee cannot be established

Free format text: NOTING OF LOSS OF RIGHTS PURSUANT TO RULE 112(1) EPC DATED 26.09.2007 AND 23.01.2008

122 Ep: pct application non-entry in european phase

Ref document number: 05856058

Country of ref document: EP

Kind code of ref document: A2