WO2006021506A1

WO2006021506A1 - Reactor for producing surface reactions, whereby the reaction opening has a certain geometry, and use of the same

Info

Publication number: WO2006021506A1
Application number: PCT/EP2005/053897
Authority: WO
Inventors: Ursus KRÜGER; Raymond Ullrich; Gabriele Winkler
Original assignee: Siemens Aktiengesellschaft
Priority date: 2004-08-26
Filing date: 2005-08-08
Publication date: 2006-03-02
Also published as: DE102004041812A1

Abstract

The invention relates to a reactor for producing reactions on a surface (17) of a substrate (16). Such reactors are already used for a so-called screening of the optimum reaction conditions for the surface reaction. The reactors comprise a plate (12) with a reaction chamber (20) into which a reaction medium can be filled. The reaction with the surface (17) of a substrate (16) then takes place in a reaction opening (18). According to the invention, the reaction opening (18) has a geometry which allows to produce a structure of the surface determining the function of the substrate. Therefore, the inventive reactor can be used in the series production of structured substrates so that there is no longer any need for coating the substrates with masks. The invention also relates to the use of the reactor, which is characterized in that the geometry of the reaction opening is adapted to the structure to be produced, thereby allowing to structure the surface.

Description

description

REACTOR FOR PRODUCING SURFACE REACTIONS WHERE THE REACTION OPENING HAS A PARTICULAR GEOMETRY AND USE THEREOF

The invention relates to a reactor for producing reactions on a surface of a substrate, comprising a surface-adapted plate having at least one reaction space, which is open to the surface and thus forms a reaction opening for the attack of a reaction medium on the surface, and a seal for the plate towards the surface, which runs along the edge of the reaction opening.

A reactor of the aforementioned type is described, for example, in US Pat. No. 6,605,258 B2 and has a plate with an array of reaction spaces designed as bores for carrying out a so-called surface reaction screening. This plate may have a sealing mat which corresponds with the reaction spaces

Has reaction openings, brought into contact with a surface and filled to carry out the screening with reaction media. The screening consists in determining the optimal process parameters for the reactions taking place on the surface, whereby different compositions of the reaction medium as well as other process parameters (pressure, temperature, reaction time, etc.) can be tried simultaneously. By the parallelization in the execution of the test reactions optimal test parameters for the relevant

Reaction can be determined in a short time (so-called high throughput screening). The object of the invention is to provide a reactor for surface reactions, with which new ways of optimizing the process of surface treatment by means of the reactions to be carried out can be found.

This object is achieved in that the reaction opening is formed in its geometry with respect to the preparation of a function of the substrate-defining structuring of the surface by the reaction medium. Thus, according to the invention, the reactor is not used to find optimal process parameters for the surface reaction, but rather to produce a structuring of the surface which is determined by the geometry of the reaction orifice. The

Structuring of the surface is determined here by the topography or the properties of the surface of the substrate or the near-surface layers of the substrate. Advantageously, therefore, by applying the reactor according to the invention an application of layered masks can be omitted. Thus, the effort can be saved, which would be associated with a structuring of these mask layers or with the removal of the mask layer after structuring of the surface of the substrate. Instead of the ever renewed production of mask layers on the substrates to be produced, the outlay for the construction and production of the reactor according to the invention is incurred only once. As a result, after a single production of the reactor in the production of substrates to be structured manufacturing and material costs can be saved, which has an advantageous effect on their economics, especially in large numbers of substrates to be structured. According to one embodiment of the invention, electrodes may be provided in the reaction space, in the electrical influence region of which at least part of the reaction opening lies. Through the electrodes can be in the

Reaction medium generate potentials that can influence the reactions on the surface. In particular, this can be used to influence or apply electrochemical processes.

By extending the electrical influence region of the electrodes to only a part of the reaction opening, heterogeneous reaction conditions on the surface of the substrate to be patterned can furthermore advantageously be produced, whereby a single production step can be used

Structuring can be produced with locally changing properties. In addition, it is advantageously possible to influence the reaction conditions at the reaction openings even after production of the reactor by providing additional electrodes, whereby the patterning process at the reaction opening can be optimized. Of course, other devices influencing the structuring reaction can also be integrated in the reactor. These may consist, for example, in a heating or cooling device or, for example, in a gas feed for the most liquid reaction medium.

According to a particular embodiment of the invention it is provided that the seal for the plate of a

Sealing mat is made, which rests with its one side on the plate and the other side forms a sealing surface for the surface, wherein the reaction opening the sealing surface breaks through. A sealing mat is advantageous particularly easy to manufacture. The reaction openings can be easily punched or cut into the mat. The sealing mat itself is advantageously made of an elastic material which, like the plate with the reaction spaces must be resistant to the reaction media used.

It is also particularly advantageous if the plate is formed with a continuous channel system as the reaction space, which has a filling opening for the reaction medium and is in communication with all the reaction openings in the sealing mat. As a result, it is advantageously possible to design the plate as a standard component, wherein the coherent channel system can then be filled via a standardized filling opening. The connections to the reaction openings in the sealing mat can be ensured by providing the interface of the plate with the sealing mat at regular intervals with connecting openings. The connection openings thus form an array on the interface of the plate with the sealing mat, which specifies a type of grid for the smallest possible reaction openings in the sealing mat which can be supplied with reaction medium. The reaction openings in the sealing mat can then be advantageously designed depending on the application, as long as it is ensured that the reaction openings in the sealing mat corresponds at least to one of the connection openings.

The execution of the plate of the reactor as a standard component thus has the great advantage that it can be used for different reactions. For different structuring then only different Produce sealing mats, the associated production cost advantageously very low. It is also conceivable that a multi-step structuring is performed by using multiple mats, each of which can be associated with the same plate.

Furthermore, the invention relates to the use of a reactor for generating reactions on a surface of a substrate, comprising a surface-adapted plate having at least one reaction space which is open to the surface and thus a reaction opening for the attack of a reaction medium on the surface forms and a seal for the plate towards the surface, which runs along the edge of the reaction opening. The design of the reactor used is known and described for example in the aforementioned US 6,605,258 B2.

To achieve the above object, a use of a reactor is provided, such that by the reaction medium, a structuring of the surface determining the function of the substrate is produced by the geometry of the reaction opening being adapted to the structuring to be produced. Unlike in accordance with the cited prior art, designing the reactor such that a multiplicity of reactions taking place independently of one another can take place with different experimental parameters, the geometry of the reaction opening is designed to a specific structuring result. The use of the

Reactor can then be done in series production, so that the always repainting of the substrates to be patterned with suitable mask layers can be omitted. Instead, the reactor is repeatedly placed on the substrates to be patterned, whereby, as already mentioned, the productivity in the production of the structured substrates can be improved.

Embodiments of the inventive use provide that the reactor is placed on a substrate of silicon and the substrate is structured in the region of the reaction opening by generating porous silicon or that the surface of the substrate is removed in the region of the reaction opening to form the structuring or a Coating takes place. The structuring processes can thus be adapted advantageously to the application, whereby all methods normally available for structuring by means of mask coatings can be used. Complex structuring processes can advantageously be carried out in several steps by multiple use of the reactor.

As a coating method, for example, the electrochemical coating for the production of printed conductors is considered. As an ablation process, for example, the anisotropic etching of so-called V-pits in silicon can be mentioned. The production of porous silicon opens all known uses for such structured areas (use as biosensor, viable porous silicon, porous silicon as a sacrificial structure, etc.).

Further details of the invention are explained below with reference to the drawing. In this case, the same or corresponding drawing elements are each assigned the same reference numerals, which only so far multiple be explained, as in the individual figures

Deviations result. Show it

Figure 1 shows an embodiment of the invention

Reactor for producing a layer in section and Figure 2 shows another embodiment of the reactor according to the invention for producing porous

Silicon in section.

A reactor IIa consists essentially of a plate 12 with reaction chambers 13, a seal designed as a sealing mat 14 and a lid structure 15. The sealing mat 14 is adjacent with its one side to a substrate 16 facing side of the plate. With the other side, it forms at the edges of the reaction chambers 13, of which only one is shown, the seal towards a surface 17 of the substrate. The reaction chamber 13 corresponds in its cross section exactly to the reaction opening 18 formed by the sealing mat, so that the part of the reaction space formed by the plate 12 is continued, as it were, in the region of the sealing mat 14 towards the surface 17.

On the side facing away from the substrate 16 of the plate 12 is the lid structure 15, which closes the reaction chamber 13 at the top. In the cover structure 15 is an electrode 19, which is acted upon by a potential Pi. The electrode 19 dips into a reaction medium 20 in the form of an electrolyte, so that a galvanic layer 21 or the surface is formed by applying a potential P2 to the electrically conductive substrate 16, depending on the potential difference between the potentials Pi and P ₂ in the region of the reaction opening 18 17 of the substrate 16 to form a depression (not shown) can be removed. Of course you can a reference electrode (or more) may be formed in the cover structure (not shown), which also dips into the electrolyte.

The cover structure 15 also has a partition wall 22, which extends into the reaction space 13 and thus creates two partial areas in the reaction chamber 13. As a result, the reaction medium 20 is largely separated from each other in the subregions. The electrical effect of the electrode 19 therefore acts much more on the portion in which it is located, while the other portion is affected weaker by them. This makes it possible, for example, to influence the layer thickness of the grown-up layer 21. If an alloy is deposited as a layer, can. By the

Concerns of different potentials in the subregions of the reaction space 13 also a varying

Alloy composition of the formed layer can be achieved (for example, when using an Ag-Sn electrolyte solderable and contact suitable layer areas).

A reactor IIb according to Figure 2 has a plate 12 which is composed of sub-plates 23a, 23b. The sub-plates form a channel system 24, which as part of the

Reaction spaces 13 is to be considered and the filling of the located in the sealing mat 14 parts of the reaction chambers 13 is allowed through a filling opening 25. The filling opening is formed by the partial plate 23 a, which also has a distribution channel 26. This supplies via an interface between the sub-plates 23a, 23b supply openings 27 in the sub-plate 23b, which in turn is adjacent to the sealing mat 14 side of the Plate 12 interspersed at regular intervals, so that an array of supply openings is formed.

The reaction spaces 13, which are formed by the sealing mat 14 in accordance with the patterning of the substrate 16 to be produced, can be described with reference to FIGS

Supply openings 27 may be configured as desired, as long as their extent exceeds the grid of the array at supply openings 26, so that it is ensured that in each case at least one supply opening 27 also opens into the respective reaction chamber 13 in the sealing mat. In order to ensure trouble-free filling of the reaction chambers 13, a system of venting channels 28 is provided in the interface of the plate 12 to the sealing mat 14, which is a honeycomb-like in the interface

Pattern forms, wherein the supply openings 27 are respectively arranged in the middle of the honeycombs thus formed. In this way, it is possible to prevent the supply openings 27 from intersecting with the ventilation channels 28.

In the design of the reaction openings 18 formed by the reaction chambers 13 in the sealing mat 14, it should be noted that in the formation of porous silicon 29 in the substrate 16, the edges of the reaction openings are undercut. However, the geometrical deviations to be considered between the reaction openings 18 and the porous silicon 29 correspond to the values known from conventional mask technology and can therefore be adopted.

Claims

claims

A reactor for generating reactions on a surface (17) of a substrate (16), comprising - a plate (12) adapted to the surface (17) and having at least one reaction space (13) open to the surface, and so on Reaction opening (18) for the attack of a reaction medium on the surface (17) forms, and - a seal (14) for the plate (12) to the surface

(17), which runs along the edge of the reaction opening (18), characterized in that the reaction opening (18) in its geometry with respect to the preparation of a function of the substrate (16) determining structuring of the surface (17) through the Reaction medium is formed.

2. Reactor according to claim 1, characterized in that in the reaction space (13) electrodes (19) are provided, in whose electrical influence region at least a part of the reaction opening (18).

3. Reactor according to one of claims 1 or 2, characterized in that the seal (14) consists of a sealing mat which rests with its one side on the plate (12) and the other side forms a sealing surface for the surface (17) , wherein the reaction opening (18) breaks through the sealing surface.

4. Reactor according to claim 3, characterized in that the plate (12) is formed with a continuous channel system (24) as a reaction space having a filling opening (25) for the reaction medium and with all the reaction openings (18) in the sealing mat in combination stands .

5. Use of a reactor for generating reactions on a surface (17) of a substrate (16) comprising

- A to the surface (17) adapted plate (12) having at least one reaction space (13) which is open to the surface and thus forms a reaction opening (18) for the attack of a reaction medium on the surface (17) and

- A seal (14) for the plate (12) to the surface

(17), which runs along the edge of the reaction opening (18), characterized in that a function of the

Substrate (16) determining structuring of the surface (17) is produced by the reaction opening (18) is adapted in geometry to the structure to be generated.

6. Use according to claim 5, characterized in that the reactor is placed on a substrate (16) made of silicon and the substrate (16) in the region of the reaction opening (18) by the formation of porous silicon (29) is structured.

7. Use according to claim 5, characterized in that the surface (17) of the substrate (16) in the region of the reaction opening (18) is removed to form the structuring.

8. Use according to claim 5, characterized in that the surface (17) of the substrate (16) in the region of the reaction opening (18) is coated to form the structuring.