WO2003058344A3 - System and method for aerial image sensing - Google Patents

System and method for aerial image sensing Download PDF

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Publication number
WO2003058344A3
WO2003058344A3 PCT/US2003/000401 US0300401W WO03058344A3 WO 2003058344 A3 WO2003058344 A3 WO 2003058344A3 US 0300401 W US0300401 W US 0300401W WO 03058344 A3 WO03058344 A3 WO 03058344A3
Authority
WO
WIPO (PCT)
Prior art keywords
aerial image
photo
pattern
conducting layer
electron
Prior art date
Application number
PCT/US2003/000401
Other languages
French (fr)
Other versions
WO2003058344A2 (en
Inventor
R Fabian W Pease
Jun Ye
Original Assignee
R Fabian W Pease
Jun Ye
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by R Fabian W Pease, Jun Ye filed Critical R Fabian W Pease
Priority to AU2003202229A priority Critical patent/AU2003202229A1/en
Priority to JP2003558595A priority patent/JP2005526269A/en
Priority to EP03701241A priority patent/EP1579273A4/en
Publication of WO2003058344A2 publication Critical patent/WO2003058344A2/en
Publication of WO2003058344A3 publication Critical patent/WO2003058344A3/en

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/708Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84Inspecting
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591Testing optical components
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605Workpiece metrology
    • G03F7/70616Monitoring the printed patterns
    • G03F7/7065Defects, e.g. optical inspection of patterned layer for defects
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605Workpiece metrology
    • G03F7/70653Metrology techniques
    • G03F7/70666Aerial image, i.e. measuring the image of the patterned exposure light at the image plane of the projection system
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7069Alignment mark illumination, e.g. darkfield, dual focus

Abstract

A system to sense an aerial image (12) produced by optical lithographic equipment used in, for example, semiconductor fabrication. In one embodiment, the system includes a photo-electron emission device (44) which, in response to an aerial image projected thereon, emits electron (50) in a pattern corresponding to the light intensity distribution produced by the aerial image. Electron optics provides an enlarged pattern of the pattern in which the electrons are emitted. A sensing unit (64) senses the enlarged pattern. In another embodiment, the system employs a photo-conducting layer to project the aerial image thereon. The photo-conducting layer, in response to the projection of the aerial image thereon, produces local charge depletion corresponding to the light intensity distribution. A steering device delivers electrons to the photo-conducting layer to produce local re-charging currents in proportion to the local charge depletion. A pattern corresponding to the aerial image may be obtained from the re-charging currents.
PCT/US2003/000401 2002-01-08 2003-01-08 System and method for aerial image sensing WO2003058344A2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
AU2003202229A AU2003202229A1 (en) 2002-01-08 2003-01-08 System and method for aerial image sensing
JP2003558595A JP2005526269A (en) 2002-01-08 2003-01-08 System and method for sensing aerial images
EP03701241A EP1579273A4 (en) 2002-01-08 2003-01-08 System and method for aerial image sensing

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US34716902P 2002-01-08 2002-01-08
US60/347,169 2002-01-08
US10/337,510 2003-01-07
US10/337,510 US6906305B2 (en) 2002-01-08 2003-01-07 System and method for aerial image sensing

Publications (2)

Publication Number Publication Date
WO2003058344A2 WO2003058344A2 (en) 2003-07-17
WO2003058344A3 true WO2003058344A3 (en) 2005-09-22

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2003/000401 WO2003058344A2 (en) 2002-01-08 2003-01-08 System and method for aerial image sensing

Country Status (5)

Country Link
US (1) US6906305B2 (en)
EP (1) EP1579273A4 (en)
JP (1) JP2005526269A (en)
AU (1) AU2003202229A1 (en)
WO (1) WO2003058344A2 (en)

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EP1579273A4 (en) 2006-03-08
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JP2005526269A (en) 2005-09-02
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