WO2003024186A3 - Methods and apparatus for patterning a surface - Google Patents
Methods and apparatus for patterning a surface Download PDFInfo
- Publication number
- WO2003024186A3 WO2003024186A3 PCT/US2002/029562 US0229562W WO03024186A3 WO 2003024186 A3 WO2003024186 A3 WO 2003024186A3 US 0229562 W US0229562 W US 0229562W WO 03024186 A3 WO03024186 A3 WO 03024186A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- thioether
- stamp
- fluid medium
- locally
- conducting
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
- B29C43/003—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor characterised by the choice of material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M3/00—Printing processes to produce particular kinds of printed work, e.g. patterns
- B41M3/006—Patterns of chemical products used for a specific purpose, e.g. pesticides, perfumes, adhesive patterns; use of microencapsulated material; Printing on smoking articles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/02—Local etching
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
- B29C43/02—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles
- B29C43/021—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface
- B29C2043/023—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface having a plurality of grooves
- B29C2043/025—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface having a plurality of grooves forming a microstructure, i.e. fine patterning
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q80/00—Applications, other than SPM, of scanning-probe techniques
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/20—Changing the shape of the active layer in the devices, e.g. patterning
- H10K71/211—Changing the shape of the active layer in the devices, e.g. patterning by selective transformation of an existing layer
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/60—Forming conductive regions or layers, e.g. electrodes
Abstract
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CA002460862A CA2460862A1 (en) | 2001-09-18 | 2002-09-18 | Methods and apparatus for patterning a surface |
MXPA04002555A MXPA04002555A (en) | 2001-09-18 | 2002-09-18 | Methods and apparatus for patterning a surface. |
EP02768863A EP1438738A4 (en) | 2001-09-18 | 2002-09-18 | Methods and apparatus for patterning a surface |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US32335501P | 2001-09-18 | 2001-09-18 | |
US60/323,355 | 2001-09-18 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2003024186A2 WO2003024186A2 (en) | 2003-03-27 |
WO2003024186A3 true WO2003024186A3 (en) | 2003-05-22 |
Family
ID=23258860
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2002/029562 WO2003024186A2 (en) | 2001-09-18 | 2002-09-18 | Methods and apparatus for patterning a surface |
Country Status (5)
Country | Link |
---|---|
US (1) | US7091127B2 (en) |
EP (1) | EP1438738A4 (en) |
CA (1) | CA2460862A1 (en) |
MX (1) | MXPA04002555A (en) |
WO (1) | WO2003024186A2 (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7427410B2 (en) | 2001-09-18 | 2008-09-23 | Ecole Polytechnique Federale De Lausanne (Epfl) | Coating hydrophobic surfaces with amphiphilic thioethers to reduce protein adsorption and cell adhesion |
US20030215723A1 (en) * | 2002-04-19 | 2003-11-20 | Bearinger Jane P. | Methods and apparatus for selective, oxidative patterning of a surface |
AU2003238947A1 (en) * | 2002-05-24 | 2003-12-12 | Stephen Y. Chou | Methods and apparatus of field-induced pressure imprint lithography |
US20060007515A1 (en) * | 2003-11-13 | 2006-01-12 | Dmitri Simonian | Surface lubrication in microstructures |
KR100829452B1 (en) * | 2006-06-13 | 2008-05-15 | (주)코리아 본 뱅크 | Bioactive Protein-Calcium Phosphate Composite and the Manufacturing Method of the same |
US10711106B2 (en) | 2013-07-25 | 2020-07-14 | The University Of Chicago | High aspect ratio nanofibril materials |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4764247A (en) * | 1987-03-18 | 1988-08-16 | Syn Labs, Inc. | Silicon containing resists |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB8511905D0 (en) | 1985-05-10 | 1985-06-19 | Akzo Nv | Metallizing polymeric materials |
US5030352A (en) | 1990-01-25 | 1991-07-09 | Purdue Research Foundation | Coated media for chromatography |
US5688855A (en) | 1995-05-01 | 1997-11-18 | S.K.Y. Polymers, Inc. | Thin film hydrophilic coatings |
US5733711A (en) * | 1996-01-02 | 1998-03-31 | Micron Technology, Inc. | Process for forming both fixed and variable patterns on a single photoresist resin mask |
US5925494A (en) * | 1996-02-16 | 1999-07-20 | Massachusetts Institute Of Technology | Vapor deposition of polymer films for photolithography |
US5821343A (en) | 1996-04-25 | 1998-10-13 | Medtronic Inc | Oxidative method for attachment of biomolecules to surfaces of medical devices |
US6306165B1 (en) | 1996-09-13 | 2001-10-23 | Meadox Medicals | ePTFE small caliber vascular grafts with significant patency enhancement via a surface coating which contains covalently bonded heparin |
US5871653A (en) * | 1996-10-30 | 1999-02-16 | Advanced Materials Engineering Research, Inc. | Methods of manufacturing micro-lens array substrates for implementation in flat panel display |
US6190834B1 (en) * | 1997-05-15 | 2001-02-20 | Hitachi, Ltd. | Photosensitive resin composition, and multilayer printed circuit board using the same |
AUPP373698A0 (en) | 1998-05-27 | 1998-06-18 | Commonwealth Scientific And Industrial Research Organisation | Molecular coatings |
JP4208305B2 (en) * | 1998-09-17 | 2009-01-14 | 株式会社東芝 | Method for forming mask pattern |
US6358557B1 (en) | 1999-09-10 | 2002-03-19 | Sts Biopolymers, Inc. | Graft polymerization of substrate surfaces |
US6887332B1 (en) * | 2000-04-21 | 2005-05-03 | International Business Machines Corporation | Patterning solution deposited thin films with self-assembled monolayers |
US7427410B2 (en) | 2001-09-18 | 2008-09-23 | Ecole Polytechnique Federale De Lausanne (Epfl) | Coating hydrophobic surfaces with amphiphilic thioethers to reduce protein adsorption and cell adhesion |
-
2002
- 2002-09-18 EP EP02768863A patent/EP1438738A4/en not_active Withdrawn
- 2002-09-18 CA CA002460862A patent/CA2460862A1/en not_active Abandoned
- 2002-09-18 MX MXPA04002555A patent/MXPA04002555A/en not_active Application Discontinuation
- 2002-09-18 US US10/246,500 patent/US7091127B2/en not_active Expired - Lifetime
- 2002-09-18 WO PCT/US2002/029562 patent/WO2003024186A2/en not_active Application Discontinuation
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4764247A (en) * | 1987-03-18 | 1988-08-16 | Syn Labs, Inc. | Silicon containing resists |
Also Published As
Publication number | Publication date |
---|---|
MXPA04002555A (en) | 2004-06-18 |
EP1438738A2 (en) | 2004-07-21 |
US20030114002A1 (en) | 2003-06-19 |
CA2460862A1 (en) | 2003-03-27 |
EP1438738A4 (en) | 2007-04-18 |
WO2003024186A2 (en) | 2003-03-27 |
US7091127B2 (en) | 2006-08-15 |
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