WO2002087685A2 - High-density array of micro-machined electrodes for neural stimulation - Google Patents
High-density array of micro-machined electrodes for neural stimulation Download PDFInfo
- Publication number
- WO2002087685A2 WO2002087685A2 PCT/US2002/014047 US0214047W WO02087685A2 WO 2002087685 A2 WO2002087685 A2 WO 2002087685A2 US 0214047 W US0214047 W US 0214047W WO 02087685 A2 WO02087685 A2 WO 02087685A2
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- electrode
- protuberances
- platinum
- micromachining
- insulating layer
- Prior art date
Links
Classifications
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61N—ELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY
- A61N1/00—Electrotherapy; Circuits therefor
- A61N1/02—Details
- A61N1/04—Electrodes
- A61N1/05—Electrodes for implantation or insertion into the body, e.g. heart electrode
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61N—ELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY
- A61N1/00—Electrotherapy; Circuits therefor
- A61N1/02—Details
- A61N1/04—Electrodes
- A61N1/05—Electrodes for implantation or insertion into the body, e.g. heart electrode
- A61N1/0526—Head electrodes
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61N—ELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY
- A61N1/00—Electrotherapy; Circuits therefor
- A61N1/02—Details
- A61N1/04—Electrodes
- A61N1/05—Electrodes for implantation or insertion into the body, e.g. heart electrode
- A61N1/0551—Spinal or peripheral nerve electrodes
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61N—ELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY
- A61N1/00—Electrotherapy; Circuits therefor
- A61N1/02—Details
- A61N1/04—Electrodes
- A61N1/05—Electrodes for implantation or insertion into the body, e.g. heart electrode
- A61N1/0526—Head electrodes
- A61N1/0541—Cochlear electrodes
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61N—ELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY
- A61N1/00—Electrotherapy; Circuits therefor
- A61N1/02—Details
- A61N1/04—Electrodes
- A61N1/05—Electrodes for implantation or insertion into the body, e.g. heart electrode
- A61N1/0526—Head electrodes
- A61N1/0543—Retinal electrodes
Definitions
- This application relates to an improved electrode, in particular, and improved electrode for neural stimulation having an increased surface area.
- Micromachining has been used to produce neural-electronic interfaces for recording
- example is the development of a visual prosthesis.
- macular degeneration i.e., photoreceptors do not function
- Humuyan describes a system for capturing a video image
- the current used is limited by the electrode area when operated at the
- One method of increasing surface area is to roughen the surface by rapid
- a system is needed to create a high surface area electrode which is strong enough
- the present invention is a micro-machined electrode for neural-electronic interfaces
- Fig. 1 shows an electrode according to the present invention.
- Fig. 2 shows the steps of forming an electrode array according to present invention.
- Fig. 3 shows the electrical circuit equivalent of a neural stimulation electrode.
- Fig. 4 shows applicant's test results from use of the preferred electrode.
- the present invention is an electrode with a high aspect ratio surface plated or cut to create maximum surface area within a given planar surface area.
- electrode includes a planar base 10, covered with micromachined posts 12 and valleys 14.
- ridges can be micromachined to increase strength. By making the ridges curved in the horizontal direction strength is increased. While one of skill in the art may
- Micromachining techniques can create posts with an aspect ratio
- the present electrode is formed by techniques similar to that of manufacturing semiconductors.
- a photoresist layer is applied by photolithographic
- Electrode arrays are plated to metals not protected by the photoresist. Electrode arrays
- preferred embodiment is built on a polyimide flexible substrate using titanium and platinum,
- Polyimide is used as a supporting material and
- the fabrication process begins with a silicon wafer, 50, which simply acts as a passive substrate, which is later removed A 5 ⁇ m lower polyimide film 52 is
- the lower polyimide film 52 may be replaced by silicon dioxide, aluminum oxide, silicon carbide, diamond, or zirconium oxide film, and the silicon wafer 50
- the electronic base of the electrode array and the interconnect is formed by a
- Titanium adheres better to polyimide than platinum and is provided under
- An upper polyimide film 60 is spun on to a thickness of 5 ⁇ m and then hard baked at 350°C to form a structure in which the titanium film 54 and platinum film 56 is sandwiched between two insulating polyimide layers 52 and 60.
- the upper polyimide film 60 must be patterned to expose the electrode sites. To accomplish this we first deposit and pattern an aluminum etch mask 62 and then remove all
- a 25 ⁇ m layer of photoresist 64 is used to define openings for the subsequent
- gold posts 66 are plated on to the platinum film 56. If the thickness of the plated platinum
- the high stress in the platinum posts 66 may cause the platinum posts
- Iridium has electrochemical advantages and is even more difficult to plate than
- platinum or gold these include titanium oxide, rhodium palladium.
- hermetic While the preferred embodiment uses electroplating, other methods are known in the art for making thin hermetic layers such a sputtering, ion-beam deposition, and ion-beam
- microposts 66 may be micromachined by
- the silicon base 50 is removed.
- the electrode surfaces consisted of arrays of microposts or the inverse
- the KOH-based developer removes the exposed regions of the
- KOH-based developer is not efficiently diluted, particularly from the sidewalls.
- hollow cylindrical micropost reveals that indeed the thickness of the plated material on the
- an impedance analyzer was used to measure the current induced by
- an electrode surface can be modeled (as shown in figure 3) with a capacitance 70 and resistance
- the electrode-electrolyte resistance 72 describes the lower faradic conductance of
- solution resistance 74 represents the resistance of the solution.
- the capacitance 70 and resistance 72 values typically vary widely with voltage, time,
- solution resistance 74 can be approximated by simple linear values over the small voltage
- capacitance 70 is proportional to surface area and resistance 72 is inversely
- electrode curve 80 shows the impedance of a flat electrode at various frequencies.
- a 5 micromachined electrode curve 82 shows lower impedance for the micromachined electrode,
Abstract
Description
Claims
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AU2002305357A AU2002305357A1 (en) | 2001-05-01 | 2002-05-01 | High-density array of micro-machined electrodes for neural stimulation |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US28741501P | 2001-05-01 | 2001-05-01 | |
US60/287,415 | 2001-05-01 | ||
US31482801P | 2001-08-24 | 2001-08-24 | |
US60/314,828 | 2001-08-24 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2002087685A2 true WO2002087685A2 (en) | 2002-11-07 |
WO2002087685A3 WO2002087685A3 (en) | 2003-07-31 |
Family
ID=26964437
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2002/014047 WO2002087685A2 (en) | 2001-05-01 | 2002-05-01 | High-density array of micro-machined electrodes for neural stimulation |
Country Status (3)
Country | Link |
---|---|
US (4) | US7676274B2 (en) |
AU (1) | AU2002305357A1 (en) |
WO (1) | WO2002087685A2 (en) |
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US8125188B2 (en) | 2003-04-11 | 2012-02-28 | Cochlear Limited | Power management system |
US8298608B2 (en) | 2002-12-13 | 2012-10-30 | Heraeus Precious Metals Gmbh & Co. Kg | Method for producing a stimulation electrode |
US8461042B2 (en) | 2009-12-01 | 2013-06-11 | Cochlear Limited | Electrode contact contaminate removal |
US8782884B2 (en) | 2009-12-01 | 2014-07-22 | Cochlear Limited | Manufacturing an electrode assembly having contoured electrode contact surfaces |
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2006
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2010
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---|---|---|---|---|
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US8782884B2 (en) | 2009-12-01 | 2014-07-22 | Cochlear Limited | Manufacturing an electrode assembly having contoured electrode contact surfaces |
Also Published As
Publication number | Publication date |
---|---|
US7706893B2 (en) | 2010-04-27 |
US20100168830A1 (en) | 2010-07-01 |
WO2002087685A3 (en) | 2003-07-31 |
US8831745B2 (en) | 2014-09-09 |
US7676274B2 (en) | 2010-03-09 |
US20060259108A1 (en) | 2006-11-16 |
US8615308B2 (en) | 2013-12-24 |
AU2002305357A1 (en) | 2002-11-11 |
US20030195601A1 (en) | 2003-10-16 |
US20140074210A1 (en) | 2014-03-13 |
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