WO2002057715A3 - Suspended mircomachined structure - Google Patents

Suspended mircomachined structure Download PDF

Info

Publication number
WO2002057715A3
WO2002057715A3 PCT/US2002/001131 US0201131W WO02057715A3 WO 2002057715 A3 WO2002057715 A3 WO 2002057715A3 US 0201131 W US0201131 W US 0201131W WO 02057715 A3 WO02057715 A3 WO 02057715A3
Authority
WO
WIPO (PCT)
Prior art keywords
mass
substrate
points
lateral element
suspended
Prior art date
Application number
PCT/US2002/001131
Other languages
French (fr)
Other versions
WO2002057715A2 (en
Inventor
Gary R Knowles
Original Assignee
Honeywell Int Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Honeywell Int Inc filed Critical Honeywell Int Inc
Priority to JP2002557750A priority Critical patent/JP2004527387A/en
Priority to KR10-2003-7009530A priority patent/KR20030090624A/en
Priority to EP02709047A priority patent/EP1352214A2/en
Priority to AU2002243554A priority patent/AU2002243554A1/en
Publication of WO2002057715A2 publication Critical patent/WO2002057715A2/en
Publication of WO2002057715A3 publication Critical patent/WO2002057715A3/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01C—MEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
    • G01C19/00—Gyroscopes; Turn-sensitive devices using vibrating masses; Turn-sensitive devices without moving masses; Measuring angular rate using gyroscopic effects
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B3/00—Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
    • B81B3/0035—Constitution or structural means for controlling the movement of the flexible or deformable elements
    • B81B3/0051—For defining the movement, i.e. structures that guide or limit the movement of an element
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01C—MEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
    • G01C19/00—Gyroscopes; Turn-sensitive devices using vibrating masses; Turn-sensitive devices without moving masses; Measuring angular rate using gyroscopic effects
    • G01C19/56—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces
    • G01C19/5719—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces using planar vibrating masses driven in a translation vibration along an axis
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2201/00—Specific applications of microelectromechanical systems
    • B81B2201/02—Sensors
    • B81B2201/0228—Inertial sensors
    • B81B2201/0242—Gyroscopes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2203/00—Basic microelectromechanical structures
    • B81B2203/01—Suspended structures, i.e. structures allowing a movement
    • B81B2203/0109—Bridges
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2203/00—Basic microelectromechanical structures
    • B81B2203/05—Type of movement
    • B81B2203/051—Translation according to an axis parallel to the substrate
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2203/00—Basic microelectromechanical structures
    • B81B2203/05—Type of movement
    • B81B2203/053—Translation according to an axis perpendicular to the substrate

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Radar, Positioning & Navigation (AREA)
  • Remote Sensing (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Gyroscopes (AREA)
  • Micromachines (AREA)

Abstract

A suspended micromachined structure including a proof mass and multiple support arms configured to suspend the mass aboe the mass above a substrate. At least one support arm may include two spring elements, each attached to the substrate as well as to a rigid lateral element. Thus, there may be three points of attachment along eact lateral element. These points of attachment create three effective flexure points along each rigid lateral element that allow the proff mass to move with a great deal of freedom axially, parallel to the substrate. The linearity of the spring constant that acts on the proof mass may be improved.
PCT/US2002/001131 2001-01-16 2002-01-14 Suspended mircomachined structure WO2002057715A2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2002557750A JP2004527387A (en) 2001-01-16 2002-01-14 Suspended micro-machined structure
KR10-2003-7009530A KR20030090624A (en) 2001-01-16 2002-01-14 Suspended micromachined structure
EP02709047A EP1352214A2 (en) 2001-01-16 2002-01-14 Suspended mircomachined structure
AU2002243554A AU2002243554A1 (en) 2001-01-16 2002-01-14 Suspended mircomachined structure

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/761,291 US6426538B1 (en) 2001-01-16 2001-01-16 Suspended micromachined structure
US09/761,291 2001-01-16

Publications (2)

Publication Number Publication Date
WO2002057715A2 WO2002057715A2 (en) 2002-07-25
WO2002057715A3 true WO2002057715A3 (en) 2003-02-27

Family

ID=25061792

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2002/001131 WO2002057715A2 (en) 2001-01-16 2002-01-14 Suspended mircomachined structure

Country Status (6)

Country Link
US (1) US6426538B1 (en)
EP (1) EP1352214A2 (en)
JP (1) JP2004527387A (en)
KR (1) KR20030090624A (en)
AU (1) AU2002243554A1 (en)
WO (1) WO2002057715A2 (en)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3517185B2 (en) * 2000-07-19 2004-04-05 株式会社ミツトヨ Scale member, manufacturing method thereof, and displacement meter using the same
US6722197B2 (en) * 2001-06-19 2004-04-20 Honeywell International Inc. Coupled micromachined structure
KR100473524B1 (en) * 2002-03-21 2005-03-09 한국과학기술원 Nonlinear mechanical modulator and actuation system thereof
US6782748B2 (en) 2002-11-12 2004-08-31 Honeywell International, Inc. High-G acceleration protection by caging
US6865944B2 (en) * 2002-12-16 2005-03-15 Honeywell International Inc. Methods and systems for decelerating proof mass movements within MEMS structures
US6817244B2 (en) * 2003-01-06 2004-11-16 Honeywell International Inc. Methods and systems for actively controlling movement within MEMS structures
US6718825B1 (en) 2003-01-17 2004-04-13 Honeywell International Inc. Methods and systems for reducing stick-down within MEMS structures
US6860151B2 (en) * 2003-02-07 2005-03-01 Honeywell International Inc. Methods and systems for controlling movement within MEMS structures
US6978673B2 (en) * 2003-02-07 2005-12-27 Honeywell International, Inc. Methods and systems for simultaneously fabricating multi-frequency MEMS devices
US7229669B2 (en) * 2003-11-13 2007-06-12 Honeywell International Inc. Thin-film deposition methods and apparatuses
US7258010B2 (en) * 2005-03-09 2007-08-21 Honeywell International Inc. MEMS device with thinned comb fingers
US20070163346A1 (en) * 2006-01-18 2007-07-19 Honeywell International Inc. Frequency shifting of rotational harmonics in mems devices
DE102007057042A1 (en) * 2007-09-10 2009-03-12 Continental Teves Ag & Co. Ohg Micromechanical rotation rate sensor with coupling bars and suspension elements for quadrature suppression
US8413509B2 (en) * 2008-04-14 2013-04-09 Freescale Semiconductor, Inc. Spring member for use in a microelectromechanical systems sensor
US8039912B2 (en) * 2008-06-25 2011-10-18 Honeywell International Inc. Systems and methods for reduced stress anchors
US8011247B2 (en) * 2008-06-26 2011-09-06 Honeywell International Inc. Multistage proof-mass movement deceleration within MEMS structures
US8187902B2 (en) 2008-07-09 2012-05-29 The Charles Stark Draper Laboratory, Inc. High performance sensors and methods for forming the same
EP2327960B1 (en) * 2008-08-18 2019-10-09 Hitachi, Ltd. Micro electro mechanical system
JP2012528335A (en) * 2009-05-27 2012-11-12 キング アブドゥーラ ユニバーシティ オブ サイエンス アンド テクノロジー MEMS mass-spring-damper system using out-of-plane suspension system
KR101299731B1 (en) * 2012-05-29 2013-08-22 삼성전기주식회사 Angular velocity sensor
IT201700043012A1 (en) * 2017-04-19 2018-10-19 St Microelectronics Srl MEMS GYROSCOPE WITH IMPROVED REJECTION OF A SQUARE ERROR

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1995034798A1 (en) * 1994-06-16 1995-12-21 Robert Bosch Gmbh Accelerometer
US5780739A (en) * 1995-05-25 1998-07-14 Samsung Electronics Co., Ltd. Tuning fork type gyroscope
US5920012A (en) * 1998-06-16 1999-07-06 Boeing North American Micromechanical inertial sensor

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5203208A (en) 1991-04-29 1993-04-20 The Charles Stark Draper Laboratory Symmetrical micromechanical gyroscope
US5734105A (en) * 1992-10-13 1998-03-31 Nippondenso Co., Ltd. Dynamic quantity sensor
JP3039364B2 (en) * 1996-03-11 2000-05-08 株式会社村田製作所 Angular velocity sensor
US5992233A (en) * 1996-05-31 1999-11-30 The Regents Of The University Of California Micromachined Z-axis vibratory rate gyroscope
US5821596A (en) * 1997-03-24 1998-10-13 Integrated Micromachines, Inc. Batch fabricated semiconductor micro-switch
US5937172A (en) 1997-04-14 1999-08-10 International Business Machines Corporation Apparatus and method of layering cache and architectural specific functions to permit generic interface definition
US6060336A (en) * 1998-12-11 2000-05-09 C.F. Wan Incorporated Micro-electro mechanical device made from mono-crystalline silicon and method of manufacture therefore

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1995034798A1 (en) * 1994-06-16 1995-12-21 Robert Bosch Gmbh Accelerometer
US5780739A (en) * 1995-05-25 1998-07-14 Samsung Electronics Co., Ltd. Tuning fork type gyroscope
US5920012A (en) * 1998-06-16 1999-07-06 Boeing North American Micromechanical inertial sensor

Also Published As

Publication number Publication date
JP2004527387A (en) 2004-09-09
US6426538B1 (en) 2002-07-30
EP1352214A2 (en) 2003-10-15
AU2002243554A1 (en) 2002-07-30
US20020093067A1 (en) 2002-07-18
WO2002057715A2 (en) 2002-07-25
KR20030090624A (en) 2003-11-28

Similar Documents

Publication Publication Date Title
WO2002057715A3 (en) Suspended mircomachined structure
BR0200046B1 (en) Suspension arm.
WO2001048527A3 (en) Micromirror
DE69901021T2 (en) DEVICE FOR ASSEMBLY AND POSITION CORRECTION OF AN ELEMENT, LIKE A MIRROR FROM A SPACE TELESCOPE
WO2003014009A3 (en) A microelectromechanical device having a stiffened support beam, and methods of forming stiffened support beams in mems
NO20051707L (en) Device for forming removable wall structure.
DE60226122D1 (en) suspension assembly
WO2005047825A3 (en) Microelectromechanical floating element flow sensor
BR0204105B1 (en) axle and suspension system to suspend the axle of a vehicle structure.
DE60208619D1 (en) Acceleration sensitive damper
DE60213753T8 (en) Suspension support structure
ITBO20040278A1 (en) AUTOMOTIVE SUSPENSION WITH RESPONSE CONTROL OF THE SPRING-SHOCK ASSEMBLY.
DK1104824T3 (en) Vibration pistons with single control arm
DE50201537D1 (en) Suspension strut with adjustable preload
WO2002043205A3 (en) Suspension with net zero stress isolator
ITTO20020043A1 (en) AIR FILTER STRUCTURE FOR VEHICLE.
WO2003048831A3 (en) Mounting system particularly for lenses
DE60206121D1 (en) spring structure
ATE392835T1 (en) SINGLE SPRING ELEMENT
DE60236139D1 (en) COMPENSATING SYSTEM WITH FLOATING BALANCE
EP1316945A3 (en) Magnetic head supporting mechanism and magnetic head positioning control mechanism
DK1515056T3 (en) Crane with sliding element
CA2490923A1 (en) Mounting system for a swing
SG136794A1 (en) Data storage module suspension system
EP1354849A3 (en) Flexure with integral actuator

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A2

Designated state(s): AE AL AM AT AU AZ BA BB BG BR BY CA CH CN CR CU CZ DE DK DM EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX NO NZ PL PT RO RU SD SE SG SI SK SL TJ TM TR TT TZ UA UG UZ VN YU ZA ZW

AL Designated countries for regional patents

Kind code of ref document: A2

Designated state(s): GH GM KE LS MW MZ SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG

121 Ep: the epo has been informed by wipo that ep was designated in this application
AK Designated states

Kind code of ref document: A3

Designated state(s): AE AL AM AT AU AZ BA BB BG BR BY CA CH CN CR CU CZ DE DK DM EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX NO NZ PL PT RO RU SD SE SG SI SK SL TJ TM TR TT TZ UA UG UZ VN YU ZA ZW

AL Designated countries for regional patents

Kind code of ref document: A3

Designated state(s): GH GM KE LS MW MZ SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG

DFPE Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101)
WWE Wipo information: entry into national phase

Ref document number: 2002709047

Country of ref document: EP

WWE Wipo information: entry into national phase

Ref document number: 2002557750

Country of ref document: JP

Ref document number: 1020037009530

Country of ref document: KR

WWP Wipo information: published in national office

Ref document number: 2002709047

Country of ref document: EP

REG Reference to national code

Ref country code: DE

Ref legal event code: 8642

WWP Wipo information: published in national office

Ref document number: 1020037009530

Country of ref document: KR