WO1999054786A9 - Elastomeric mask and use in fabrication of devices, inlcuding pixelated electroluminescent displays - Google Patents
Elastomeric mask and use in fabrication of devices, inlcuding pixelated electroluminescent displaysInfo
- Publication number
- WO1999054786A9 WO1999054786A9 PCT/US1999/008623 US9908623W WO9954786A9 WO 1999054786 A9 WO1999054786 A9 WO 1999054786A9 US 9908623 W US9908623 W US 9908623W WO 9954786 A9 WO9954786 A9 WO 9954786A9
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- mask
- article
- agent
- channels
- microns
- Prior art date
Links
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- MHMNJMPURVTYEJ-UHFFFAOYSA-N fluorescein-5-isothiocyanate Chemical compound O1C(=O)C2=CC(N=C=S)=CC=C2C21C1=CC=C(O)C=C1OC1=CC(O)=CC=C21 MHMNJMPURVTYEJ-UHFFFAOYSA-N 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- CJNBYAVZURUTKZ-UHFFFAOYSA-N hafnium(IV) oxide Inorganic materials O=[Hf]=O CJNBYAVZURUTKZ-UHFFFAOYSA-N 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- ORTRWBYBJVGVQC-UHFFFAOYSA-N hexadecane-1-thiol Chemical compound CCCCCCCCCCCCCCCCS ORTRWBYBJVGVQC-UHFFFAOYSA-N 0.000 description 1
- 238000012615 high-resolution technique Methods 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 239000005556 hormone Substances 0.000 description 1
- 229940088597 hormone Drugs 0.000 description 1
- 150000003949 imides Chemical class 0.000 description 1
- 239000000411 inducer Substances 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 229920000592 inorganic polymer Polymers 0.000 description 1
- 229910052747 lanthanoid Inorganic materials 0.000 description 1
- 150000002602 lanthanoids Chemical class 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 239000002523 lectin Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 238000003913 materials processing Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 238000001393 microlithography Methods 0.000 description 1
- 238000001682 microtransfer moulding Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 150000007523 nucleic acids Chemical class 0.000 description 1
- 102000039446 nucleic acids Human genes 0.000 description 1
- 108020004707 nucleic acids Proteins 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 1
- 230000036961 partial effect Effects 0.000 description 1
- ATGAWOHQWWULNK-UHFFFAOYSA-I pentapotassium;[oxido(phosphonatooxy)phosphoryl] phosphate Chemical compound [K+].[K+].[K+].[K+].[K+].[O-]P([O-])(=O)OP([O-])(=O)OP([O-])([O-])=O ATGAWOHQWWULNK-UHFFFAOYSA-I 0.000 description 1
- 229950011087 perflunafene Drugs 0.000 description 1
- UWEYRJFJVCLAGH-IJWZVTFUSA-N perfluorodecalin Chemical compound FC1(F)C(F)(F)C(F)(F)C(F)(F)[C@@]2(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)[C@@]21F UWEYRJFJVCLAGH-IJWZVTFUSA-N 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 1
- 229920000233 poly(alkylene oxides) Polymers 0.000 description 1
- 229920001643 poly(ether ketone) Polymers 0.000 description 1
- 229920000052 poly(p-xylylene) Polymers 0.000 description 1
- 229920002627 poly(phosphazenes) Polymers 0.000 description 1
- 229920000548 poly(silane) polymer Polymers 0.000 description 1
- 229920001197 polyacetylene Polymers 0.000 description 1
- 229920002401 polyacrylamide Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000015 polydiacetylene Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000012460 protein solution Substances 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000033458 reproduction Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 238000012216 screening Methods 0.000 description 1
- 239000005368 silicate glass Substances 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000010944 silver (metal) Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- PJANXHGTPQOBST-UHFFFAOYSA-N stilbene Chemical compound C=1C=CC=CC=1C=CC1=CC=CC=C1 PJANXHGTPQOBST-UHFFFAOYSA-N 0.000 description 1
- 235000021286 stilbenes Nutrition 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- RYCLIXPGLDDLTM-UHFFFAOYSA-J tetrapotassium;phosphonato phosphate Chemical compound [K+].[K+].[K+].[K+].[O-]P([O-])(=O)OP([O-])([O-])=O RYCLIXPGLDDLTM-UHFFFAOYSA-J 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 238000013519 translation Methods 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 1
- LENZDBCJOHFCAS-UHFFFAOYSA-N tris Chemical compound OCC(N)(CO)CO LENZDBCJOHFCAS-UHFFFAOYSA-N 0.000 description 1
- 238000007039 two-step reaction Methods 0.000 description 1
- 238000003631 wet chemical etching Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/30—Devices specially adapted for multicolour light emission
- H10K59/35—Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels
Abstract
Description
Claims
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CA2329412A CA2329412C (en) | 1998-04-21 | 1999-04-20 | Elastomeric mask and use in fabrication of devices, including pixelated electroluminescent displays |
JP2000545072A JP2002512124A (en) | 1998-04-21 | 1999-04-20 | Use in the manufacture of devices including elastomeric masks and pixelated electroluminescent displays |
EP99918698A EP1080394A1 (en) | 1998-04-21 | 1999-04-20 | Elastomeric mask and use in fabrication of devices, inlcuding pixelated electroluminescent displays |
US09/694,074 US7282240B1 (en) | 1998-04-21 | 2000-10-20 | Elastomeric mask and use in fabrication of devices |
US11/890,326 US20100239833A9 (en) | 1998-04-21 | 2007-08-06 | Elastomeric mask and use in fabrication of devices |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US6374298A | 1998-04-21 | 1998-04-21 | |
US09/063,742 | 1998-04-21 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US6374298A Continuation-In-Part | 1998-04-21 | 1998-04-21 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US09/694,074 Continuation US7282240B1 (en) | 1998-04-21 | 2000-10-20 | Elastomeric mask and use in fabrication of devices |
Publications (2)
Publication Number | Publication Date |
---|---|
WO1999054786A1 WO1999054786A1 (en) | 1999-10-28 |
WO1999054786A9 true WO1999054786A9 (en) | 2000-02-03 |
Family
ID=22051194
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US1999/008623 WO1999054786A1 (en) | 1998-04-21 | 1999-04-20 | Elastomeric mask and use in fabrication of devices, inlcuding pixelated electroluminescent displays |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP1080394A1 (en) |
JP (1) | JP2002512124A (en) |
CA (1) | CA2329412C (en) |
WO (1) | WO1999054786A1 (en) |
Families Citing this family (48)
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US5776748A (en) | 1993-10-04 | 1998-07-07 | President And Fellows Of Harvard College | Method of formation of microstamped patterns on plates for adhesion of cells and other biological materials, devices and uses therefor |
AU4164597A (en) | 1996-08-26 | 1998-03-19 | Princeton University | Reversibly sealable microstructure sorting devices |
US7282240B1 (en) | 1998-04-21 | 2007-10-16 | President And Fellows Of Harvard College | Elastomeric mask and use in fabrication of devices |
AU3081301A (en) * | 1999-11-12 | 2001-06-06 | Surromed, Inc. | Biosensing using surface plasmon resonance |
CA2402737A1 (en) * | 2000-03-17 | 2001-09-27 | Emanuele Ostuni | Cell patterning technique |
US6686184B1 (en) | 2000-05-25 | 2004-02-03 | President And Fellows Of Harvard College | Patterning of surfaces utilizing microfluidic stamps including three-dimensionally arrayed channel networks |
US6645432B1 (en) | 2000-05-25 | 2003-11-11 | President & Fellows Of Harvard College | Microfluidic systems including three-dimensionally arrayed channel networks |
US7323143B2 (en) | 2000-05-25 | 2008-01-29 | President And Fellows Of Harvard College | Microfluidic systems including three-dimensionally arrayed channel networks |
GB0013394D0 (en) * | 2000-06-01 | 2000-07-26 | Microemissive Displays Ltd | A method of creating a color optoelectronic device |
US6770721B1 (en) | 2000-11-02 | 2004-08-03 | Surface Logix, Inc. | Polymer gel contact masks and methods and molds for making same |
US6803205B2 (en) | 2000-11-08 | 2004-10-12 | Surface Logix, Inc. | Methods of measuring enzyme activity using peelable and resealable devices |
US7033821B2 (en) | 2000-11-08 | 2006-04-25 | Surface Logix, Inc. | Device for monitoring cell motility in real-time |
US7439056B2 (en) | 2000-11-08 | 2008-10-21 | Surface Logix Inc. | Peelable and resealable devices for arraying materials |
US6893851B2 (en) | 2000-11-08 | 2005-05-17 | Surface Logix, Inc. | Method for arraying biomolecules and for monitoring cell motility in real-time |
US6864065B2 (en) | 2000-11-08 | 2005-03-08 | Surface Logix, Inc. | Assays for monitoring cell motility in real-time |
US6967074B2 (en) | 2000-11-08 | 2005-11-22 | Surface Logix, Inc. | Methods of detecting immobilized biomolecules |
US7001740B2 (en) | 2000-11-08 | 2006-02-21 | Surface Logix, Inc. | Methods of arraying biological materials using peelable and resealable devices |
US6844184B2 (en) | 2000-11-08 | 2005-01-18 | Surface Logix, Inc. | Device for arraying biomolecules and for monitoring cell motility in real-time |
US7351575B2 (en) | 2000-11-08 | 2008-04-01 | Surface Logix, Inc. | Methods for processing biological materials using peelable and resealable devices |
US7371563B2 (en) | 2000-11-08 | 2008-05-13 | Surface Logix, Inc. | Peelable and resealable devices for biochemical assays |
US7033819B2 (en) | 2000-11-08 | 2006-04-25 | Surface Logix, Inc. | System for monitoring cell motility in real-time |
WO2002086452A2 (en) | 2001-03-23 | 2002-10-31 | President And Fellows Of Harvard College | Selective deposition of materials on contoured surfaces |
WO2003022010A1 (en) * | 2001-08-30 | 2003-03-13 | Fujitsu Limited | Method for manufacturing organic el device and organic el device |
US6833040B2 (en) | 2001-12-19 | 2004-12-21 | Surface Logix Inc. | Apparatus and method for handling membranes |
US6897164B2 (en) | 2002-02-14 | 2005-05-24 | 3M Innovative Properties Company | Aperture masks for circuit fabrication |
US6821348B2 (en) * | 2002-02-14 | 2004-11-23 | 3M Innovative Properties Company | In-line deposition processes for circuit fabrication |
NL1020341C2 (en) * | 2002-04-09 | 2003-10-13 | Stichting Tech Wetenschapp | Chip etching comprises use of chip holder comprising elastic material |
JP2005535120A (en) | 2002-08-06 | 2005-11-17 | アベシア・リミテッド | Organic electronic devices |
NL1022269C2 (en) * | 2002-12-24 | 2004-06-25 | Otb Group Bv | Method for manufacturing an organic electroluminescent display device, substrate for use in such a method, as well as an organic electroluminescent display device obtained with the method. |
US6926840B2 (en) * | 2002-12-31 | 2005-08-09 | Eastman Kodak Company | Flexible frame for mounting a deposition mask |
KR101376715B1 (en) | 2003-12-19 | 2014-03-27 | 더 유니버시티 오브 노쓰 캐롤라이나 엣 채플 힐 | Methods for fabricating isolated micro- and nano- structures using soft or imprint lithography |
DE102004034418B4 (en) * | 2004-07-15 | 2009-06-25 | Schott Ag | Process for producing structured optical filter layers on substrates |
WO2006027830A1 (en) * | 2004-09-08 | 2006-03-16 | Toray Industries, Inc. | Organic electroluminescent device and manufacturing method thereof |
US20060128165A1 (en) * | 2004-12-13 | 2006-06-15 | 3M Innovative Properties Company | Method for patterning surface modification |
KR20060079957A (en) * | 2005-01-04 | 2006-07-07 | 삼성에스디아이 주식회사 | Soft conformable photomask for photolithography, process for preparing the same, and fine pattering process using the same |
EP1681734A1 (en) * | 2005-01-18 | 2006-07-19 | C.S.E.M. Centre Suisse D'electronique Et De Microtechnique Sa | Optoelectronic device and method for producing the same |
JP2008546542A (en) | 2005-05-18 | 2008-12-25 | プレジデント・アンド・フエローズ・オブ・ハーバード・カレツジ | Production of conduction paths, microcircuits and microstructures in microfluidic networks |
DE102006026981A1 (en) * | 2006-06-10 | 2007-12-13 | Leonhard Kurz Gmbh & Co. Kg | Method for producing a structured layer on a carrier substrate |
DE102007029915B4 (en) | 2006-12-20 | 2017-03-30 | Lg Display Co., Ltd. | Organic electroluminescent device and method of making the same |
US7662663B2 (en) | 2007-03-28 | 2010-02-16 | Eastman Kodak Company | OLED patterning method |
US7635609B2 (en) * | 2007-04-16 | 2009-12-22 | Eastman Kodak Company | Patterning method for light-emitting devices |
GB0716266D0 (en) * | 2007-08-21 | 2007-09-26 | Eastman Kodak Co | Method of patterning vapour deposition by printing |
EP2252467A1 (en) | 2008-02-06 | 2010-11-24 | Nano Terra Inc. | Stencils with removable backings for forming micron-sized features on surfaces and methods of making and using the same |
DE102008048127A1 (en) * | 2008-09-20 | 2010-03-25 | Mtu Aero Engines Gmbh | Device and method for masking a component zone |
DE102011016453A1 (en) * | 2011-04-08 | 2013-01-17 | Universität Stuttgart | Process for producing a screen printing form and solar cell produced therewith |
DE102013110037B4 (en) | 2013-09-12 | 2018-05-09 | Osram Oled Gmbh | Method for producing an optoelectronic component |
EP4071843A4 (en) * | 2020-01-03 | 2024-01-03 | Hunetplus Co Ltd | Flexible photo-pattern mask for organic light-emitting display with high resolution, and method for manufacturing same |
GB2607115B (en) * | 2021-06-25 | 2023-10-04 | Cipherx Tech Ltd | Method of producing a microneedle array |
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US4093754A (en) * | 1976-04-15 | 1978-06-06 | Parsons Robert C | Method of making decorative panels |
US4527988A (en) * | 1982-09-20 | 1985-07-09 | Lutz Peter L | Porous contraceptive device with an interstitial liquid |
DE3331377A1 (en) * | 1983-08-31 | 1985-03-07 | Elmar Dr. 8000 München Messerschmitt | Screen printing screen |
JPS62108206A (en) * | 1985-11-06 | 1987-05-19 | Canon Inc | Production of color filter |
GB8703107D0 (en) * | 1987-02-11 | 1987-03-18 | Era Patents Ltd | Screen for printing electrical circuits |
DE3841317C2 (en) * | 1988-12-08 | 1996-12-05 | Nokia Deutschland Gmbh | Printing form for screen printing |
JPH02232238A (en) * | 1989-03-04 | 1990-09-14 | Tokuyama Soda Co Ltd | Production of sheet |
US5665496A (en) * | 1994-06-24 | 1997-09-09 | Nippon Oil Co., Ltd. | Method for producing color filter |
-
1999
- 1999-04-20 JP JP2000545072A patent/JP2002512124A/en active Pending
- 1999-04-20 EP EP99918698A patent/EP1080394A1/en not_active Withdrawn
- 1999-04-20 CA CA2329412A patent/CA2329412C/en not_active Expired - Fee Related
- 1999-04-20 WO PCT/US1999/008623 patent/WO1999054786A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
EP1080394A1 (en) | 2001-03-07 |
WO1999054786A1 (en) | 1999-10-28 |
JP2002512124A (en) | 2002-04-23 |
CA2329412C (en) | 2010-09-21 |
CA2329412A1 (en) | 1999-10-28 |
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