WO1991004573A2 - Excimer laser ablation method and apparatus for microcircuit device fabrication - Google Patents
Excimer laser ablation method and apparatus for microcircuit device fabrication Download PDFInfo
- Publication number
- WO1991004573A2 WO1991004573A2 PCT/US1990/004899 US9004899W WO9104573A2 WO 1991004573 A2 WO1991004573 A2 WO 1991004573A2 US 9004899 W US9004899 W US 9004899W WO 9104573 A2 WO9104573 A2 WO 9104573A2
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
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- fluence
- area
- image
- predetermined
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/34—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies not provided for in groups H01L21/0405, H01L21/0445, H01L21/06, H01L21/16 and H01L21/18 with or without impurities, e.g. doping materials
- H01L21/46—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/428
- H01L21/461—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/428 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/34—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies not provided for in groups H01L21/0405, H01L21/0445, H01L21/06, H01L21/16 and H01L21/18 with or without impurities, e.g. doping materials
- H01L21/42—Bombardment with radiation
- H01L21/423—Bombardment with radiation with high-energy radiation
- H01L21/428—Bombardment with radiation with high-energy radiation using electromagnetic radiation, e.g. laser radiation
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Laser Beam Processing (AREA)
Abstract
Description
Claims
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US405,940 | 1989-09-12 | ||
US07/405,940 US5018164A (en) | 1989-09-12 | 1989-09-12 | Excimer laser ablation method and apparatus for microcircuit fabrication |
Publications (2)
Publication Number | Publication Date |
---|---|
WO1991004573A2 true WO1991004573A2 (en) | 1991-04-04 |
WO1991004573A3 WO1991004573A3 (en) | 1991-05-02 |
Family
ID=23605858
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US1990/004899 WO1991004573A2 (en) | 1989-09-12 | 1990-08-29 | Excimer laser ablation method and apparatus for microcircuit device fabrication |
Country Status (4)
Country | Link |
---|---|
US (1) | US5018164A (en) |
EP (1) | EP0443023A1 (en) |
JP (1) | JPH04501829A (en) |
WO (1) | WO1991004573A2 (en) |
Families Citing this family (41)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4004736C2 (en) * | 1990-02-15 | 1995-12-14 | Laser Lab Goettingen Ev | Device for the controlled removal of material from a given processing point, in particular in hollow organs or vascular stenoses, by laser ablation |
FR2670021B1 (en) * | 1990-12-04 | 1994-03-04 | Thomson Csf | PROCESS FOR PRODUCING MICROLENTILES FOR OPTICAL APPLICATIONS. |
US5195163A (en) * | 1991-09-27 | 1993-03-16 | The United States Of America As Represented By The Secretary Of The Navy | Fabrication and phase tuning of an optical waveguide device |
US5454902A (en) * | 1991-11-12 | 1995-10-03 | Hughes Aircraft Company | Production of clean, well-ordered CdTe surfaces using laser ablation |
GB2263582B (en) * | 1992-01-21 | 1995-11-01 | Dale Electronics | Laser-formed electrical component and method for making same |
US5446755A (en) * | 1993-02-24 | 1995-08-29 | Matsushita Electric Industrial Co., Ltd. | Laser ablation apparatus |
JPH07308788A (en) * | 1994-05-16 | 1995-11-28 | Sanyo Electric Co Ltd | Optical machining method and production of photovoltaic power device |
WO1996033839A1 (en) | 1995-04-26 | 1996-10-31 | Minnesota Mining And Manufacturing Company | Method and apparatus for step and repeat exposures |
US5878072A (en) * | 1997-03-25 | 1999-03-02 | Seh America, Inc. | Laser alignment cross hair |
US8071384B2 (en) | 1997-12-22 | 2011-12-06 | Roche Diagnostics Operations, Inc. | Control and calibration solutions and methods for their use |
US5853960A (en) * | 1998-03-18 | 1998-12-29 | Trw Inc. | Method for producing a micro optical semiconductor lens |
US6355270B1 (en) | 1999-01-11 | 2002-03-12 | The Regents Of The University Of California | Particles for oral delivery of peptides and proteins |
US7073246B2 (en) * | 1999-10-04 | 2006-07-11 | Roche Diagnostics Operations, Inc. | Method of making a biosensor |
US6662439B1 (en) | 1999-10-04 | 2003-12-16 | Roche Diagnostics Corporation | Laser defined features for patterned laminates and electrodes |
US6645359B1 (en) * | 2000-10-06 | 2003-11-11 | Roche Diagnostics Corporation | Biosensor |
US20060078847A1 (en) * | 2000-09-29 | 2006-04-13 | Kwan Norman H | Dental implant system and additional methods of attachment |
US6540890B1 (en) * | 2000-11-01 | 2003-04-01 | Roche Diagnostics Corporation | Biosensor |
US6814844B2 (en) * | 2001-08-29 | 2004-11-09 | Roche Diagnostics Corporation | Biosensor with code pattern |
US6577448B2 (en) | 2001-09-25 | 2003-06-10 | Siemens Dematic Electronic Assembly Systems, Inc. | Laser system by modulation of power and energy |
US7150811B2 (en) * | 2002-11-26 | 2006-12-19 | Pei Company | Ion beam for target recovery |
US7645373B2 (en) | 2003-06-20 | 2010-01-12 | Roche Diagnostic Operations, Inc. | System and method for coding information on a biosensor test strip |
US8058077B2 (en) | 2003-06-20 | 2011-11-15 | Roche Diagnostics Operations, Inc. | Method for coding information on a biosensor test strip |
US7488601B2 (en) | 2003-06-20 | 2009-02-10 | Roche Diagnostic Operations, Inc. | System and method for determining an abused sensor during analyte measurement |
US7452457B2 (en) | 2003-06-20 | 2008-11-18 | Roche Diagnostics Operations, Inc. | System and method for analyte measurement using dose sufficiency electrodes |
US7718439B2 (en) | 2003-06-20 | 2010-05-18 | Roche Diagnostics Operations, Inc. | System and method for coding information on a biosensor test strip |
US8148164B2 (en) | 2003-06-20 | 2012-04-03 | Roche Diagnostics Operations, Inc. | System and method for determining the concentration of an analyte in a sample fluid |
US8206565B2 (en) | 2003-06-20 | 2012-06-26 | Roche Diagnostics Operation, Inc. | System and method for coding information on a biosensor test strip |
US7645421B2 (en) | 2003-06-20 | 2010-01-12 | Roche Diagnostics Operations, Inc. | System and method for coding information on a biosensor test strip |
CA2529657C (en) | 2003-06-20 | 2011-04-12 | F. Hoffmann-La Roche Ag | Test strip with slot vent opening |
US7084014B2 (en) * | 2003-10-07 | 2006-08-01 | Endicott Interconnect Technologies, Inc. | Method of making circuitized substrate |
RU2006132051A (en) | 2004-02-06 | 2008-03-20 | БАЙЕР ХЕЛТКЭР ЭлЭлСи (US) | OXIDIZABLE COMPOUNDS AS AN INTERNAL STANDARD FOR BIOSENSORS AND METHOD OF APPLICATION |
US7569126B2 (en) | 2004-06-18 | 2009-08-04 | Roche Diagnostics Operations, Inc. | System and method for quality assurance of a biosensor test strip |
AR054851A1 (en) | 2005-07-20 | 2007-07-18 | Bayer Healthcare Llc | REGULATED AMPEROMETRY |
US8404100B2 (en) | 2005-09-30 | 2013-03-26 | Bayer Healthcare Llc | Gated voltammetry |
US7510985B1 (en) | 2005-10-26 | 2009-03-31 | Lpkf Laser & Electronics Ag | Method to manufacture high-precision RFID straps and RFID antennas using a laser |
US7583444B1 (en) * | 2005-12-21 | 2009-09-01 | 3M Innovative Properties Company | Process for making microlens arrays and masterforms |
JP2009537870A (en) * | 2006-05-18 | 2009-10-29 | スリーエム イノベイティブ プロパティズ カンパニー | Method for manufacturing light guide with extraction structure and light guide manufactured by the method |
JP5110830B2 (en) * | 2006-08-31 | 2012-12-26 | 株式会社半導体エネルギー研究所 | Method for manufacturing semiconductor device |
WO2009076302A1 (en) | 2007-12-10 | 2009-06-18 | Bayer Healthcare Llc | Control markers for auto-detection of control solution and methods of use |
IL196690A0 (en) * | 2008-05-29 | 2011-08-01 | Plasan Sasa Ltd | Interchangeable door |
US8818145B2 (en) | 2011-08-03 | 2014-08-26 | Tyco Electronics Corporation | Optical interposer with transparent substrate |
-
1989
- 1989-09-12 US US07/405,940 patent/US5018164A/en not_active Expired - Lifetime
-
1990
- 1990-08-29 WO PCT/US1990/004899 patent/WO1991004573A2/en not_active Application Discontinuation
- 1990-08-29 EP EP90915129A patent/EP0443023A1/en not_active Withdrawn
- 1990-08-29 JP JP3500353A patent/JPH04501829A/en active Pending
Non-Patent Citations (4)
Title |
---|
Appl. Phys. Lett., vol. 48, no. 11, 17 March 1986, American Institute of Physics, C. Arnone et al.: "Laser etching of 0.4 ~m structures in CdTe by dynamic light guiding", pages 736-738 * |
J. Appl. Phys., vol. 58, no. 5, 1 September 1985, American Institute of Physics, J.H. Brannon et al.: "Excimer laser etching of polyimide", pages 2036-2043 * |
Proceedings of the SPIE, Conference: "Laser Assisted Processing", Hamburg, 19-20 September 1988, vol. 1022, SPIE, (Washington, US), P. Gaucherel et al.: "ArF excimer laser ablation of mercury cadmium telluride semiconductor (MCT)", pages 124-128 * |
Proceedings of the SPIE, Conference: "Laser/Optical Processing of Electronic Materials", Santa Clara, 10-11 October 1989, vol. 1190, G.L. OLson et al.: "Excimer laser-assisted deposition and etching of II-VI materials", pages 2-16 * |
Also Published As
Publication number | Publication date |
---|---|
JPH04501829A (en) | 1992-04-02 |
WO1991004573A3 (en) | 1991-05-02 |
EP0443023A1 (en) | 1991-08-28 |
US5018164A (en) | 1991-05-21 |
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