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Publication numberUSD606195 S1
Publication typeGrant
Application numberUS 29/309,566
Publication date15 Dec 2009
Filing date4 Sep 2008
Priority date4 Sep 2008
Publication number29309566, 309566, US D606195 S1, US D606195S1, US-S1-D606195, USD606195 S1, USD606195S1
InventorsGuntmar H. Eisen, Ralf Riesinger, Frank T. Trautwein
Original AssigneeParadigm Spine, Llc
Export CitationBiBTeX, EndNote, RefMan
External Links: USPTO, USPTO Assignment, Espacenet
Interspinous implant
US D606195 S1
Abstract  available in
Images(6)
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Claims(1)
  1. The ornamental design for an interspinous implant, as shown and described.
Description

FIG. 1 is a front perspective view of an interspinous implant showing our new design;

FIG. 2 is a right side elevation thereof;

FIG. 3 is a left side elevation thereof;

FIG. 4 is a rear elevation thereof;

FIG. 5 is a front elevation thereof;

FIG. 6 is a top plan view thereof;

FIG. 7 is a bottom plan view thereof; and,

FIG. 8 is a front perspective view of a modified embodiment of the design shown in FIGS. 1 through 7.

The broken lines in the drawings represent environmental structure and form no part of the claimed design.

Referenced by
Citing PatentFiling datePublication dateApplicantTitle
US20120065683 *13 Sep 201015 Mar 2012Fan-Ching KuoInterspinous process distraction device
US20120323276 *18 Jun 201220 Dec 2012Bryan OkamotoExpandable interspinous device
US20130158604 *6 Feb 201320 Jun 2013Bryan OkamotoExpandable Interspinous Device
Classifications
U.S. ClassificationD24/155