US6839262B2 - Multiple-mode memory and method for forming same - Google Patents

Multiple-mode memory and method for forming same Download PDF

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US6839262B2
US6839262B2 US10/813,455 US81345504A US6839262B2 US 6839262 B2 US6839262 B2 US 6839262B2 US 81345504 A US81345504 A US 81345504A US 6839262 B2 US6839262 B2 US 6839262B2
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memory cells
type
memory
word lines
bit lines
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Michael A. Vyvoda
Christopher S. Moore
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SanDisk Technologies LLC
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Matrix Semiconductor Inc
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    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/02Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
    • G11C11/16Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/005Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor comprising combined but independently operative RAM-ROM, RAM-PROM, RAM-EPROM cells
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C17/00Read-only memories programmable only once; Semi-permanent stores, e.g. manually-replaceable information cards
    • G11C17/14Read-only memories programmable only once; Semi-permanent stores, e.g. manually-replaceable information cards in which contents are determined by selectively establishing, breaking or modifying connecting links by permanently altering the state of coupling elements, e.g. PROM
    • G11C17/16Read-only memories programmable only once; Semi-permanent stores, e.g. manually-replaceable information cards in which contents are determined by selectively establishing, breaking or modifying connecting links by permanently altering the state of coupling elements, e.g. PROM using electrically-fusible links
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C2216/00Indexing scheme relating to G11C16/00 and subgroups, for features not directly covered by these groups
    • G11C2216/12Reading and writing aspects of erasable programmable read-only memories
    • G11C2216/26Floating gate memory which is adapted to be one-time programmable [OTP], e.g. containing multiple OTP blocks permitting limited update ability

Definitions

  • This invention relates to solid-state integrated circuit memories, and in particular to improved solid-state integrated circuit memories that provide multiple models of operation.
  • Modern computing systems often include both read-only memory for boot up or archiving purposes and re-writable memory such as DRAM, flash, and magnetic disks.
  • re-writable memory such as DRAM, flash, and magnetic disks.
  • read-only memories are built and packaged separately from re-writable memories, and this increases system cost and complicates system assembly.
  • the preferred embodiments described below relate to a multiple mode memory that includes both field-programmable write-once memory cells and field-programmable re-writable memory cells carried by the same integrated circuit substrate and addressed by the same I/O circuitry.
  • the multiple-mode memory is a three-dimensional memory having multiple, vertically-stacked layers of memory cells. Some of these layers include the write-once memory cells and others of the layers include the re-writable memory cells. In this way, both types of memory are provided on a single integrated circuit substrate. This reduces manufacturing cost and simplifies assembly of a computer system employing both types of memory cells. Additional types and numbers of types of memory cells can be used.
  • FIG. 1 is a top view of a multiple-mode memory that incorporates a presently preferred embodiment of this invention.
  • FIG. 2 is a fragmentary, schematic, cross-sectional view of the memory of FIG. 1 .
  • FIG. 3 is a fragmentary isometric view of a write-once memory cell included in the memory of FIG. 1 .
  • FIG. 4 is a schematic isometric view of another write-once memory cell suitable for use in the memory of FIG. 1 .
  • FIG. 5 is a schematic isometric view of a re-writable memory cell suitable for use in the memory of FIG. 1 .
  • FIG. 6 is a flow chart of a method for forming portions of the memory of FIG. 1 .
  • FIG. 7 is a fragmentary, schematic, cross-sectional view of a memory of a presently preferred embodiment having memory cells of three different types.
  • FIG. 8 is a fragmentary, schematic, cross-sectional view of a memory of a presently preferred embodiment in which memory cells are assigned to different levels (L1, L2, L3) of cache hierarchy.
  • FIG. 1 shows a top plan view of a multiple-mode memory 10 that is formed on and carried by an integrated circuit substrate 12 .
  • the memory 10 includes an array of word lines 14 arranged orthogonally to an array of bit lines 16 .
  • Read and write voltages on the word lines 14 and the bit lines 16 are controlled by I/O circuitry 70 including X decoders 72 coupled to the word lines 14 and Y decoders 74 coupled to the bit lines 16 .
  • FIG. 2 provides a fragmentary cross-sectional view that illustrates the arrangement of memory cells 18 between adjacent word lines 14 and bit lines 16 .
  • the substrate 12 carries three levels of word lines 14 and two levels of bit lines 16 .
  • Memory cells 18 are formed at each crossing between adjacent word lines 14 and bit lines 16 .
  • there are four levels of memory cells 18 (LEVEL 1 , LEVEL 2 , LEVEL 3 , LEVEL 4 ) stacked vertically one on top of the other, and the memory 10 is a three-dimensional memory.
  • the memory cells 18 of FIG. 2 include both field-programmable write-once memories and field-programmable re-writable memories.
  • FIG. 3 provides a schematic illustration of a field-programmable write-once memory cell 20 which can be fabricated as described in U.S. Pat. Nos. 6,185,122 and 6,034,882 (Johnson et al.), which are assigned to the assignee of the present invention and are hereby incorporated by reference.
  • the write-once memory cell 20 includes an anti-fuse layer 22 and first and second diode components 24 , 26 .
  • the anti-fuse layer 22 may be formed of an insulator such as silicon dioxide, and the anti-fuse layer 22 is initially fabricated as an intact insulating layer that restricts the flow of current between the adjacent word line 14 and bit line 16 .
  • the diode components 24 , 26 in this example are oppositely doped.
  • the diode components 24 , 26 form a diode across the breached anti-fuse layer 22 limiting current flow across the memory cell 20 to a selected direction.
  • the memory cell 20 includes side walls 30 that are aligned with side edges 32 of the adjacent word line 14 . This can be accomplished in a single photolithographic masking operation that patterns both the side walls 30 and the side edges 32 using a single mask to create the pattern. Similarly, the side walls 34 of the memory cell 20 are automatically aligned with the side edges 36 of the adjacent bit line 16 by a single photolithographic masking operation that creates the pattern for both the side walls 32 and side edges 36 in a single masking operation. Such automatic alignment techniques are described in detail in the above-identified Johnson patents, and they reduce the number of masking operations and therefore the cost of the multiple-mode memory 10 .
  • the field-programmable write-once memory cells 20 are initially fabricated with an intact anti-fuse layer 22 . In the field any desired one of the field-programmable write-once memory cells 20 can be written to the other binary logic state by applying a write pulse of sufficient voltage and power. Thus, the write-once memory cells 20 can be used as a field-programmable read-only memory, as for example for archiving and other user-initiated storage operations.
  • the write-once memory cell 40 includes an anti-fuse layer 42 and two diode components 44 , 46 .
  • the memory cell 40 differs from the memory cell 20 in that the diode components 44 , 46 are both situated on the same side of the anti-fuse layer 42 , while the diode components 24 , 26 are situated on opposite sides of the anti-fuse layer 22 .
  • FIGS. 3 and 4 provide only two examples of suitable write-once memory cells. Many alternatives are possible, including all of the memory cells described in U.S. patent application Ser. Nos. 09/560,626 and 09/814,727, which are assigned to the assignee of the present invention and are hereby incorporated by reference.
  • the anti-fuse layers may extend continuously over multiple adjacent memory cells, as can the diode components. Diode components may not be required in all cases, and if used they may not require separate layers.
  • the diode components may be integrated into and formed by the adjacent word and bit lines, as for example when the word or bit lines comprise doped polysilicon conductors.
  • the multiple-mode memory 10 also includes field-programmable re-writable memory cells such as the memory cell 50 of FIG. 5 .
  • the memory cell 50 in FIG. 5 is a TFT-SONOS (thin film transistor, silicon-oxide-nitride-oxide-silicon) re-writeable memory cell.
  • the memory cell 50 comprises a wordline 52 that acts as a gate, bitlines 54 , 56 that act as sources/drains, an oxide-nitride-oxide (ONO) charge trapping medium 58 that alters the threshold voltage (Vt) of the thin film transistor (TFT), and a channel 59 .
  • Vt threshold voltage
  • TFT thin film transistor
  • one set of “rails” acts as bitlines and as dopant (“updiffusion”) sources for the channel region of the TFT.
  • the bitlines deposit stack, photomask, etch, gap fill, and perform a chemical-mechanical-polishing (CMP) operation flush to the silicon
  • the channel silicon is deposited, either as undoped amorphous and ion implanted, or in-situ doped as lightly P-type.
  • the ONO charge trapping dielectric films are then deposited (similar film stacks are used in flash memory technology). Gates are then deposited and patterned.
  • the sources/drains are formed by updiffusion of N-type dopants into the channel upon subsequent heat treatments.
  • the device is written and erased in a fashion similar to flash memory (i.e., writing the cell involves trapping charge in the ONO film, altering the threshold voltage of the TFT).
  • the TFT-SONOS memory cell and other suitable types of re-writeable memory cells are described in U.S. patent application Ser. No. 09/927,648, which is assigned to the assignee of the present invention and is hereby incorporated by reference.
  • the write-once memory cells 20 , 40 and the re-writable memory cells 50 are included in the same three-dimensional memory array and are accessed by the same I/O circuitry 70 .
  • the memory cells 18 are shown arranged in four vertically stacked levels.
  • any desired memory cell level j is fabricated of write-once memory cells 20 , 40 without any re-writable memory cells 50 .
  • Any other desired memory cell level k includes only re-writable memory cells 50 without any write-once memory cells 20 , 40 .
  • any selected level of memory cells can be fabricated as either write-once memory cells or as re-writable memory cells, depending upon the particular application.
  • any number of combinations of write-once memory cells and re-writable memory cells can be achieved, and if desired both types of memory cells may be included within a single level.
  • the programming and read voltages, currents, and powers are similar for both the write-once memory cells 20 , 40 and the re-writable memory cells 50 . This allows the same logic and I/O circuitry 70 to be used for both types of memory cells.
  • the re-writable memory cell 50 described above can be formed with only a small number of additional processing steps as compared to the steps required for creating the write-once memory cells 20 , 40 . With this approach, specific levels of memory cells can be designated as write-once or re-writable during fabrication with little alteration to the mask set or the processing steps.
  • FIG. 6 provides a flow chart of a method for fabricating the memory 10 of FIG. 1 .
  • an integrated circuit substrate is provided.
  • Such a substrate typically includes a monocrystalline semiconductor wafer, as for example a monocrystalline silicon wafer.
  • a first level of memory cells is formed overlying and carried by the substrate.
  • This first level of memory cells can include write-once memory cells, re-writable memory cells, or some combination of both types of memory cells, as described above.
  • a second level of memory cells is formed overlying and vertically stacked above the first level of memory cells.
  • the second level of memory cells can include write-once memory cells, re-writable memory cells, or some combination. Additional levels of memory cells may be added, and then in block 86 a top level of memory cells is formed, once again including any desired combination of write-once memory cells and re-writable memory cells.
  • the multiple-mode memories described above include both write-once and re-writable memory cells in a single three-dimensional memory array. This provides both re-writability and permanent data storage in an inexpensive, single chip solution.
  • FIG. 7 shows a memory having three different types of memory cells (memory cells of a first type, memory cells of a second type, and memory cells of a third type).
  • a plurality of memory types can be used per die to resolve different memory requirements.
  • one die might contain two completely separate 3-D write-once cells, one cell programmed during manufacturing for register settings used by a controller and another updateable in the field to store data, such as a digital media file (e.g., pictures, songs).
  • the same die might contain multiple re-writeable memory cells (e.g., flash, 3-D memory, DRAM, SRAM) to store file system structures (such as a FAT table, root directory, or sub-directory) or data with different speed or access time requirements (e.g., the write and/or read times can vary).
  • file system structures such as a FAT table, root directory, or sub-directory
  • data with different speed or access time requirements e.g., the write and/or read times can vary.
  • a plurality of re-writeable cells may be used for different data types.
  • memory cells can be assigned for different levels of cache hierarchies (e.g., L1, L2, L3 cache) (see FIG. 8 ).
  • L1, L2, L3 cache see FIG. 8 .
  • two groups of memory cells can be of different types even if they are both write-once or re-writable.
  • two groups of write-once (or re-writable) memory cells are of different types if they have different read and/or write times.
  • Different memory cells can be built into the two-dimensional substrate (as described in U.S. patent application Ser. No. 09/638,334, which is assigned to the assignee of the present invention and is hereby incorporated by reference) or in 3-D arrays as different cost and performance tradeoffs dictate. For example, faster memory can be built into the two-dimensional substrate, and slower memory can be built in the 3-D array.
  • the term “carried by” is intended broadly to refer to layers or materials that are formed on an integrated circuit substrate. Layers that are carried by a substrate include layers that do not make physical contact with the substrate. For example, all of the memory cells shown in FIG. 2 are said to be carried by the substrate 12 , even though the upper levels of memory cells are stacked above lower levels of memory cells.
  • the term “overlie” is intended broadly to cover layers or films that overlie a structure either directly or indirectly. Again with reference to FIG. 2 , the memory cells 18 are said to overlie the substrate 12 , even though at least one word line is interposed between each memory cell and the substrate.
  • field-programmable indicates that a signal can be written into a memory cell in the field, after the memory cell has been fabricated and assembled into a working digital storage system.
  • a mask-programmed read-only memory is not considered to be field-programmable as that term is used here.

Abstract

A multiple-mode memory includes a three-dimensional array of word lines, bit lines and memory cells. The memory cells are arranged in multiple vertically stacked layers. In some layers the memory cells are implemented as field-programmable write-once memory cells, and in other layers the memory cells are implemented as field-programmable re-writable memory cells. In this way, both re-writability and permanent data storage are provided in an inexpensive, single-chip solution. Additional types and numbers of types of memory cells can be used.

Description

CROSS-REFERENCE TO RELATED APPLICATIONS
This application is a continuation of U.S. patent application Ser. No. 10/184,578, filed Jun. 27, 2002 now U.S. Pat. No. 6,768,661, which is hereby incorporated by reference.
BACKGROUND
This invention relates to solid-state integrated circuit memories, and in particular to improved solid-state integrated circuit memories that provide multiple models of operation.
Modern computing systems often include both read-only memory for boot up or archiving purposes and re-writable memory such as DRAM, flash, and magnetic disks. Typically, read-only memories are built and packaged separately from re-writable memories, and this increases system cost and complicates system assembly.
SUMMARY
By way of general introduction, the preferred embodiments described below relate to a multiple mode memory that includes both field-programmable write-once memory cells and field-programmable re-writable memory cells carried by the same integrated circuit substrate and addressed by the same I/O circuitry. In one non-limiting example, the multiple-mode memory is a three-dimensional memory having multiple, vertically-stacked layers of memory cells. Some of these layers include the write-once memory cells and others of the layers include the re-writable memory cells. In this way, both types of memory are provided on a single integrated circuit substrate. This reduces manufacturing cost and simplifies assembly of a computer system employing both types of memory cells. Additional types and numbers of types of memory cells can be used.
The foregoing sections have been provided by way of general introduction, and they are not intended to narrow the scope of the following claims.
BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 is a top view of a multiple-mode memory that incorporates a presently preferred embodiment of this invention.
FIG. 2 is a fragmentary, schematic, cross-sectional view of the memory of FIG. 1.
FIG. 3 is a fragmentary isometric view of a write-once memory cell included in the memory of FIG. 1.
FIG. 4 is a schematic isometric view of another write-once memory cell suitable for use in the memory of FIG. 1.
FIG. 5 is a schematic isometric view of a re-writable memory cell suitable for use in the memory of FIG. 1.
FIG. 6 is a flow chart of a method for forming portions of the memory of FIG. 1.
FIG. 7 is a fragmentary, schematic, cross-sectional view of a memory of a presently preferred embodiment having memory cells of three different types.
FIG. 8 is a fragmentary, schematic, cross-sectional view of a memory of a presently preferred embodiment in which memory cells are assigned to different levels (L1, L2, L3) of cache hierarchy.
DETAILED DESCRIPTION OF THE DRAWINGS
Turning now to the drawings, FIG. 1 shows a top plan view of a multiple-mode memory 10 that is formed on and carried by an integrated circuit substrate 12. As shown schematically in FIG. 1, the memory 10 includes an array of word lines 14 arranged orthogonally to an array of bit lines 16. Read and write voltages on the word lines 14 and the bit lines 16 are controlled by I/O circuitry 70 including X decoders 72 coupled to the word lines 14 and Y decoders 74 coupled to the bit lines 16.
FIG. 2 provides a fragmentary cross-sectional view that illustrates the arrangement of memory cells 18 between adjacent word lines 14 and bit lines 16. In this non-limiting example, the substrate 12 carries three levels of word lines 14 and two levels of bit lines 16. Memory cells 18 are formed at each crossing between adjacent word lines 14 and bit lines 16. In this non-limiting example, there are four levels of memory cells 18 (LEVEL 1, LEVEL 2, LEVEL 3, LEVEL 4) stacked vertically one on top of the other, and the memory 10 is a three-dimensional memory.
The memory cells 18 of FIG. 2 include both field-programmable write-once memories and field-programmable re-writable memories.
FIG. 3 provides a schematic illustration of a field-programmable write-once memory cell 20 which can be fabricated as described in U.S. Pat. Nos. 6,185,122 and 6,034,882 (Johnson et al.), which are assigned to the assignee of the present invention and are hereby incorporated by reference. In one example, the write-once memory cell 20 includes an anti-fuse layer 22 and first and second diode components 24, 26. The anti-fuse layer 22 may be formed of an insulator such as silicon dioxide, and the anti-fuse layer 22 is initially fabricated as an intact insulating layer that restricts the flow of current between the adjacent word line 14 and bit line 16. The diode components 24, 26 in this example are oppositely doped. When the anti-fuse layer 22 is breached by a sufficiently high-voltage write pulse, the diode components 24, 26 form a diode across the breached anti-fuse layer 22 limiting current flow across the memory cell 20 to a selected direction.
Note that in this example the memory cell 20 includes side walls 30 that are aligned with side edges 32 of the adjacent word line 14. This can be accomplished in a single photolithographic masking operation that patterns both the side walls 30 and the side edges 32 using a single mask to create the pattern. Similarly, the side walls 34 of the memory cell 20 are automatically aligned with the side edges 36 of the adjacent bit line 16 by a single photolithographic masking operation that creates the pattern for both the side walls 32 and side edges 36 in a single masking operation. Such automatic alignment techniques are described in detail in the above-identified Johnson patents, and they reduce the number of masking operations and therefore the cost of the multiple-mode memory 10.
The field-programmable write-once memory cells 20 are initially fabricated with an intact anti-fuse layer 22. In the field any desired one of the field-programmable write-once memory cells 20 can be written to the other binary logic state by applying a write pulse of sufficient voltage and power. Thus, the write-once memory cells 20 can be used as a field-programmable read-only memory, as for example for archiving and other user-initiated storage operations.
Many alternative structures can be used for the field-programmable write-once memory cells of the memory 10. For example, as shown in FIG. 4 the write-once memory cell 40 includes an anti-fuse layer 42 and two diode components 44, 46. The memory cell 40 differs from the memory cell 20 in that the diode components 44, 46 are both situated on the same side of the anti-fuse layer 42, while the diode components 24, 26 are situated on opposite sides of the anti-fuse layer 22.
FIGS. 3 and 4 provide only two examples of suitable write-once memory cells. Many alternatives are possible, including all of the memory cells described in U.S. patent application Ser. Nos. 09/560,626 and 09/814,727, which are assigned to the assignee of the present invention and are hereby incorporated by reference. As yet another alternative, the anti-fuse layers may extend continuously over multiple adjacent memory cells, as can the diode components. Diode components may not be required in all cases, and if used they may not require separate layers. For example, the diode components may be integrated into and formed by the adjacent word and bit lines, as for example when the word or bit lines comprise doped polysilicon conductors.
The multiple-mode memory 10 also includes field-programmable re-writable memory cells such as the memory cell 50 of FIG. 5. The memory cell 50 in FIG. 5 is a TFT-SONOS (thin film transistor, silicon-oxide-nitride-oxide-silicon) re-writeable memory cell. The memory cell 50 comprises a wordline 52 that acts as a gate, bitlines 54, 56 that act as sources/drains, an oxide-nitride-oxide (ONO) charge trapping medium 58 that alters the threshold voltage (Vt) of the thin film transistor (TFT), and a channel 59. With a TFT-SONOS re-writeable memory cell, one set of “rails” acts as bitlines and as dopant (“updiffusion”) sources for the channel region of the TFT. Upon forming the bitlines (deposit stack, photomask, etch, gap fill, and perform a chemical-mechanical-polishing (CMP) operation flush to the silicon), the channel silicon is deposited, either as undoped amorphous and ion implanted, or in-situ doped as lightly P-type. The ONO charge trapping dielectric films are then deposited (similar film stacks are used in flash memory technology). Gates are then deposited and patterned. The sources/drains are formed by updiffusion of N-type dopants into the channel upon subsequent heat treatments. The device is written and erased in a fashion similar to flash memory (i.e., writing the cell involves trapping charge in the ONO film, altering the threshold voltage of the TFT). The TFT-SONOS memory cell and other suitable types of re-writeable memory cells are described in U.S. patent application Ser. No. 09/927,648, which is assigned to the assignee of the present invention and is hereby incorporated by reference.
The write- once memory cells 20, 40 and the re-writable memory cells 50 are included in the same three-dimensional memory array and are accessed by the same I/O circuitry 70. For example, in FIG. 2 the memory cells 18 are shown arranged in four vertically stacked levels. In one non-limiting example, any desired memory cell level j is fabricated of write- once memory cells 20, 40 without any re-writable memory cells 50. Any other desired memory cell level k includes only re-writable memory cells 50 without any write-once memory cells 20, 40. With this approach, any selected level of memory cells can be fabricated as either write-once memory cells or as re-writable memory cells, depending upon the particular application. Any number of combinations of write-once memory cells and re-writable memory cells can be achieved, and if desired both types of memory cells may be included within a single level. In this non-limiting example, the programming and read voltages, currents, and powers are similar for both the write- once memory cells 20, 40 and the re-writable memory cells 50. This allows the same logic and I/O circuitry 70 to be used for both types of memory cells.
The re-writable memory cell 50 described above can be formed with only a small number of additional processing steps as compared to the steps required for creating the write- once memory cells 20, 40. With this approach, specific levels of memory cells can be designated as write-once or re-writable during fabrication with little alteration to the mask set or the processing steps.
FIG. 6 provides a flow chart of a method for fabricating the memory 10 of FIG. 1. In block 80 an integrated circuit substrate is provided. Such a substrate typically includes a monocrystalline semiconductor wafer, as for example a monocrystalline silicon wafer. The term “integrated circuit substrate” as used herein as intended to refer to a substrate suitable for carrying an integrated circuit thereon, and an integrated circuit substrate does not include other types of substrates such as printed circuit boards on which circuits are separately formed and then mounted.
Returning to FIG. 6, in block 82 a first level of memory cells is formed overlying and carried by the substrate. This first level of memory cells can include write-once memory cells, re-writable memory cells, or some combination of both types of memory cells, as described above. In block 84 a second level of memory cells is formed overlying and vertically stacked above the first level of memory cells. The second level of memory cells can include write-once memory cells, re-writable memory cells, or some combination. Additional levels of memory cells may be added, and then in block 86 a top level of memory cells is formed, once again including any desired combination of write-once memory cells and re-writable memory cells.
The multiple-mode memories described above include both write-once and re-writable memory cells in a single three-dimensional memory array. This provides both re-writability and permanent data storage in an inexpensive, single chip solution.
While the preferred embodiments described above contained two types of memory cells (field-programmable write-once and field-programmable re-writable), it is important to note that there is no limit to the number of memory types that can be used. For example, FIG. 7 shows a memory having three different types of memory cells (memory cells of a first type, memory cells of a second type, and memory cells of a third type). A plurality of memory types can be used per die to resolve different memory requirements. For example, one die might contain two completely separate 3-D write-once cells, one cell programmed during manufacturing for register settings used by a controller and another updateable in the field to store data, such as a digital media file (e.g., pictures, songs). Additionally, the same die might contain multiple re-writeable memory cells (e.g., flash, 3-D memory, DRAM, SRAM) to store file system structures (such as a FAT table, root directory, or sub-directory) or data with different speed or access time requirements (e.g., the write and/or read times can vary). As data can be allocated for different performance requirements, a plurality of re-writeable cells may be used for different data types. Moreover, memory cells can be assigned for different levels of cache hierarchies (e.g., L1, L2, L3 cache) (see FIG. 8). U.S. patent application Ser. No. 10/186,356, which is assigned to the assignee of the present invention and is hereby incorporated by reference, describes caching embodiments that can be used with the multiple-mode memories of these preferred embodiments.
As indicated by the above examples, in some situations, two groups of memory cells can be of different types even if they are both write-once or re-writable. For example, two groups of write-once (or re-writable) memory cells are of different types if they have different read and/or write times.
Different memory cells can be built into the two-dimensional substrate (as described in U.S. patent application Ser. No. 09/638,334, which is assigned to the assignee of the present invention and is hereby incorporated by reference) or in 3-D arrays as different cost and performance tradeoffs dictate. For example, faster memory can be built into the two-dimensional substrate, and slower memory can be built in the 3-D array. U.S. patent application Ser. No. 10/185,588, which is assigned to the assignee of the present invention and is hereby incorporated by reference, describes additional embodiments that can be used with the multiple-mode memories of these preferred embodiments.
As used herein, the term “carried by” is intended broadly to refer to layers or materials that are formed on an integrated circuit substrate. Layers that are carried by a substrate include layers that do not make physical contact with the substrate. For example, all of the memory cells shown in FIG. 2 are said to be carried by the substrate 12, even though the upper levels of memory cells are stacked above lower levels of memory cells.
As used herein, the term “overlie” is intended broadly to cover layers or films that overlie a structure either directly or indirectly. Again with reference to FIG. 2, the memory cells 18 are said to overlie the substrate 12, even though at least one word line is interposed between each memory cell and the substrate.
The term “field-programmable” indicates that a signal can be written into a memory cell in the field, after the memory cell has been fabricated and assembled into a working digital storage system. Thus, a mask-programmed read-only memory is not considered to be field-programmable as that term is used here.
The term “set” is intended broadly to include one or more.
The foregoing detailed description has described only a few of the many forms that this invention can take. For this reason, this detailed description is intended by way of illustration, and not by way of limitation. It is only the following claims, including all equivalents, which are intended to define the scope of this invention.

Claims (20)

1. A multiple-mode memory comprising:
an integrated circuit substrate;
a plurality of word lines;
a plurality of bit lines crossing the word lines;
a plurality of memory cells, each memory cell coupled between a respective word line and a respective bit line, the word lines, bit lines and memory cells included in a single integrated circuit carried by the substrate;
the memory cells comprising a plurality of memory cells of a first type and a plurality of memory cells of a second type;
wherein the memory cells of the first type are programmed during manufacturing, and wherein the memory cells of the second type are programmed in the field.
2. The invention of claim 1, wherein the memory cells of one of the first and second type have a different write time than the memory cells of the other of the first and second type.
3. The invention of claim 1, wherein the memory cells of one of the first and second type have a different read time than the memory cells of the other of the first and second type.
4. The invention of claim 1, wherein the memory cells of the first type store register settings, and wherein the memory cells of the second type store data.
5. The invention of claim 1, wherein the memory cells further comprise a plurality of memory cells of a third type.
6. The invention of claim 1, wherein the word lines are stacked in multiple levels, wherein the bit lines are stacked in multiple levels, and wherein the memory cells are stacked in multiple levels.
7. The invention of claim 1 further comprising:
I/O circuitry carried by the substrate and coupled both with the plurality of memory cells of the first type and the plurality of memory cells of the second type via the respective word lines and bit lines.
8. A multiple-mode memory comprising:
an integrated circuit substrate;
a plurality of word lines;
a plurality of bit lines crossing the word lines;
a plurality of memory cells, each memory cell coupled between a respective word line and a respective bit line, the word lines, bit lines and memory cells included in a single integrated circuit carried by the substrate;
the memory cells comprising a plurality of memory cells of a first type and a plurality of memory cells of a second type;
wherein the memory cells of the first type store a file system structure, and wherein the memory cells of the second type store a digital media file.
9. The invention of claim 8, wherein the memory cells of one of the first and second type have a different write time than the memory cells of the other of the first and second type.
10. The invention of claim 8, wherein the memory cells of one of the first and second type have a different read time than the memory cells of the other of the first and second type.
11. The invention of claim 8, wherein the memory cells further comprise a plurality of memory cells of a third type.
12. The invention of claim 8, wherein the word lines are stacked in multiple levels, wherein the bit lines are stacked in multiple levels, and wherein the memory cells are stacked in multiple levels.
13. The invention of claim 8 further comprising:
I/O circuitry carried by the substrate and coupled both with the plurality of memory cells of the first type and the plurality of memory cells of the second type via the respective word lines and bit lines.
14. A multiple-mode memory comprising:
an integrated circuit substrate;
a plurality of word lines;
a plurality of bit lines crossing the word lines;
a plurality of memory cells, each memory cell coupled between a respective word line and a respective bit line, the word lines, bit lines and memory cells included in a single integrated circuit carried by the substrate;
the memory cells comprising a plurality of memory cells of a first type and a plurality of memory cells of a second type;
wherein the memory cells of the first type store a different data type than the memory cells of the second type.
15. The invention of claim 14, wherein the memory cells of one of the first and second type have a different write time than the memory cells of the other of the first and second type.
16. The invention of claim 14, wherein the memory cells of one of the first and second type have a different read time than the memory cells of the other of the first and second type.
17. The invention of claim 14, wherein the memory cells of the first type are assigned a different level of cache hierarchy than the memory cells of the second type.
18. The invention of claim 14, wherein the memory cells further comprise a plurality of memory cells of a third type.
19. The invention of claim 14, wherein the word lines are stacked in multiple levels, wherein the bit lines are stacked in multiple levels, and wherein the memory cells are stacked in multiple levels.
20. The invention of claim 14 further comprising:
I/O circuitry carried by the substrate and coupled both with the plurality of memory cells of the first type and the plurality of memory cells of the second type via the respective word lines and bit lines.
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Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070069276A1 (en) * 2005-09-28 2007-03-29 Scheuerlein Roy E Multi-use memory cell and memory array
US20070104746A1 (en) * 2005-07-29 2007-05-10 Seishiro Fujii Methods and compositions for reducing skin damage
US20070222693A1 (en) * 2006-03-27 2007-09-27 Liviu Popa-Simil Multi-band terahertz receiver and imaging device
US20080023790A1 (en) * 2006-07-31 2008-01-31 Scheuerlein Roy E Mixed-use memory array
US20080025118A1 (en) * 2006-07-31 2008-01-31 Scheuerlein Roy E Method for using a mixed-use memory array
US20080025062A1 (en) * 2006-07-31 2008-01-31 Scheuerlein Roy E Method for using a mixed-use memory array with different data states
US20080244203A1 (en) * 2007-03-30 2008-10-02 Gorobets Sergey A Apparatus combining lower-endurance/performance and higher-endurance/performance information storage to support data processing
US20080244202A1 (en) * 2007-03-30 2008-10-02 Gorobets Sergey A Method combining lower-endurance/performance and higher-endurance/performance information storage to support data processing
US20080244179A1 (en) * 2007-03-30 2008-10-02 Kealy Kevin P Memory device with a built-in memory array and a connector for a removable memory device
US20080244113A1 (en) * 2007-03-30 2008-10-02 Kealy Kevin P Method for using a memory device with a built-in memory array and a connector for a removable memory device
US7630225B2 (en) 2006-09-29 2009-12-08 Sandisk Corporation Apparatus combining once-writeable and rewriteable information storage to support data processing
US7730270B2 (en) 2006-09-29 2010-06-01 Sandisk Corporation Method combining once-writeable and rewriteable information storage to support data processing
US20100277967A1 (en) * 2009-04-29 2010-11-04 Macronix International Co., Ltd. Graded metal oxide resistance based semiconductor memory device

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7157314B2 (en) 1998-11-16 2007-01-02 Sandisk Corporation Vertically stacked field programmable nonvolatile memory and method of fabrication
US8575719B2 (en) 2000-04-28 2013-11-05 Sandisk 3D Llc Silicon nitride antifuse for use in diode-antifuse memory arrays
US6525953B1 (en) * 2001-08-13 2003-02-25 Matrix Semiconductor, Inc. Vertically-stacked, field-programmable, nonvolatile memory and method of fabrication
US7057914B2 (en) * 2002-08-02 2006-06-06 Unity Semiconductor Corporation Cross point memory array with fast access time
US6777290B2 (en) * 2002-08-05 2004-08-17 Micron Technology, Inc. Global column select structure for accessing a memory
DE10259634B4 (en) * 2002-12-18 2008-02-21 Qimonda Ag Method of making contacts on a wafer
JP2005014302A (en) * 2003-06-24 2005-01-20 Sony Corp Synthetic resin card and its manufacturing method
US6947333B2 (en) * 2003-10-30 2005-09-20 Hewlett-Packard Development Company, L.P. Memory device
US7177191B2 (en) * 2004-12-30 2007-02-13 Sandisk 3D Llc Integrated circuit including memory array incorporating multiple types of NAND string structures
US7709334B2 (en) * 2005-12-09 2010-05-04 Macronix International Co., Ltd. Stacked non-volatile memory device and methods for fabricating the same
US8482052B2 (en) 2005-01-03 2013-07-09 Macronix International Co., Ltd. Silicon on insulator and thin film transistor bandgap engineered split gate memory
EP1886261B1 (en) * 2005-05-31 2011-11-16 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device
US7420242B2 (en) 2005-08-31 2008-09-02 Macronix International Co., Ltd. Stacked bit line dual word line nonvolatile memory
US7567351B2 (en) * 2006-02-02 2009-07-28 Kla-Tencor Corporation High resolution monitoring of CD variations
WO2008016419A2 (en) * 2006-07-31 2008-02-07 Sandisk 3D Llc Mixed-use memory array and method for use therewith
WO2008016421A2 (en) * 2006-07-31 2008-02-07 Sandisk 3D Llc Mixed-use memory array with different data states and method for use therewith
US8275927B2 (en) * 2007-12-31 2012-09-25 Sandisk 3D Llc Storage sub-system for a computer comprising write-once memory devices and write-many memory devices and related method
US9240405B2 (en) 2011-04-19 2016-01-19 Macronix International Co., Ltd. Memory with off-chip controller
KR20130010915A (en) * 2012-10-23 2013-01-29 김성동 Three-dimensional semiconductor devices having a cache memory array, in which chapter data can be stored, and methods of operating the same
US9875789B2 (en) 2013-11-22 2018-01-23 Taiwan Semiconductor Manufacturing Company, Ltd. 3D structure for advanced SRAM design to avoid half-selected issue
US9691475B2 (en) 2015-03-19 2017-06-27 Micron Technology, Inc. Constructions comprising stacked memory arrays
US10897627B2 (en) 2019-01-11 2021-01-19 Western Digital Technologies, Inc. Non-volatile memory system including a partial decoder and event detector for video streams
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US11275520B2 (en) 2020-03-02 2022-03-15 Micron Technology, Inc. Media type selection using a processor in memory
US11275521B2 (en) 2020-03-02 2022-03-15 Micron Technology, Inc. Image data based media type selection based on a first identified attribute of the initial image data
US11328511B2 (en) 2020-03-13 2022-05-10 Western Digital Technologies, Inc. Storage system and method for improved playback analysis
US11140445B1 (en) 2020-06-03 2021-10-05 Western Digital Technologies, Inc. Storage system and method for storing scalable video
US11818406B2 (en) 2020-07-23 2023-11-14 Western Digital Technologies, Inc. Data storage server with on-demand media subtitles

Citations (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4799196A (en) 1986-02-28 1989-01-17 Fujitsu Limited Semiconductor memory device comprising different type memory cells
US5029125A (en) 1989-03-07 1991-07-02 Drexler Technology Corporation Method of reading and writing files on nonerasable storage media
US5249282A (en) 1990-11-21 1993-09-28 Benchmarq Microelectronics, Inc. Integrated cache memory system with primary and secondary cache memories
US5285323A (en) 1990-10-05 1994-02-08 Digital Equipment Corporation Integrated circuit chip having primary and secondary random access memories for a hierarchical cache
US5515333A (en) 1991-10-29 1996-05-07 Hitachi, Ltd. Semiconductor memory
US5561622A (en) 1993-09-13 1996-10-01 International Business Machines Corporation Integrated memory cube structure
US5699317A (en) 1992-01-22 1997-12-16 Ramtron International Corporation Enhanced DRAM with all reads from on-chip cache and all writers to memory array
US5812418A (en) 1996-10-31 1998-09-22 International Business Machines Corporation Cache sub-array method and apparatus for use in microprocessor integrated circuits
US5818748A (en) 1995-11-21 1998-10-06 International Business Machines Corporation Chip function separation onto separate stacked chips
US5835396A (en) 1996-10-17 1998-11-10 Zhang; Guobiao Three-dimensional read-only memory
US5856221A (en) 1995-06-30 1999-01-05 Sgs Thomson Microelectronics Process for forming an integrated circuit comprising non-volatile memory cells and side transistors of at least two different types, and corresponding IC
US5889694A (en) 1996-03-05 1999-03-30 Shepard; Daniel R. Dual-addressed rectifier storage device
US5911104A (en) 1998-02-20 1999-06-08 Texas Instruments Incorporated Integrated circuit combining high frequency bipolar and high power CMOS transistors
US6034882A (en) 1998-11-16 2000-03-07 Matrix Semiconductor, Inc. Vertically stacked field programmable nonvolatile memory and method of fabrication
US6104628A (en) 1998-08-25 2000-08-15 Nec Corporation Integrated-circuit device with microprocessor of prescribed shape
US6124157A (en) 1998-03-20 2000-09-26 Cypress Semiconductor Corp. Integrated non-volatile and random access memory and method of forming the same
US6131140A (en) 1995-12-22 2000-10-10 Cypress Semiconductor Corp. Integrated cache memory with system control logic and adaptation of RAM bus to a cache pinout
US6207991B1 (en) 1998-03-20 2001-03-27 Cypress Semiconductor Corp. Integrated non-volatile and CMOS memories having substantially the same thickness gates and methods of forming the same
US6208545B1 (en) 1997-04-04 2001-03-27 Glenn J. Leedy Three dimensional structure memory
US6259132B1 (en) 1997-07-08 2001-07-10 Stmicroelectronics S.R.L. Array of electrically programmable non-volatile semiconductor memory cells comprising ROM memory cells
US6263398B1 (en) 1998-02-10 2001-07-17 Ramtron International Corporation Integrated circuit memory device incorporating a non-volatile memory array and a relatively faster access time memory cache
US6266272B1 (en) 1999-07-30 2001-07-24 International Business Machines Corporation Partially non-volatile dynamic random access memory formed by a plurality of single transistor cells used as DRAM cells and EPROM cells
US6324093B1 (en) 2000-09-15 2001-11-27 Hewlett-Packard Company Write-once thin-film memory
US6378118B1 (en) 1998-10-26 2002-04-23 Nec Corporation Semiconductor integrated circuit having a MPU and a DRAM cache memory
US6420215B1 (en) 2000-04-28 2002-07-16 Matrix Semiconductor, Inc. Three-dimensional memory array and method of fabrication
US6424581B1 (en) 2000-08-14 2002-07-23 Matrix Semiconductor, Inc. Write-once memory array controller, system, and method
US6515923B1 (en) 2001-02-02 2003-02-04 Matrix Semiconductor, Inc. Memory array organization and related test method particularly well suited for integrated circuits having write-once memory arrays
US6515888B2 (en) 2000-08-14 2003-02-04 Matrix Semiconductor, Inc. Low cost three-dimensional memory array
US6545891B1 (en) 2000-08-14 2003-04-08 Matrix Semiconductor, Inc. Modular memory device
US6545898B1 (en) 2001-03-21 2003-04-08 Silicon Valley Bank Method and apparatus for writing memory arrays using external source of high programming voltage

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6259398B1 (en) * 2000-05-19 2001-07-10 Sri International Multi-valued variable ambiguity resolution for satellite navigation signal carrier wave path length determination

Patent Citations (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4799196A (en) 1986-02-28 1989-01-17 Fujitsu Limited Semiconductor memory device comprising different type memory cells
US5029125A (en) 1989-03-07 1991-07-02 Drexler Technology Corporation Method of reading and writing files on nonerasable storage media
US5285323A (en) 1990-10-05 1994-02-08 Digital Equipment Corporation Integrated circuit chip having primary and secondary random access memories for a hierarchical cache
US5249282A (en) 1990-11-21 1993-09-28 Benchmarq Microelectronics, Inc. Integrated cache memory system with primary and secondary cache memories
US5515333A (en) 1991-10-29 1996-05-07 Hitachi, Ltd. Semiconductor memory
US5699317A (en) 1992-01-22 1997-12-16 Ramtron International Corporation Enhanced DRAM with all reads from on-chip cache and all writers to memory array
US5721862A (en) 1992-01-22 1998-02-24 Ramtron International Corporation Enhanced DRAM with single row SRAM cache for all device read operations
US5561622A (en) 1993-09-13 1996-10-01 International Business Machines Corporation Integrated memory cube structure
US5856221A (en) 1995-06-30 1999-01-05 Sgs Thomson Microelectronics Process for forming an integrated circuit comprising non-volatile memory cells and side transistors of at least two different types, and corresponding IC
US5818748A (en) 1995-11-21 1998-10-06 International Business Machines Corporation Chip function separation onto separate stacked chips
US6131140A (en) 1995-12-22 2000-10-10 Cypress Semiconductor Corp. Integrated cache memory with system control logic and adaptation of RAM bus to a cache pinout
US5889694A (en) 1996-03-05 1999-03-30 Shepard; Daniel R. Dual-addressed rectifier storage device
US5835396A (en) 1996-10-17 1998-11-10 Zhang; Guobiao Three-dimensional read-only memory
US5812418A (en) 1996-10-31 1998-09-22 International Business Machines Corporation Cache sub-array method and apparatus for use in microprocessor integrated circuits
US6208545B1 (en) 1997-04-04 2001-03-27 Glenn J. Leedy Three dimensional structure memory
US6259132B1 (en) 1997-07-08 2001-07-10 Stmicroelectronics S.R.L. Array of electrically programmable non-volatile semiconductor memory cells comprising ROM memory cells
US6263398B1 (en) 1998-02-10 2001-07-17 Ramtron International Corporation Integrated circuit memory device incorporating a non-volatile memory array and a relatively faster access time memory cache
US5911104A (en) 1998-02-20 1999-06-08 Texas Instruments Incorporated Integrated circuit combining high frequency bipolar and high power CMOS transistors
US6124157A (en) 1998-03-20 2000-09-26 Cypress Semiconductor Corp. Integrated non-volatile and random access memory and method of forming the same
US6207991B1 (en) 1998-03-20 2001-03-27 Cypress Semiconductor Corp. Integrated non-volatile and CMOS memories having substantially the same thickness gates and methods of forming the same
US6104628A (en) 1998-08-25 2000-08-15 Nec Corporation Integrated-circuit device with microprocessor of prescribed shape
US6378118B1 (en) 1998-10-26 2002-04-23 Nec Corporation Semiconductor integrated circuit having a MPU and a DRAM cache memory
US6034882A (en) 1998-11-16 2000-03-07 Matrix Semiconductor, Inc. Vertically stacked field programmable nonvolatile memory and method of fabrication
US6185122B1 (en) 1998-11-16 2001-02-06 Matrix Semiconductor, Inc. Vertically stacked field programmable nonvolatile memory and method of fabrication
US6266272B1 (en) 1999-07-30 2001-07-24 International Business Machines Corporation Partially non-volatile dynamic random access memory formed by a plurality of single transistor cells used as DRAM cells and EPROM cells
US6420215B1 (en) 2000-04-28 2002-07-16 Matrix Semiconductor, Inc. Three-dimensional memory array and method of fabrication
US6424581B1 (en) 2000-08-14 2002-07-23 Matrix Semiconductor, Inc. Write-once memory array controller, system, and method
US6515888B2 (en) 2000-08-14 2003-02-04 Matrix Semiconductor, Inc. Low cost three-dimensional memory array
US6545891B1 (en) 2000-08-14 2003-04-08 Matrix Semiconductor, Inc. Modular memory device
US6324093B1 (en) 2000-09-15 2001-11-27 Hewlett-Packard Company Write-once thin-film memory
US6515923B1 (en) 2001-02-02 2003-02-04 Matrix Semiconductor, Inc. Memory array organization and related test method particularly well suited for integrated circuits having write-once memory arrays
US6545898B1 (en) 2001-03-21 2003-04-08 Silicon Valley Bank Method and apparatus for writing memory arrays using external source of high programming voltage

Non-Patent Citations (15)

* Cited by examiner, † Cited by third party
Title
"A 10ns Read and Write Non-Volatile Memory Array Using a Magnetic Tunnel Junction and FET Switch in each Cell," Scheuerlein et al., ISSCC 2000/Session 7/TD: Emerging Memory & Device Technologies/Paper TA 7.2, 4 pages, Feb. 8, 2000.
"A 125mm<2>/Gb NAND Flash Memory with 10MB/s Program Throughput," Nakamura et al., ISSCC 2002/Session 6/SRAM and Non-Volatile Memories/6.4, 10 pages (Dec. 4, 2002).
"Low-Cost Three-Dimensional Memory Array," Mark G. Johnson, Thomas H. Lee, Vivek Subramanian, P. Michael Farmwald, N. Johan Knall, U.S. Appl. No. 09/928,969 filed Aug. 13, 2001.
"Memory Device and Method for Storing and Reading a File System Structure in a Write-Once Memory Array," Christopher S. Moore, James E. Schneider, J. James Tringali, Roger W. March, U.S. Appl. No. 09/877,719 filed Jun. 8, 2001.
"Memory Device and Method for Storing and Reading Data in a Write-Once Memory Array," Christopher S. Moore, James E. Schneider, J. James Tringali, Roger W. March, U.S. Appl. No. 09/877,720 filed Jun. 8, 2001.
"Memory Device with Row and Column Decoder Circuits Arranged in a Checkerboard Pattern under a Plurality of Memory Arrays," Roy E. Scheuerlein, U.S. Appl. No. 09/896,814 filed Jun. 29, 2001.
"Memory Devices and Methods for Use Therewith," Roger W. March, Christopher S. Moore, Daniel Brown, Thomas H. Lee, Mark G. Johnson, U.S. Appl. No. 09/748,589 filed Dec. 22, 2000.
"Method for Deleting Stored Digital Data from Write-Once Memory Device," Christopher S. Moore, Derek J. Bosch, Daniel C. Steere, J. James Tringali, U.S. Appl. No. 09/638,439 filed Aug. 14, 2002.
"Method for Reading Data in a Write-Once Memory Device Using a Write-Many File System," Christopher S. Moore, J. James Tringali, Roger W. March, James E. Schneider, Derek J. Bosch, Daniel C. Steere, U.S. Appl. No. 09/878,138 filed Jun. 8, 2001.
"Method for Re-Directing Data Traffic in a Write-Once Memory," J. James Tringali, Christopher S. Moore, Roger W. March, James E. Schneider, Derek J. Bosch, Daniel C. Steere, U.S. Appl. No. 09/877,691 filed Jun. 8, 2001.
"Method for Storing Digital Information in Write-Once Memory Array," David R. Friedman, Derek J. Bosch, Christopher S. Moore, Joseph J. Tringali, Michael A. Vyyoda, U.S. Appl. No. 09/727,229 filed Nov. 30, 2000.
"Modular Memory Device," J. James Tringali, P. Michael Farmwald, Thomas H. Lee, Mark G. Johnson, Derek J. Bosch, U.S. Appl. No. 09/638,334 filed Aug. 14, 2000.
"MultiMediaCard System Specification Version 2.2 Official Release," pp. 10, 12, and 14, Jan. 2000.
"Three-Dimensional Memory Array and Method of Fabrication," Johan Knall, U.S. Appl. No. 09/560,626 filed Apr. 28, 2002.
International Search Report for PCT/US03/19382, Dec. 5, 2003 (1 page).

Cited By (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070104746A1 (en) * 2005-07-29 2007-05-10 Seishiro Fujii Methods and compositions for reducing skin damage
US20070070690A1 (en) * 2005-09-28 2007-03-29 Scheuerlein Roy E Method for using a multi-use memory cell and memory array
US20070069276A1 (en) * 2005-09-28 2007-03-29 Scheuerlein Roy E Multi-use memory cell and memory array
US7447056B2 (en) 2005-09-28 2008-11-04 Sandisk 3D Llc Method for using a multi-use memory cell and memory array
US20070222693A1 (en) * 2006-03-27 2007-09-27 Liviu Popa-Simil Multi-band terahertz receiver and imaging device
US7450414B2 (en) 2006-07-31 2008-11-11 Sandisk 3D Llc Method for using a mixed-use memory array
US20080023790A1 (en) * 2006-07-31 2008-01-31 Scheuerlein Roy E Mixed-use memory array
US20080025118A1 (en) * 2006-07-31 2008-01-31 Scheuerlein Roy E Method for using a mixed-use memory array
US20080025062A1 (en) * 2006-07-31 2008-01-31 Scheuerlein Roy E Method for using a mixed-use memory array with different data states
US7486537B2 (en) 2006-07-31 2009-02-03 Sandisk 3D Llc Method for using a mixed-use memory array with different data states
US7730270B2 (en) 2006-09-29 2010-06-01 Sandisk Corporation Method combining once-writeable and rewriteable information storage to support data processing
US7630225B2 (en) 2006-09-29 2009-12-08 Sandisk Corporation Apparatus combining once-writeable and rewriteable information storage to support data processing
US20080244113A1 (en) * 2007-03-30 2008-10-02 Kealy Kevin P Method for using a memory device with a built-in memory array and a connector for a removable memory device
US20080244179A1 (en) * 2007-03-30 2008-10-02 Kealy Kevin P Memory device with a built-in memory array and a connector for a removable memory device
US7603499B2 (en) 2007-03-30 2009-10-13 Sandisk Corporation Method for using a memory device with a built-in memory array and a connector for a removable memory device
US7613857B2 (en) 2007-03-30 2009-11-03 Sandisk Corporation Memory device with a built-in memory array and a connector for a removable memory device
US20080244202A1 (en) * 2007-03-30 2008-10-02 Gorobets Sergey A Method combining lower-endurance/performance and higher-endurance/performance information storage to support data processing
US7633799B2 (en) 2007-03-30 2009-12-15 Sandisk Corporation Method combining lower-endurance/performance and higher-endurance/performance information storage to support data processing
US20080244203A1 (en) * 2007-03-30 2008-10-02 Gorobets Sergey A Apparatus combining lower-endurance/performance and higher-endurance/performance information storage to support data processing
US20100277967A1 (en) * 2009-04-29 2010-11-04 Macronix International Co., Ltd. Graded metal oxide resistance based semiconductor memory device
US8488362B2 (en) * 2009-04-29 2013-07-16 Macronix International Co., Ltd. Graded metal oxide resistance based semiconductor memory device
US8772106B2 (en) 2009-04-29 2014-07-08 Macronix International Co., Ltd. Graded metal oxide resistance based semiconductor memory device

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