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Referenced by

Citing PatentFiling dateIssue dateOriginal AssigneeTitle
US393795718 Jun 197410 Feb 1976Leybold-Heraeus-GmbH & Co.Apparatus for determining the energy of charged particles
US480675419 Jun 198721 Feb 1989The Perkin-Elmer CorporationHigh luminosity spherical analyzer for charged particles
US481087910 Apr 19877 Mar 1989Spectros LimitedCharged particle energy analyzer
US48108805 Jun 19877 Mar 1989The Perkin-Elmer CorporationDirect imaging monochromatic electron microscope
US511894123 Apr 19912 Jun 1992The Perkin-Elmer CorporationApparatus and method for locating target area for electron microanalysis
US51265656 Aug 199130 Jun 1992U.S. Philips Corp.Energy filter for charged particle beam apparatus
US531511329 Sep 199224 May 1994The Perkin-Elmer CorporationScanning and high resolution x-ray photoelectron spectroscopy and imaging
US544424225 Feb 199422 Aug 1995Physical Electronics Inc.Scanning and high resolution electron spectroscopy and imaging
US545178325 Mar 199419 Sep 1995Fisons plcCharged-particle analyser
US550641425 Mar 19949 Apr 1996Fisons PLCCharged-particle analyzer
US560289931 Jan 199611 Feb 1997Physical Electronics Inc.Anode assembly for generating x-rays and instrument with such anode assembly
US680085227 Dec 20025 Oct 2004ReVera IncorporatedNondestructive characterization of thin films using measured basis spectra
US689115827 Dec 200210 May 2005ReVera IncorporatedNondestructive characterization of thin films based on acquired spectrum
US741118831 Aug 200512 Aug 2008ReVera IncorporatedMethod and system for non-destructive distribution profiling of an element in a film
US744968224 Oct 200211 Nov 2008Revera IncorporatedSystem and method for depth profiling and characterization of thin films
US756143822 Dec 200414 Jul 2009Revera IncorporatedElectronic device incorporating a multilayered capacitor formed on a printed circuit board
US788432125 Jul 20088 Feb 2011Revera, IncorporatedMethod and system for non-destructive distribution profiling of an element in a film