DE69840031D1 - Methode und System zur Detektion einer Marke - Google Patents

Methode und System zur Detektion einer Marke

Info

Publication number
DE69840031D1
DE69840031D1 DE69840031T DE69840031T DE69840031D1 DE 69840031 D1 DE69840031 D1 DE 69840031D1 DE 69840031 T DE69840031 T DE 69840031T DE 69840031 T DE69840031 T DE 69840031T DE 69840031 D1 DE69840031 D1 DE 69840031D1
Authority
DE
Germany
Prior art keywords
alignment mark
mark
optical system
image
photoelectric detector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69840031T
Other languages
English (en)
Inventor
Naomasa Shiraishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Application granted granted Critical
Publication of DE69840031D1 publication Critical patent/DE69840031D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7065—Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7084—Position of mark on substrate, i.e. position in (x, y, z) of mark, e.g. buried or resist covered mark, mark on rearside, at the substrate edge, in the circuit area, latent image mark, marks in plural levels
DE69840031T 1997-11-20 1998-11-19 Methode und System zur Detektion einer Marke Expired - Lifetime DE69840031D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP31923997 1997-11-20
PCT/JP1998/005226 WO1999027567A1 (fr) 1997-11-20 1998-11-19 Procede de detection de marque et capteur de position de marque

Publications (1)

Publication Number Publication Date
DE69840031D1 true DE69840031D1 (de) 2008-10-30

Family

ID=18107976

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69840031T Expired - Lifetime DE69840031D1 (de) 1997-11-20 1998-11-19 Methode und System zur Detektion einer Marke

Country Status (7)

Country Link
US (1) US6285455B1 (de)
EP (1) EP1041608B1 (de)
JP (1) JP4192423B2 (de)
AT (1) ATE408857T1 (de)
AU (1) AU1174599A (de)
DE (1) DE69840031D1 (de)
WO (1) WO1999027567A1 (de)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
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JP4192423B2 (ja) 1997-11-20 2008-12-10 株式会社ニコン マーク検出方法、位置検出装置、露光方法及び装置、デバイス製造方法、並びにデバイス
US7057299B2 (en) * 2000-02-03 2006-06-06 Taiwan Semiconductor Manufacturing Co., Ltd. Alignment mark configuration
KR100643225B1 (ko) * 2000-04-28 2006-11-10 에이에스엠엘 네델란즈 비.브이. 리소그래피 투영장치, 기판정렬 마크의 위치를 결정하는방법, 디바이스 제조방법 및 그 디바이스
KR100500469B1 (ko) * 2001-01-12 2005-07-12 삼성전자주식회사 정렬마크와 이를 이용하는 노광정렬시스템 및 그 정렬방법
US6633048B2 (en) * 2001-05-03 2003-10-14 Northrop Grumman Corporation High output extreme ultraviolet source
US20040005769A1 (en) * 2002-07-03 2004-01-08 Cabot Microelectronics Corp. Method and apparatus for endpoint detection
TWI227814B (en) 2002-09-20 2005-02-11 Asml Netherlands Bv Alignment system and methods for lithographic systems using at least two wavelengths
US6774452B1 (en) 2002-12-17 2004-08-10 Cypress Semiconductor Corporation Semiconductor structure having alignment marks with shallow trench isolation
KR100519948B1 (ko) * 2003-05-20 2005-10-10 엘지.필립스 엘시디 주식회사 비정질 실리콘의 결정화 공정 및 이를 이용한 스위칭 소자
DE10356519A1 (de) * 2003-12-03 2005-07-07 Infineon Technologies Ag Verfahren und optisches System zum Erfassen einer geometrischen Form auf einem Halbleitersubstrat
US7565219B2 (en) * 2003-12-09 2009-07-21 Asml Netherlands B.V. Lithographic apparatus, method of determining a model parameter, device manufacturing method, and device manufactured thereby
JP4777731B2 (ja) * 2005-03-31 2011-09-21 富士通セミコンダクター株式会社 半導体装置の製造方法
US7612892B2 (en) * 2005-10-06 2009-11-03 Nikon Corporation Imaging optical system configured with through the lens optics for producing control information
JP5425363B2 (ja) * 2006-11-28 2014-02-26 ルネサスエレクトロニクス株式会社 半導体装置、及び表示装置
JP4966719B2 (ja) 2007-04-11 2012-07-04 株式会社日立ハイテクノロジーズ 校正用標準部材及びその作製方法、並びにそれを用いた電子ビーム装置
JP2008270072A (ja) * 2007-04-24 2008-11-06 Sii Nanotechnology Inc 荷電粒子ビーム装置
IL194580A0 (en) * 2007-10-09 2009-08-03 Asml Netherlands Bv Alignment method and apparatus, lithographic apparatus, metrology apparatus and device manufacturing method
CN101435997B (zh) * 2007-11-15 2012-06-27 上海华虹Nec电子有限公司 光刻套刻精度的测试图形及测量方法
NL1036179A1 (nl) * 2007-11-20 2009-05-25 Asml Netherlands Bv Lithographic apparatus and method.
JP5406624B2 (ja) * 2009-08-10 2014-02-05 キヤノン株式会社 検出装置、露光装置及びデバイスの製造方法
US8088633B2 (en) * 2009-12-02 2012-01-03 Ultratech, Inc. Optical alignment methods for forming LEDs having a rough surface
CN102243442B (zh) * 2010-05-12 2014-11-12 上海微电子装备有限公司 硅片对准光源幅度调制装置
US8422027B2 (en) 2010-06-08 2013-04-16 Nikon Corporation Imaging optical system for producing control information regarding lateral movement of an image plane or an object plane
DE102013220190B4 (de) * 2013-10-07 2021-08-12 Dr. Johannes Heidenhain Gmbh Messteilung und lichtelektrische Positionsmesseinrichtung mit dieser Messteilung
CN104359410B (zh) * 2014-12-01 2017-05-17 清华大学 一种利用可旋转光栅测量的位移测量系统
JP6378117B2 (ja) * 2015-03-13 2018-08-22 東芝メモリ株式会社 アライメントマークの形成方法および半導体装置
US10317808B2 (en) 2016-01-19 2019-06-11 Asml Netherlands B.V. Position sensing arrangement and lithographic apparatus including such an arrangement, position sensing method and device manufacturing method
NL2019155A (en) * 2016-08-30 2018-03-06 Asml Netherlands Bv Position sensor, lithographic apparatus and method for manufacturing devices
JP6791584B2 (ja) * 2017-02-01 2020-11-25 株式会社ディスコ 加工方法
JP6584567B1 (ja) * 2018-03-30 2019-10-02 キヤノン株式会社 リソグラフィ装置、パターン形成方法及び物品の製造方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63240018A (ja) 1987-03-27 1988-10-05 Matsushita Electric Ind Co Ltd アライメント方法
JP2773147B2 (ja) * 1988-08-19 1998-07-09 株式会社ニコン 露光装置の位置合わせ装置及び方法
JP2906433B2 (ja) 1989-04-25 1999-06-21 株式会社ニコン 投影露光装置及び投影露光方法
US5151750A (en) 1989-04-14 1992-09-29 Nikon Corporation Alignment apparatus
JPH032504A (ja) * 1989-05-30 1991-01-08 Nikon Corp 位置合わせ装置
JPH05326360A (ja) * 1992-05-20 1993-12-10 Victor Co Of Japan Ltd 半導体装置の製造方法及び製造装置
JPH06260389A (ja) 1993-03-05 1994-09-16 Nikon Corp アライメント装置
JPH07321030A (ja) 1994-03-29 1995-12-08 Nikon Corp アライメント装置
US5721605A (en) 1994-03-29 1998-02-24 Nikon Corporation Alignment device and method with focus detection system
JPH08250391A (ja) * 1995-03-10 1996-09-27 Nikon Corp 位置検出用マーク及び位置検出方法
JP4192423B2 (ja) 1997-11-20 2008-12-10 株式会社ニコン マーク検出方法、位置検出装置、露光方法及び装置、デバイス製造方法、並びにデバイス

Also Published As

Publication number Publication date
US6285455B1 (en) 2001-09-04
ATE408857T1 (de) 2008-10-15
WO1999027567A1 (fr) 1999-06-03
EP1041608A4 (de) 2003-11-19
JP4192423B2 (ja) 2008-12-10
AU1174599A (en) 1999-06-15
EP1041608A1 (de) 2000-10-04
EP1041608B1 (de) 2008-09-17

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