DE69836517D1 - Verfahren zum Betrieb eines Halbleiterbehandlungssystems - Google Patents

Verfahren zum Betrieb eines Halbleiterbehandlungssystems

Info

Publication number
DE69836517D1
DE69836517D1 DE69836517T DE69836517T DE69836517D1 DE 69836517 D1 DE69836517 D1 DE 69836517D1 DE 69836517 T DE69836517 T DE 69836517T DE 69836517 T DE69836517 T DE 69836517T DE 69836517 D1 DE69836517 D1 DE 69836517D1
Authority
DE
Germany
Prior art keywords
operating
processing system
semiconductor processing
semiconductor
processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69836517T
Other languages
English (en)
Other versions
DE69836517T2 (de
Inventor
Takeshi Kawazome
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Application granted granted Critical
Publication of DE69836517D1 publication Critical patent/DE69836517D1/de
Publication of DE69836517T2 publication Critical patent/DE69836517T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B19/00—Programme-control systems
    • G05B19/02—Programme-control systems electric
    • G05B19/418—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS], computer integrated manufacturing [CIM]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67276—Production flow monitoring, e.g. for increasing throughput
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67724—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations by means of a cart or a vehicule
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00—Program-control systems
    • G05B2219/30—Nc systems
    • G05B2219/31—From computer integrated manufacturing till monitoring
    • G05B2219/31013—Second AGV with wafers already underway before processing first finished
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
    • Y02P90/02—Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]
DE69836517T 1997-06-13 1998-06-04 Verfahren zum Betrieb eines Halbleiterbehandlungssystems Expired - Lifetime DE69836517T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP17125897 1997-06-13
JP9171258A JPH118170A (ja) 1997-06-13 1997-06-13 半導体処理システムおよびデバイス製造方法

Publications (2)

Publication Number Publication Date
DE69836517D1 true DE69836517D1 (de) 2007-01-11
DE69836517T2 DE69836517T2 (de) 2007-06-28

Family

ID=15919995

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69836517T Expired - Lifetime DE69836517T2 (de) 1997-06-13 1998-06-04 Verfahren zum Betrieb eines Halbleiterbehandlungssystems

Country Status (6)

Country Link
US (2) US6148246A (de)
EP (1) EP0884765B1 (de)
JP (1) JPH118170A (de)
KR (1) KR100396068B1 (de)
DE (1) DE69836517T2 (de)
TW (1) TW447028B (de)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH118170A (ja) * 1997-06-13 1999-01-12 Canon Inc 半導体処理システムおよびデバイス製造方法
JP2000124095A (ja) * 1998-10-13 2000-04-28 Canon Inc 半導体製造装置、情報処理装置およびデバイス製造方法
JP2000223386A (ja) * 1999-02-02 2000-08-11 Mitsubishi Electric Corp 半導体製造システムおよび当該システムで用いられる半導体製造システム制御装置
DE19921244A1 (de) * 1999-05-07 2000-11-16 Siemens Ag Anlage zur Bearbeitung von Wafern
US6640151B1 (en) * 1999-12-22 2003-10-28 Applied Materials, Inc. Multi-tool control system, method and medium
JP2001217299A (ja) * 2000-02-04 2001-08-10 Nec Corp 半導体搬送設備の特殊ロット搬送制御システム及び方法と装置並びに記録媒体
US6708074B1 (en) 2000-08-11 2004-03-16 Applied Materials, Inc. Generic interface builder
US6591162B1 (en) * 2000-08-15 2003-07-08 Asyst Technologies, Inc. Smart load port with integrated carrier monitoring and fab-wide carrier management system
US7188142B2 (en) 2000-11-30 2007-03-06 Applied Materials, Inc. Dynamic subject information generation in message services of distributed object systems in a semiconductor assembly line facility
JP4213871B2 (ja) * 2001-02-01 2009-01-21 株式会社日立製作所 半導体装置の製造方法
US7698012B2 (en) 2001-06-19 2010-04-13 Applied Materials, Inc. Dynamic metrology schemes and sampling schemes for advanced process control in semiconductor processing
US7160739B2 (en) 2001-06-19 2007-01-09 Applied Materials, Inc. Feedback control of a chemical mechanical polishing device providing manipulation of removal rate profiles
JP2003022945A (ja) * 2001-07-06 2003-01-24 Mitsubishi Electric Corp 工程管理装置、工程管理方法および工程を管理するためのプログラム
US6922593B2 (en) * 2001-08-06 2005-07-26 Gideon Weiss Control of items in a complex system by using fluid models and solving continuous linear programs
US20030199112A1 (en) 2002-03-22 2003-10-23 Applied Materials, Inc. Copper wiring module control
US20030221309A1 (en) * 2002-05-29 2003-12-04 Seagate Technology Llc Modular dice system for slider bar parting
US20060015305A1 (en) * 2002-07-26 2006-01-19 Gideon Weiss Control of items in a complex system by using fluid models and solving continuous linear programs
US7272459B2 (en) 2002-11-15 2007-09-18 Applied Materials, Inc. Method, system and medium for controlling manufacture process having multivariate input parameters
TW200535583A (en) * 2003-12-26 2005-11-01 Renesas Tech Corp Mass-production transfer support system and semiconductor manufacturing system
JP2008078630A (ja) * 2006-08-24 2008-04-03 Hitachi Kokusai Electric Inc 基板処理システム
US8962353B2 (en) * 2011-09-16 2015-02-24 Taiwan Semiconductor Manufacturing Company, Ltd. System and methods for semiconductor device performance prediction during processing
US9064788B1 (en) * 2014-02-19 2015-06-23 Wafertech, Llc Statistical method for monitoring manufacturing equipment and processing operations
CN103760934B (zh) * 2014-02-20 2015-11-11 北京七星华创电子股份有限公司 一种用于半导体热处理设备温度的监控方法及系统
CN109643671B (zh) * 2016-08-26 2023-06-06 应用材料公司 自我修复式半导体晶片处理

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4027246A (en) * 1976-03-26 1977-05-31 International Business Machines Corporation Automated integrated circuit manufacturing system
US4974166A (en) * 1987-05-18 1990-11-27 Asyst Technologies, Inc. Processing systems with intelligent article tracking
US5536128A (en) * 1988-10-21 1996-07-16 Hitachi, Ltd. Method and apparatus for carrying a variety of products
JP2780814B2 (ja) * 1989-06-22 1998-07-30 株式会社日立製作所 生産管理システム
TW276353B (de) * 1993-07-15 1996-05-21 Hitachi Seisakusyo Kk
JPH07297258A (ja) * 1994-04-26 1995-11-10 Tokyo Electron Ltd 板状体の搬送装置
US5696689A (en) * 1994-11-25 1997-12-09 Nippondenso Co., Ltd. Dispatch and conveyer control system for a production control system of a semiconductor substrate
KR0167881B1 (ko) * 1994-11-28 1999-02-01 김주용 웨이퍼 반송 시스템 및 그 제어방법
US5745364A (en) * 1994-12-28 1998-04-28 Nec Corporation Method of producing semiconductor wafer
US5867388A (en) * 1995-03-17 1999-02-02 Nippondenso Co., Ltd. Controller of conveyance system
JPH08335539A (ja) * 1995-06-06 1996-12-17 Sony Corp 生産管理装置および生産管理方法
JP3501896B2 (ja) * 1996-03-21 2004-03-02 トーヨーエイテック株式会社 ウェハ製造装置
JPH10116875A (ja) * 1996-10-08 1998-05-06 Mitsubishi Electric Corp 半導体製造システム
US6085892A (en) * 1997-02-07 2000-07-11 Quantum Conveyor Systems, Inc. High speed sorting/diverting apparatus, an apparatus controller and systems using same
US6000830A (en) * 1997-04-18 1999-12-14 Tokyo Electron Limited System for applying recipe of semiconductor manufacturing apparatus
JPH118170A (ja) * 1997-06-13 1999-01-12 Canon Inc 半導体処理システムおよびデバイス製造方法

Also Published As

Publication number Publication date
US6148246A (en) 2000-11-14
EP0884765B1 (de) 2006-11-29
EP0884765A2 (de) 1998-12-16
TW447028B (en) 2001-07-21
KR19990006909A (ko) 1999-01-25
JPH118170A (ja) 1999-01-12
EP0884765A3 (de) 2001-05-02
DE69836517T2 (de) 2007-06-28
KR100396068B1 (ko) 2003-10-17
US6459950B1 (en) 2002-10-01

Similar Documents

Publication Publication Date Title
DE69836517D1 (de) Verfahren zum Betrieb eines Halbleiterbehandlungssystems
DE69826903D1 (de) Verfahren zum Betrieb eines Druckgerätes
DE50208001D1 (de) Verfahren zum betrieb eines verteilten computersystems
DE60044931D1 (de) Vorrichtung und Verfahren zum Betrieb eines Auszahlsystems
DE59804074D1 (de) Verfahren zum betrieb eines parallelen hybridantriebs
DE50109236D1 (de) Verfahren zum betrieb eines von einem prozessor gesteuerten systems
DE50014814D1 (de) Verfahren zum betrieb eines navigationssystems
ATA21698A (de) Verfahren zum behandeln eines gutes
DE69002955T2 (de) Verfahren zum Betrieb eines Spektrophotometers.
DE60020038D1 (de) Verfahren zum Verarbeiten eines numerischen Bildes
DE69714863D1 (de) Verfahren und vorrichtung zum betrieb eines schleppnetzes
DE69519460T2 (de) Verfahren zur Reinigung eines Halbleiter-Wafers
DE59804197D1 (de) Verfahren zum betrieb eines sensorsystems und sensorsystem
DE60045436D1 (de) Vorrichtung und Verfahren zum Betrieb eines Auszahlsystems
DE50005368D1 (de) Verfahren zum betrieb eines navigationssystems
DE69904317T2 (de) Verfahren und system zum konfigurieren eines rechners
DE59905768D1 (de) Verfahren zum betrieb eines automatisierungssystems
DE59814237D1 (de) Verfahren zum betrieb eines gassensors
DE69814186D1 (de) Verfahren zum Betreiben eines Faksimilegerätes
DE59705387D1 (de) Verfahren zum entzundern eines werkstückes
DE59609516D1 (de) Verfahren zum betrieb eines pneumatischen bremskraftverstärkers
DE59103990D1 (de) Verfahren zum Betrieb eines Fahrzeugs.
DE69809424T2 (de) Verfahren zum betrieb eines münzmechanismus
DE59810713D1 (de) Verfahren zum betrieb eines schiebedachsystems und schiebedachsystem
DE59707314D1 (de) Verfahren zum betrieb eines pneumatischen bremskraftverstärkers

Legal Events

Date Code Title Description
8364 No opposition during term of opposition