DE69412952T2 - Verbindungsteil eines Schaltungssubstrats und Verfahren zur Herstellung mehrschichtiger Schaltungssubstrate unter Verwendung dieses Teils - Google Patents

Verbindungsteil eines Schaltungssubstrats und Verfahren zur Herstellung mehrschichtiger Schaltungssubstrate unter Verwendung dieses Teils

Info

Publication number
DE69412952T2
DE69412952T2 DE1994612952 DE69412952T DE69412952T2 DE 69412952 T2 DE69412952 T2 DE 69412952T2 DE 1994612952 DE1994612952 DE 1994612952 DE 69412952 T DE69412952 T DE 69412952T DE 69412952 T2 DE69412952 T2 DE 69412952T2
Authority
DE
Germany
Prior art keywords
producing multilayer
connection part
circuit substrate
substrates
multilayer circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE1994612952
Other languages
English (en)
Other versions
DE69412952D1 (de
Inventor
Seiichi Nakatani
Akihito Hatakeyama
Kouji Kawakita
Hiroshii Sogou
Tatsuo Ogawa
Tamao Kojima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Application granted granted Critical
Publication of DE69412952D1 publication Critical patent/DE69412952D1/de
Publication of DE69412952T2 publication Critical patent/DE69412952T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4611Manufacturing multilayer circuits by laminating two or more circuit boards
    • H05K3/4614Manufacturing multilayer circuits by laminating two or more circuit boards the electrical connections between the circuit boards being made during lamination
    • H05K3/462Manufacturing multilayer circuits by laminating two or more circuit boards the electrical connections between the circuit boards being made during lamination characterized by laminating only or mainly similar double-sided circuit boards
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01RELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
    • H01R12/00Structural associations of a plurality of mutually-insulated electrical connecting elements, specially adapted for printed circuits, e.g. printed circuit boards [PCB], flat or ribbon cables, or like generally planar structures, e.g. terminal strips, terminal blocks; Coupling devices specially adapted for printed circuits, flat or ribbon cables, or like generally planar structures; Terminals specially adapted for contact with, or insertion into, printed circuits, flat or ribbon cables, or like generally planar structures
    • H01R12/50Fixed connections
    • H01R12/51Fixed connections for rigid printed circuits or like structures
    • H01R12/52Fixed connections for rigid printed circuits or like structures connecting to other rigid printed circuits or like structures
    • H01R12/523Fixed connections for rigid printed circuits or like structures connecting to other rigid printed circuits or like structures by an interconnection through aligned holes in the boards or multilayer board
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/40Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/4038Through-connections; Vertical interconnect access [VIA] connections
    • H05K3/4053Through-connections; Vertical interconnect access [VIA] connections by thick-film techniques
    • H05K3/4069Through-connections; Vertical interconnect access [VIA] connections by thick-film techniques for via connections in organic insulating substrates
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/01Dielectrics
    • H05K2201/0104Properties and characteristics in general
    • H05K2201/0116Porous, e.g. foam
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/03Conductive materials
    • H05K2201/0332Structure of the conductor
    • H05K2201/0335Layered conductors or foils
    • H05K2201/0355Metal foils
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/09Shape and layout
    • H05K2201/09209Shape and layout details of conductors
    • H05K2201/095Conductive through-holes or vias
    • H05K2201/09536Buried plated through-holes, i.e. plated through-holes formed in a core before lamination
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/10Details of components or other objects attached to or integrated in a printed circuit board
    • H05K2201/10227Other objects, e.g. metallic pieces
    • H05K2201/10378Interposers
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/01Tools for processing; Objects used during processing
    • H05K2203/0191Using tape or non-metallic foil in a process, e.g. during filling of a hole with conductive paste
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/14Related to the order of processing steps
    • H05K2203/1461Applying or finishing the circuit pattern after another process, e.g. after filling of vias with conductive paste, after making printed resistors
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4611Manufacturing multilayer circuits by laminating two or more circuit boards
    • H05K3/4623Manufacturing multilayer circuits by laminating two or more circuit boards the circuit boards having internal via connections between two or more circuit layers before lamination, e.g. double-sided circuit boards
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4644Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
    • H05K3/4652Adding a circuit layer by laminating a metal foil or a preformed metal foil pattern
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S428/00Stock material or miscellaneous articles
    • Y10S428/901Printed circuit
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/49117Conductor or circuit manufacturing
    • Y10T29/49124On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/49126Assembling bases
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/49117Conductor or circuit manufacturing
    • Y10T29/49124On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/49155Manufacturing circuit on or in base
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/49117Conductor or circuit manufacturing
    • Y10T29/49124On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/49155Manufacturing circuit on or in base
    • Y10T29/49165Manufacturing circuit on or in base by forming conductive walled aperture in base
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/24Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24273Structurally defined web or sheet [e.g., overall dimension, etc.] including aperture
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/24Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24273Structurally defined web or sheet [e.g., overall dimension, etc.] including aperture
    • Y10T428/24322Composite web or sheet
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/24Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y10T428/24917Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including metal layer
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/249921Web or sheet containing structurally defined element or component
    • Y10T428/249994Composite having a component wherein a constituent is liquid or is contained within preformed walls [e.g., impregnant-filled, previously void containing component, etc.]
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/249921Web or sheet containing structurally defined element or component
    • Y10T428/249994Composite having a component wherein a constituent is liquid or is contained within preformed walls [e.g., impregnant-filled, previously void containing component, etc.]
    • Y10T428/249995Constituent is in liquid form
    • Y10T428/249996Ink in pores
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T442/00Fabric [woven, knitted, or nonwoven textile or cloth, etc.]
    • Y10T442/20Coated or impregnated woven, knit, or nonwoven fabric which is not [a] associated with another preformed layer or fiber layer or, [b] with respect to woven and knit, characterized, respectively, by a particular or differential weave or knit, wherein the coating or impregnation is neither a foamed material nor a free metal or alloy layer
    • Y10T442/2475Coating or impregnation is electrical insulation-providing, -improving, or -increasing, or conductivity-reducing
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T442/00Fabric [woven, knitted, or nonwoven textile or cloth, etc.]
    • Y10T442/60Nonwoven fabric [i.e., nonwoven strand or fiber material]
    • Y10T442/674Nonwoven fabric with a preformed polymeric film or sheet
DE1994612952 1993-09-21 1994-09-20 Verbindungsteil eines Schaltungssubstrats und Verfahren zur Herstellung mehrschichtiger Schaltungssubstrate unter Verwendung dieses Teils Expired - Lifetime DE69412952T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP23451993 1993-09-21
JP24245093 1993-09-29

Publications (2)

Publication Number Publication Date
DE69412952D1 DE69412952D1 (de) 1998-10-08
DE69412952T2 true DE69412952T2 (de) 1999-05-12

Family

ID=26531606

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1994612952 Expired - Lifetime DE69412952T2 (de) 1993-09-21 1994-09-20 Verbindungsteil eines Schaltungssubstrats und Verfahren zur Herstellung mehrschichtiger Schaltungssubstrate unter Verwendung dieses Teils

Country Status (4)

Country Link
US (3) US5484647A (de)
EP (1) EP0645950B1 (de)
CN (1) CN1075338C (de)
DE (1) DE69412952T2 (de)

Families Citing this family (164)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2756075B2 (ja) * 1993-08-06 1998-05-25 三菱電機株式会社 金属ベース基板およびそれを用いた電子機器
JPH08148240A (ja) * 1994-09-20 1996-06-07 Whitaker Corp:The コネクタ
FR2726397B1 (fr) * 1994-10-28 1996-11-22 Commissariat Energie Atomique Film conducteur anisotrope pour la microconnectique
JP3311899B2 (ja) * 1995-01-20 2002-08-05 松下電器産業株式会社 回路基板及びその製造方法
US5837356A (en) * 1995-09-22 1998-11-17 Kyocera Corporation Wiring board and method for manufacturing the same
EP0774888B1 (de) 1995-11-16 2003-03-19 Matsushita Electric Industrial Co., Ltd Gedruckte Leiterplatte und ihre Anordnung
JP3241605B2 (ja) 1996-09-06 2001-12-25 松下電器産業株式会社 配線基板の製造方法並びに配線基板
US6703565B1 (en) * 1996-09-06 2004-03-09 Matsushita Electric Industrial Co., Ltd. Printed wiring board
JP3889856B2 (ja) 1997-06-30 2007-03-07 松下電器産業株式会社 突起電極付きプリント配線基板の製造方法
TW410534B (en) * 1997-07-16 2000-11-01 Matsushita Electric Ind Co Ltd Wiring board and production process for the same
US5902438A (en) * 1997-08-13 1999-05-11 Fry's Metals, Inc. Process for the formation of anisotropic conducting material
US6376049B1 (en) * 1997-10-14 2002-04-23 Ibiden Co., Ltd. Multilayer printed wiring board and its manufacturing method, and resin composition for filling through-hole
JP2974007B1 (ja) * 1997-10-20 1999-11-08 新神戸電機株式会社 被研磨物保持材及び被研磨物の製造法
US6038133A (en) * 1997-11-25 2000-03-14 Matsushita Electric Industrial Co., Ltd. Circuit component built-in module and method for producing the same
US6833613B1 (en) * 1997-12-18 2004-12-21 Micron Technology, Inc. Stacked semiconductor package having laser machined contacts
US6620731B1 (en) * 1997-12-18 2003-09-16 Micron Technology, Inc. Method for fabricating semiconductor components and interconnects with contacts on opposing sides
US6406939B1 (en) 1998-05-02 2002-06-18 Charles W. C. Lin Flip chip assembly with via interconnection
SG75841A1 (en) 1998-05-02 2000-10-24 Eriston Invest Pte Ltd Flip chip assembly with via interconnection
SG86345A1 (en) * 1998-05-14 2002-02-19 Matsushita Electric Ind Co Ltd Circuit board and method of manufacturing the same
US6565954B2 (en) 1998-05-14 2003-05-20 Matsushita Electric Industrial Co., Ltd. Circuit board and method of manufacturing the same
TWI228610B (en) * 1998-07-31 2005-03-01 Toshiba Corp Flat panel display unit
DE69932304T2 (de) 1998-11-09 2007-12-06 Ballard Power Systems Inc., Burnaby Elektrische Kontaktvorrichtung für eine Brennstoffzelle
TW444236B (en) 1998-12-17 2001-07-01 Charles Wen Chyang Lin Bumpless flip chip assembly with strips and via-fill
SG82591A1 (en) * 1998-12-17 2001-08-21 Eriston Technologies Pte Ltd Bumpless flip chip assembly with solder via
SG78324A1 (en) 1998-12-17 2001-02-20 Eriston Technologies Pte Ltd Bumpless flip chip assembly with strips-in-via and plating
JP2001007469A (ja) * 1999-06-23 2001-01-12 Sony Corp プリント配線板およびプリント配線板の製造方法
US6224965B1 (en) 1999-06-25 2001-05-01 Honeywell International Inc. Microfiber dielectrics which facilitate laser via drilling
US6245696B1 (en) 1999-06-25 2001-06-12 Honeywell International Inc. Lasable bond-ply materials for high density printed wiring boards
US7538237B2 (en) * 1999-07-02 2009-05-26 Kreido Laboratories Process for high shear gas-liquid reactions
US6742774B2 (en) * 1999-07-02 2004-06-01 Holl Technologies Company Process for high shear gas-liquid reactions
US6471392B1 (en) 2001-03-07 2002-10-29 Holl Technologies Company Methods and apparatus for materials processing
JP2001053438A (ja) * 1999-08-16 2001-02-23 Sony Corp 多層プリント配線板の製造方法
US6319829B1 (en) 1999-08-18 2001-11-20 International Business Machines Corporation Enhanced interconnection to ceramic substrates
JP4345153B2 (ja) 1999-09-27 2009-10-14 ソニー株式会社 映像表示装置の製造方法
TW506242B (en) * 1999-12-14 2002-10-11 Matsushita Electric Ind Co Ltd Multi-layered printed circuit board and method for manufacturing the same
US6871396B2 (en) 2000-02-09 2005-03-29 Matsushita Electric Industrial Co., Ltd. Transfer material for wiring substrate
TW569424B (en) * 2000-03-17 2004-01-01 Matsushita Electric Ind Co Ltd Module with embedded electric elements and the manufacturing method thereof
US6753483B2 (en) * 2000-06-14 2004-06-22 Matsushita Electric Industrial Co., Ltd. Printed circuit board and method of manufacturing the same
US6518514B2 (en) 2000-08-21 2003-02-11 Matsushita Electric Industrial Co., Ltd. Circuit board and production of the same
US6436734B1 (en) 2000-08-22 2002-08-20 Charles W. C. Lin Method of making a support circuit for a semiconductor chip assembly
US6403460B1 (en) 2000-08-22 2002-06-11 Charles W. C. Lin Method of making a semiconductor chip assembly
US6562709B1 (en) 2000-08-22 2003-05-13 Charles W. C. Lin Semiconductor chip assembly with simultaneously electroplated contact terminal and connection joint
US6402970B1 (en) 2000-08-22 2002-06-11 Charles W. C. Lin Method of making a support circuit for a semiconductor chip assembly
US6660626B1 (en) 2000-08-22 2003-12-09 Charles W. C. Lin Semiconductor chip assembly with simultaneously electrolessly plated contact terminal and connection joint
US6551861B1 (en) 2000-08-22 2003-04-22 Charles W. C. Lin Method of making a semiconductor chip assembly by joining the chip to a support circuit with an adhesive
US6350633B1 (en) 2000-08-22 2002-02-26 Charles W. C. Lin Semiconductor chip assembly with simultaneously electroplated contact terminal and connection joint
US6562657B1 (en) 2000-08-22 2003-05-13 Charles W. C. Lin Semiconductor chip assembly with simultaneously electrolessly plated contact terminal and connection joint
JP2002094200A (ja) * 2000-09-18 2002-03-29 Matsushita Electric Ind Co Ltd 回路基板用電気絶縁材と回路基板およびその製造方法
US6350632B1 (en) 2000-09-20 2002-02-26 Charles W. C. Lin Semiconductor chip assembly with ball bond connection joint
US6350386B1 (en) 2000-09-20 2002-02-26 Charles W. C. Lin Method of making a support circuit with a tapered through-hole for a semiconductor chip assembly
US6511865B1 (en) 2000-09-20 2003-01-28 Charles W. C. Lin Method for forming a ball bond connection joint on a conductive trace and conductive pad in a semiconductor chip assembly
EP1194020A3 (de) * 2000-09-27 2004-03-31 Matsushita Electric Industrial Co., Ltd. Harzplatte, Verfahren zur Herstellung einer Harzplatte, Zwischenverbindungskörper, Leiterplatte und Verfahren zur Herstellung einer Leiterplatte
US6544813B1 (en) 2000-10-02 2003-04-08 Charles W. C. Lin Method of making a semiconductor chip assembly with a conductive trace subtractively formed before and after chip attachment
US6448108B1 (en) 2000-10-02 2002-09-10 Charles W. C. Lin Method of making a semiconductor chip assembly with a conductive trace subtractively formed before and after chip attachment
US7319265B1 (en) 2000-10-13 2008-01-15 Bridge Semiconductor Corporation Semiconductor chip assembly with precision-formed metal pillar
US6984576B1 (en) 2000-10-13 2006-01-10 Bridge Semiconductor Corporation Method of connecting an additively and subtractively formed conductive trace and an insulative base to a semiconductor chip
US6872591B1 (en) 2000-10-13 2005-03-29 Bridge Semiconductor Corporation Method of making a semiconductor chip assembly with a conductive trace and a substrate
US7132741B1 (en) 2000-10-13 2006-11-07 Bridge Semiconductor Corporation Semiconductor chip assembly with carved bumped terminal
US6673710B1 (en) 2000-10-13 2004-01-06 Bridge Semiconductor Corporation Method of connecting a conductive trace and an insulative base to a semiconductor chip
US7190080B1 (en) 2000-10-13 2007-03-13 Bridge Semiconductor Corporation Semiconductor chip assembly with embedded metal pillar
US7075186B1 (en) 2000-10-13 2006-07-11 Bridge Semiconductor Corporation Semiconductor chip assembly with interlocked contact terminal
US7262082B1 (en) 2000-10-13 2007-08-28 Bridge Semiconductor Corporation Method of making a three-dimensional stacked semiconductor package with a metal pillar and a conductive interconnect in an encapsulant aperture
US6740576B1 (en) 2000-10-13 2004-05-25 Bridge Semiconductor Corporation Method of making a contact terminal with a plated metal peripheral sidewall portion for a semiconductor chip assembly
US7264991B1 (en) 2000-10-13 2007-09-04 Bridge Semiconductor Corporation Method of connecting a conductive trace to a semiconductor chip using conductive adhesive
US6576493B1 (en) 2000-10-13 2003-06-10 Bridge Semiconductor Corporation Method of connecting a conductive trace and an insulative base to a semiconductor chip using multiple etch steps
US6548393B1 (en) 2000-10-13 2003-04-15 Charles W. C. Lin Semiconductor chip assembly with hardened connection joint
US6699780B1 (en) 2000-10-13 2004-03-02 Bridge Semiconductor Corporation Method of connecting a conductive trace to a semiconductor chip using plasma undercut etching
US7129575B1 (en) 2000-10-13 2006-10-31 Bridge Semiconductor Corporation Semiconductor chip assembly with bumped metal pillar
US7414319B2 (en) * 2000-10-13 2008-08-19 Bridge Semiconductor Corporation Semiconductor chip assembly with metal containment wall and solder terminal
US7009297B1 (en) 2000-10-13 2006-03-07 Bridge Semiconductor Corporation Semiconductor chip assembly with embedded metal particle
US6492252B1 (en) 2000-10-13 2002-12-10 Bridge Semiconductor Corporation Method of connecting a bumped conductive trace to a semiconductor chip
US6949408B1 (en) 2000-10-13 2005-09-27 Bridge Semiconductor Corporation Method of connecting a conductive trace and an insulative base to a semiconductor chip using multiple etch steps
US6576539B1 (en) 2000-10-13 2003-06-10 Charles W.C. Lin Semiconductor chip assembly with interlocked conductive trace
US7129113B1 (en) 2000-10-13 2006-10-31 Bridge Semiconductor Corporation Method of making a three-dimensional stacked semiconductor package with a metal pillar in an encapsulant aperture
US6667229B1 (en) 2000-10-13 2003-12-23 Bridge Semiconductor Corporation Method of connecting a bumped compliant conductive trace and an insulative base to a semiconductor chip
US7071089B1 (en) 2000-10-13 2006-07-04 Bridge Semiconductor Corporation Method of making a semiconductor chip assembly with a carved bumped terminal
US6908788B1 (en) 2000-10-13 2005-06-21 Bridge Semiconductor Corporation Method of connecting a conductive trace to a semiconductor chip using a metal base
US6537851B1 (en) 2000-10-13 2003-03-25 Bridge Semiconductor Corporation Method of connecting a bumped compliant conductive trace to a semiconductor chip
US6440835B1 (en) 2000-10-13 2002-08-27 Charles W. C. Lin Method of connecting a conductive trace to a semiconductor chip
US7094676B1 (en) 2000-10-13 2006-08-22 Bridge Semiconductor Corporation Semiconductor chip assembly with embedded metal pillar
US6876072B1 (en) 2000-10-13 2005-04-05 Bridge Semiconductor Corporation Semiconductor chip assembly with chip in substrate cavity
US6444489B1 (en) 2000-12-15 2002-09-03 Charles W. C. Lin Semiconductor chip assembly with bumped molded substrate
TW511405B (en) * 2000-12-27 2002-11-21 Matsushita Electric Ind Co Ltd Device built-in module and manufacturing method thereof
JP3760771B2 (ja) * 2001-01-16 2006-03-29 松下電器産業株式会社 回路形成基板および回路形成基板の製造方法
JP2002232135A (ja) * 2001-01-30 2002-08-16 Matsushita Electric Ind Co Ltd 積層用両面回路基板とその製造方法及びそれを用いた多層プリント配線板
US6653170B1 (en) 2001-02-06 2003-11-25 Charles W. C. Lin Semiconductor chip assembly with elongated wire ball bonded to chip and electrolessly plated to support circuit
JP2002293979A (ja) 2001-03-30 2002-10-09 Sumitomo Chem Co Ltd 多孔質パラ配向芳香族ポリアミドフィルム、そのプリプレグならびにプリプレグを使用するプリント回路用基材
US20040170795A1 (en) * 2001-04-04 2004-09-02 Alliedsignal Inc. Lasable bond-ply materials for high density printed wiring boards
US6830806B2 (en) * 2001-04-12 2004-12-14 Kreido Laboratories Methods of manufacture of electric circuit substrates and components having multiple electric characteristics and substrates and components so manufactured
JP2002353032A (ja) * 2001-05-18 2002-12-06 Rotra Leiterplatten Produktions & Vertriebs Gmbh 多層プリント板複合物とその製造のための方法
TW569653B (en) * 2001-07-10 2004-01-01 Fujikura Ltd Multilayer wiring board assembly, multilayer wiring board assembly component and method of manufacture thereof
US7059044B2 (en) * 2001-07-18 2006-06-13 Matsushita Electric Industrial Co., Ltd. Method and material for manufacturing circuit-formed substrate
CN1229002C (zh) * 2001-07-18 2005-11-23 松下电器产业株式会社 电路形成基板及电路形成基板的制造方法
US20040185237A1 (en) * 2001-08-07 2004-09-23 Kohichiro Kawate Sheet for sealing electrical wiring
US6908318B2 (en) * 2001-08-08 2005-06-21 3M Innovative Properties Company Batch electrically connecting sheet
AU2002336510A1 (en) * 2001-09-13 2003-03-24 Holl Technologies Company Methods and apparatus for transfer of heat energy between a body surface and heat transfer fluid
US6500529B1 (en) * 2001-09-14 2002-12-31 Tonoga, Ltd. Low signal loss bonding ply for multilayer circuit boards
US6787246B2 (en) 2001-10-05 2004-09-07 Kreido Laboratories Manufacture of flat surfaced composites comprising powdered fillers in a polymer matrix
US6826830B2 (en) * 2002-02-05 2004-12-07 International Business Machines Corporation Multi-layered interconnect structure using liquid crystalline polymer dielectric
CN100550355C (zh) * 2002-02-06 2009-10-14 揖斐电株式会社 半导体芯片安装用基板及其制造方法和半导体模块
JP2004031555A (ja) * 2002-06-25 2004-01-29 Nec Corp 回路基板装置および基板間の接続方法
US7438969B2 (en) * 2002-07-10 2008-10-21 Ngk Spark Plug Co., Ltd. Filling material, multilayer wiring board, and process of producing multilayer wiring board
US7098360B2 (en) * 2002-07-16 2006-08-29 Kreido Laboratories Processes employing multiple successive chemical reaction process steps and apparatus therefore
AU2003266154B2 (en) * 2002-09-11 2009-01-22 Kreido Laboratories Methods and apparatus for high-shear mixing and reacting of materials
US6938687B2 (en) * 2002-10-03 2005-09-06 Holl Technologies Company Apparatus for transfer of heat energy between a body surface and heat transfer fluid
US6603201B1 (en) * 2002-10-23 2003-08-05 Lsi Logic Corporation Electronic substrate
WO2004060656A1 (ja) * 2003-01-06 2004-07-22 Toray Industries, Inc. 積層フィルムおよびその製造方法
US7394663B2 (en) * 2003-02-18 2008-07-01 Matsushita Electric Industrial Co., Ltd. Electronic component built-in module and method of manufacturing the same
JP2004319530A (ja) * 2003-02-28 2004-11-11 Sanyo Electric Co Ltd 光半導体装置およびその製造方法
KR100570856B1 (ko) * 2003-04-02 2006-04-12 삼성전기주식회사 병렬적 다층 인쇄회로기판 제조 방법
US7141874B2 (en) * 2003-05-14 2006-11-28 Matsushita Electric Industrial Co., Ltd. Electronic component packaging structure and method for producing the same
US20050016762A1 (en) * 2003-07-22 2005-01-27 Unitech Printed Circuit Board Corp. Method of forming a multi-layer printed circuit board and the product thereof
JP2005045150A (ja) * 2003-07-25 2005-02-17 Matsushita Electric Ind Co Ltd 中間接続用配線基材および多層配線基板、ならびにこれらの製造方法
DE602004018720D1 (de) * 2003-09-09 2009-02-12 Nitto Denko Corp Anisotrop-leitender Film , Herstellungs- und Gebrauchsverfahren
US7993983B1 (en) 2003-11-17 2011-08-09 Bridge Semiconductor Corporation Method of making a semiconductor chip assembly with chip and encapsulant grinding
US7538415B1 (en) 2003-11-20 2009-05-26 Bridge Semiconductor Corporation Semiconductor chip assembly with bumped terminal, filler and insulative base
US7425759B1 (en) 2003-11-20 2008-09-16 Bridge Semiconductor Corporation Semiconductor chip assembly with bumped terminal and filler
JP2005340687A (ja) * 2004-05-31 2005-12-08 Fujitsu Ltd 積層基板及びその製造方法、かかる積層基板を有する電子機器
DE102004045451B4 (de) 2004-09-20 2007-05-03 Atotech Deutschland Gmbh Galvanisches Verfahren zum Füllen von Durchgangslöchern mit Metallen, insbesondere von Leiterplatten mit Kupfer
JP4416616B2 (ja) * 2004-09-29 2010-02-17 株式会社リコー 電子部品実装体及び電子機器
US7750483B1 (en) 2004-11-10 2010-07-06 Bridge Semiconductor Corporation Semiconductor chip assembly with welded metal pillar and enlarged plated contact terminal
US7446419B1 (en) 2004-11-10 2008-11-04 Bridge Semiconductor Corporation Semiconductor chip assembly with welded metal pillar of stacked metal balls
US7268421B1 (en) 2004-11-10 2007-09-11 Bridge Semiconductor Corporation Semiconductor chip assembly with welded metal pillar that includes enlarged ball bond
US7786567B2 (en) * 2004-11-10 2010-08-31 Chung-Cheng Wang Substrate for electrical device and methods for making the same
JP4819033B2 (ja) * 2005-01-27 2011-11-16 パナソニック株式会社 多層回路基板の製造方法
US7286366B2 (en) * 2005-03-24 2007-10-23 Motorola, Inc. Multilayer circuit board with embedded components and method of manufacture
JP2007005246A (ja) * 2005-06-27 2007-01-11 Sumitomo Electric Ind Ltd 多孔質樹脂基材及び多層基板
JP2007012810A (ja) * 2005-06-29 2007-01-18 Renesas Technology Corp 半導体集積回路装置の製造方法
US7834273B2 (en) * 2005-07-07 2010-11-16 Ibiden Co., Ltd. Multilayer printed wiring board
US7759582B2 (en) * 2005-07-07 2010-07-20 Ibiden Co., Ltd. Multilayer printed wiring board
JP4689375B2 (ja) * 2005-07-07 2011-05-25 富士通株式会社 積層基板および該積層基板を有する電子機器
TW200706743A (en) * 2005-07-29 2007-02-16 Nichiha Co Ltd Stain-proofing agent and building board using the same
JP5073736B2 (ja) 2006-03-30 2012-11-14 アトテック・ドイチュラント・ゲーエムベーハー 孔及びキャビティの金属による電解充填法
US7811863B1 (en) 2006-10-26 2010-10-12 Bridge Semiconductor Corporation Method of making a semiconductor chip assembly with metal pillar and encapsulant grinding and heat sink attachment
US7494843B1 (en) 2006-12-26 2009-02-24 Bridge Semiconductor Corporation Method of making a semiconductor chip assembly with thermal conductor and encapsulant grinding
FR2908955A1 (fr) * 2006-11-17 2008-05-23 Novatec Sa Element ou interface d'interconnexion electrique et son procede de realisation
US7851342B2 (en) * 2007-03-30 2010-12-14 Intel Corporation In-situ formation of conductive filling material in through-silicon via
TW200906263A (en) * 2007-05-29 2009-02-01 Matsushita Electric Ind Co Ltd Circuit board and method for manufacturing the same
JP5272655B2 (ja) * 2008-10-31 2013-08-28 パナソニック株式会社 モールドモータ
JP2011029488A (ja) * 2009-07-28 2011-02-10 Kyocera Corp 配線基板
US8383948B2 (en) * 2009-09-18 2013-02-26 Ibiden Co., Ltd. Flex-rigid wiring board and method for manufacturing the same
US8933556B2 (en) * 2010-01-22 2015-01-13 Ibiden Co., Ltd. Wiring board
JP4859999B1 (ja) * 2010-12-21 2012-01-25 パナソニック株式会社 多層配線基板、多層配線基板の製造方法、及びビアペースト
JP4917668B1 (ja) * 2010-12-29 2012-04-18 パナソニック株式会社 多層配線基板、多層配線基板の製造方法
US9279051B2 (en) * 2011-09-22 2016-03-08 Elite Material Co., Ltd. Halogen-free resin composition, and copper clad laminate and printed circuit board using same
CN104409364B (zh) * 2014-11-19 2017-12-01 清华大学 转接板及其制作方法、封装结构及用于转接板的键合方法
US9666514B2 (en) * 2015-04-14 2017-05-30 Invensas Corporation High performance compliant substrate
KR102340938B1 (ko) * 2015-09-17 2021-12-20 엘지디스플레이 주식회사 표시장치와 그 접촉 저항 측정 방법
CN106304623B (zh) * 2016-08-18 2018-04-17 武汉华尚绿能科技股份有限公司 一种透明玻璃基双层电路板
CN106231819B (zh) * 2016-08-18 2019-07-19 武汉华尚绿能科技股份有限公司 一种透明玻璃基双层电路板的制备方法
JP6810617B2 (ja) * 2017-01-16 2021-01-06 富士通インターコネクトテクノロジーズ株式会社 回路基板、回路基板の製造方法及び電子装置
CN106848761B (zh) * 2017-01-20 2019-02-01 深圳市新升华电子器件有限公司 USB Type-C连接器
US10440828B2 (en) * 2017-04-14 2019-10-08 The Diller Corporation Integrated electrical component within laminate
CN109429420B (zh) * 2017-08-22 2021-11-16 宏启胜精密电子(秦皇岛)有限公司 具有电磁屏蔽功能的电路板及其制作方法
CN110322985A (zh) * 2018-03-28 2019-10-11 上海逻骅投资管理合伙企业(有限合伙) 一种导电浆料及其制备方法和用途
CN110324963A (zh) * 2018-03-28 2019-10-11 上海逻骅投资管理合伙企业(有限合伙) 导电浆料及其制备方法和用途
US11224131B2 (en) * 2018-04-04 2022-01-11 Lenovo (Singapore) Pte. Ltd. Systems and methods for surface mounting cable connections
CN110366329A (zh) * 2018-04-10 2019-10-22 电连技术股份有限公司 一种多层基板的制造方法及多层基板
CN108535928A (zh) * 2018-04-13 2018-09-14 京东方科技集团股份有限公司 一种阵列基板及其制作方法、显示面板和显示装置
CN109121284A (zh) * 2018-09-05 2019-01-01 深圳市华讯方舟太赫兹科技有限公司 应用于毫米波安检设备的单刀多掷开关电路板
CN111312680B (zh) * 2018-12-12 2022-10-28 深南电路股份有限公司 一种无芯封装基板的承载板及制备方法
EP3709779A1 (de) * 2019-03-12 2020-09-16 AT & S Austria Technologie & Systemtechnik Aktiengesellschaft Komponententräger und verfahren zur herstellung davon
CN111757593B (zh) * 2020-06-29 2023-12-22 深圳市百柔新材料技术有限公司 玻璃芯板电路板及其制备方法
CN115250565A (zh) * 2021-04-27 2022-10-28 华为技术有限公司 电路板组件及电子设备

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5278069A (en) * 1975-12-24 1977-07-01 Fuji Kinzoku Kakou Kk Printed circuit board
US4383363A (en) * 1977-09-01 1983-05-17 Sharp Kabushiki Kaisha Method of making a through-hole connector
US4657778A (en) * 1984-08-01 1987-04-14 Moran Peter L Multilayer systems and their method of production
JPS6437079A (en) * 1987-07-31 1989-02-07 Shin Kobe Electric Machinery Manufacture of through-hole printed wiring board
JPH01151293A (ja) * 1987-12-09 1989-06-14 Mari Yamazaki 多層プリント配線板の内層導通方法
US4967314A (en) * 1988-03-28 1990-10-30 Prime Computer Inc. Circuit board construction
JPH03222393A (ja) * 1990-01-26 1991-10-01 Hitachi Chem Co Ltd プリント配線板の両面回路接続方法
JPH0567869A (ja) * 1991-09-05 1993-03-19 Matsushita Electric Ind Co Ltd 電装部品接合方法並びにモジユール及び多層基板
JPH05175649A (ja) * 1991-12-25 1993-07-13 Tokuyama Soda Co Ltd 回路基板の製造方法
JP2601128B2 (ja) * 1992-05-06 1997-04-16 松下電器産業株式会社 回路形成用基板の製造方法および回路形成用基板
EP0651602B1 (de) * 1993-10-29 1999-04-07 Matsushita Electric Industrial Co., Ltd. Leitfähige Pastenzusammensetzung zum Füllen von Kontaktlöchern, Leiterplatte unter Anwendung dieser leifähigen Paste und Verfahren zur Herstellung

Also Published As

Publication number Publication date
CN1075338C (zh) 2001-11-21
EP0645950A1 (de) 1995-03-29
EP0645950B1 (de) 1998-09-02
DE69412952D1 (de) 1998-10-08
US5484647A (en) 1996-01-16
US20010003610A1 (en) 2001-06-14
US6108903A (en) 2000-08-29
CN1108026A (zh) 1995-09-06

Similar Documents

Publication Publication Date Title
DE69412952T2 (de) Verbindungsteil eines Schaltungssubstrats und Verfahren zur Herstellung mehrschichtiger Schaltungssubstrate unter Verwendung dieses Teils
DE69127582D1 (de) Verfahren zur Herstellung eines Halbleitersubstrates und Verfahren zur Herstellung einer Halbleiteranordnung unter Verwendung dieses Substrates
DE69328390D1 (de) Verfahren zur Herstellung eines mehrlagigen Substrats
DE69622412T2 (de) Verfahren zur herstellung einer elektronischen anordnung mit klebeverbindung mittels eines nachgiebigen substrats
DE3875515D1 (de) Substrat und verfahren zur herstellung eines substrates.
DE69631573D1 (de) Prepreg, Verfahren zur Herstellung und gedrucktes Leiterplattensubstrat und dessen Verwendung
DE69220892T2 (de) Verfahren zur Herstellung eines mehrschichtigen Polyimid-Verdrahtungssubstrats
DE69305939D1 (de) Verfahren zur Herstellung eines keramischen Schaltungssubstrates
DE69611453T2 (de) Verfahren zur herstellung von partikel-beschichtetem festen substrat
DE69827856D1 (de) Verfahren zur Herstellung eines bedruckten Substrats
DE69423942T2 (de) Verfahren zur Herstellung einer Vorrichtung unter Verwendung einer Ellipsometrietechnik
DE69518548T2 (de) Verfahren zur Herstellung eines keramischen Substrates
DE69503875T2 (de) Verfahren zur herstellung eines fasersubstrats durch ueberlagerung von faserschichten und so erhaltene substrat
DE69521532D1 (de) Verfahren zur herstellung von mehrschichtiger bechichtungen
DE69323383D1 (de) Verfahren zur Herstellung eines elektronischen Bauelementes
DE59609037D1 (de) Verfahren zur herstellung von mehrschichtigen überzügen
ATE194513T1 (de) Verfahren zur herstellung von mehrschichtigen überzügen
DE69433375D1 (de) Verfahren zur Herstellung eines Dünnschichtmusters
DE69621385T2 (de) Verfahren zur herstellung einer halbleiteranordnung mit kristalldefekten
DE69309358T2 (de) Verfahren zur Herstellung eines Schaltungssubstrats
DE69306600T2 (de) Verfahren zur Herstellung eines mehrschichtigen Leitersubstrats
DE69319169D1 (de) Verfahren zur Herstellung von heteroepitaxischen dünnen Schichten und elektronischen Bauelementen
DE69307944T2 (de) Verfahren zur Herstellung von Substraten für gedruckte Schaltungen
DE69526286D1 (de) Verfahren zur Herstellung eines keramischen Substrates
DE69605570D1 (de) Verfahren zur massenproduktion von antennen mit gedruckten schaltungen

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: PANASONIC CORP., KADOMA, OSAKA, JP