DE69406563T2 - Anordnung und Verfahren zur optischen Untersuchung von Gegenständen - Google Patents
Anordnung und Verfahren zur optischen Untersuchung von GegenständenInfo
- Publication number
- DE69406563T2 DE69406563T2 DE69406563T DE69406563T DE69406563T2 DE 69406563 T2 DE69406563 T2 DE 69406563T2 DE 69406563 T DE69406563 T DE 69406563T DE 69406563 T DE69406563 T DE 69406563T DE 69406563 T2 DE69406563 T2 DE 69406563T2
- Authority
- DE
- Germany
- Prior art keywords
- axis
- objective lens
- light
- article
- illuminating system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/0004—Microscopes specially adapted for specific applications
- G02B21/0016—Technical microscopes, e.g. for inspection or measuring in industrial production processes
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IL10470893A IL104708A (en) | 1993-02-12 | 1993-02-12 | Device and method for optical inspection of items |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69406563D1 DE69406563D1 (de) | 1997-12-11 |
DE69406563T2 true DE69406563T2 (de) | 1998-03-05 |
Family
ID=11064521
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69406563T Expired - Fee Related DE69406563T2 (de) | 1993-02-12 | 1994-02-11 | Anordnung und Verfahren zur optischen Untersuchung von Gegenständen |
Country Status (6)
Country | Link |
---|---|
US (1) | US5450201A (de) |
EP (1) | EP0610945B1 (de) |
JP (1) | JPH06250092A (de) |
AT (1) | ATE160015T1 (de) |
DE (1) | DE69406563T2 (de) |
IL (1) | IL104708A (de) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10008073A1 (de) * | 2000-02-22 | 2001-08-30 | Nanofocus Materialtechnik Gmbh | Polarisationsinterferometrisches Mikroskop |
DE10222785A1 (de) * | 2002-05-23 | 2003-12-11 | Wendlandt Erhard | Verfahren und Vorrichtung zur Probenuntersuchung |
DE102009053908A1 (de) | 2009-11-20 | 2011-05-26 | Hönig, Dirk, Dr. | Reflexionsmikroskop |
Families Citing this family (40)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6734967B1 (en) | 1995-01-19 | 2004-05-11 | Kla-Tencor Technologies Corporation | Focused beam spectroscopic ellipsometry method and system |
US5608526A (en) * | 1995-01-19 | 1997-03-04 | Tencor Instruments | Focused beam spectroscopic ellipsometry method and system |
DE19708036C2 (de) * | 1997-02-27 | 2000-06-29 | Gunther Elender | Ellipsometrisches Mikroskop |
US6483580B1 (en) | 1998-03-06 | 2002-11-19 | Kla-Tencor Technologies Corporation | Spectroscopic scatterometer system |
DE19827175C1 (de) | 1998-06-18 | 2000-01-27 | Leica Microsystems | Analysator-Einschub für ein Polarisationsmikroskop |
US6020966A (en) * | 1998-09-23 | 2000-02-01 | International Business Machines Corporation | Enhanced optical detection of minimum features using depolarization |
US6132044A (en) * | 1998-11-20 | 2000-10-17 | Luxottica Leasing S.P.A | Filter for a special purpose lens and method of making filter |
DE60036621T2 (de) * | 1999-08-06 | 2008-06-26 | Asahi Kasei K.K., Ltd. | Bindungsanalyseinstrumente basierend auf lichtabschwächung durch dünnschichten |
US6552783B1 (en) | 2000-06-28 | 2003-04-22 | Teradyne, Inc. | Optical system |
US7167583B1 (en) | 2000-06-28 | 2007-01-23 | Landrex Technologies Co., Ltd. | Image processing system for use with inspection systems |
US6750968B2 (en) * | 2000-10-03 | 2004-06-15 | Accent Optical Technologies, Inc. | Differential numerical aperture methods and device |
US7079245B2 (en) * | 2000-12-14 | 2006-07-18 | Mitsubishi Denki Kabushiki Kaisha | Method and apparatus for detecting gap of liquid-crystal panel and apparatus therefor |
FR2818376B1 (fr) * | 2000-12-18 | 2003-03-28 | Centre Nat Rech Scient | Dispositif de visualisation bidimensionnelle ellipsometrique d'un echantillon, procede de visualisation et procede de mesure ellipsometrique avec resolution spatiale |
US6870896B2 (en) | 2000-12-28 | 2005-03-22 | Osmic, Inc. | Dark-field phase contrast imaging |
US6804324B2 (en) * | 2001-03-01 | 2004-10-12 | Osmo, Inc. | X-ray phase contrast imaging using a fabry-perot interferometer concept |
US6700658B2 (en) | 2001-10-05 | 2004-03-02 | Electro Scientific Industries, Inc. | Method and apparatus for circuit pattern inspection |
US6862491B2 (en) * | 2002-05-22 | 2005-03-01 | Applied Materials Israel, Ltd. | System and method for process variation monitor |
US6949115B2 (en) * | 2003-10-14 | 2005-09-27 | Southland Instruments, Inc. | Polarized light analyzer |
KR101159495B1 (ko) * | 2004-03-11 | 2012-06-22 | 이코스비젼 시스팀스 엔.브이. | 파면 조정 및 향상된 3?d 측정을 위한 방법 및 장치 |
IL162199A (en) * | 2004-05-27 | 2008-04-13 | Nova Measuring Instr Ltd | Optical measurements of articles with periodic patterns |
US7515253B2 (en) * | 2005-01-12 | 2009-04-07 | Kla-Tencor Technologies Corporation | System for measuring a sample with a layer containing a periodic diffracting structure |
JP4625716B2 (ja) * | 2005-05-23 | 2011-02-02 | 株式会社日立ハイテクノロジーズ | 欠陥検査装置及び欠陥検査方法 |
US7567344B2 (en) * | 2006-05-12 | 2009-07-28 | Corning Incorporated | Apparatus and method for characterizing defects in a transparent substrate |
JP5248052B2 (ja) * | 2006-10-11 | 2013-07-31 | 日東電工株式会社 | 光学フィルムを有するシート状製品の欠点検査装置、その検査データ処理装置、その切断装置及びその製造システム |
JP5065059B2 (ja) * | 2008-01-08 | 2012-10-31 | オリンパス株式会社 | 顕微鏡 |
JP5035904B2 (ja) * | 2008-02-13 | 2012-09-26 | 国立大学法人名古屋大学 | 膜厚分布測定装置 |
CN102105777B (zh) | 2008-07-22 | 2013-03-13 | 奥博泰克有限公司 | 高效的远心光学系统 |
US9035673B2 (en) | 2010-01-25 | 2015-05-19 | Palo Alto Research Center Incorporated | Method of in-process intralayer yield detection, interlayer shunt detection and correction |
US9404872B1 (en) * | 2011-06-29 | 2016-08-02 | Kla-Tencor Corporation | Selectably configurable multiple mode spectroscopic ellipsometry |
TWI477766B (zh) | 2012-12-18 | 2015-03-21 | Ind Tech Res Inst | 檢測裝置以及檢測方法 |
JP6128902B2 (ja) * | 2013-03-08 | 2017-05-17 | 株式会社ミツトヨ | 形状測定装置 |
JP2014191057A (ja) * | 2013-03-26 | 2014-10-06 | Toppan Printing Co Ltd | Itoパターンの撮像装置及び撮像方法 |
KR101414255B1 (ko) | 2013-03-29 | 2014-07-01 | 에스엔유 프리시젼 주식회사 | Tsv 측정장치 및 측정방법 |
CN105899992B (zh) * | 2013-11-15 | 2019-11-08 | 迈克罗斯肯科技公司 | 用于标本的三维分析的方法和系统 |
DE102014114013B4 (de) | 2014-09-26 | 2024-03-21 | Carl Zeiss Meditec Ag | Medizinisch optisches Beobachtungsgerät und Verfahren zur Kontrastierung von polarisationsdrehendem Gewebe |
WO2016069794A1 (en) * | 2014-10-28 | 2016-05-06 | Mikroscan Technologies, Inc. | Microdissection viewing system |
CN104503072B (zh) * | 2014-12-23 | 2017-09-26 | 成都西图科技有限公司 | 偏光显微镜的自动偏光装置及其使用方法 |
NL2019089B1 (en) * | 2017-06-17 | 2018-12-24 | Acad Medisch Ct | Polarization microscope |
US10720354B2 (en) * | 2018-08-28 | 2020-07-21 | Axcelis Technologies, Inc. | System and method for aligning light-transmitting birefringent workpieces |
CN114371148B (zh) * | 2022-01-19 | 2022-11-08 | 之江实验室 | 一种基于零椭偏暗场照明的散射干涉成像系统及方法 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2409407A (en) * | 1943-02-22 | 1946-10-15 | Bausch & Lomb | Reflecting element for polarized light |
US3614195A (en) * | 1969-11-10 | 1971-10-19 | Bausch & Lomb | Retardation compensator plate for a polarizing microscope |
US3637280A (en) * | 1970-05-12 | 1972-01-25 | Jenoptik Jena Gmbh | Devices for high-contrast imaging of phase objects in incident-light microscopy |
JPH0820358B2 (ja) * | 1986-03-03 | 1996-03-04 | オリンパス光学工業株式会社 | 光学的記録媒体用基盤の屈折率の測定装置 |
US4906844A (en) * | 1988-08-12 | 1990-03-06 | Rockwell International Corporation | Phase sensitive optical monitor for thin film deposition |
US4866264A (en) * | 1988-10-31 | 1989-09-12 | Northrop Corporation | Method and apparatus for measuring non-reciprocal loss of thin magnetic films and magnetic mirrors |
US4999014A (en) * | 1989-05-04 | 1991-03-12 | Therma-Wave, Inc. | Method and apparatus for measuring thickness of thin films |
US5042951A (en) * | 1989-09-19 | 1991-08-27 | Therma-Wave, Inc. | High resolution ellipsometric apparatus |
DE4017935A1 (de) * | 1990-06-05 | 1991-12-12 | Leonhardt Klaus Prof Dr | Mikro-ellipso-profilometrie |
IL96483A (en) * | 1990-11-27 | 1995-07-31 | Orbotech Ltd | Optical inspection method and apparatus |
WO1992012404A1 (en) * | 1991-01-11 | 1992-07-23 | Rudolph Research Corporation | Simultaneous multiple angle/multiple wavelength ellipsometer and method |
-
1993
- 1993-02-12 IL IL10470893A patent/IL104708A/en not_active IP Right Cessation
-
1994
- 1994-02-08 US US08/193,568 patent/US5450201A/en not_active Expired - Fee Related
- 1994-02-11 AT AT94102147T patent/ATE160015T1/de not_active IP Right Cessation
- 1994-02-11 EP EP94102147A patent/EP0610945B1/de not_active Expired - Lifetime
- 1994-02-11 DE DE69406563T patent/DE69406563T2/de not_active Expired - Fee Related
- 1994-02-14 JP JP6017492A patent/JPH06250092A/ja active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10008073A1 (de) * | 2000-02-22 | 2001-08-30 | Nanofocus Materialtechnik Gmbh | Polarisationsinterferometrisches Mikroskop |
DE10008073B4 (de) * | 2000-02-22 | 2005-09-01 | Nanofocus Materialtechnik Gmbh | Polarisationsinterferometrisches Mikroskop |
DE10222785A1 (de) * | 2002-05-23 | 2003-12-11 | Wendlandt Erhard | Verfahren und Vorrichtung zur Probenuntersuchung |
DE10222785B4 (de) * | 2002-05-23 | 2004-12-16 | Wendlandt, Erhard | Verfahren und Vorrichtung zur Probenuntersuchung |
DE102009053908A1 (de) | 2009-11-20 | 2011-05-26 | Hönig, Dirk, Dr. | Reflexionsmikroskop |
Also Published As
Publication number | Publication date |
---|---|
ATE160015T1 (de) | 1997-11-15 |
DE69406563D1 (de) | 1997-12-11 |
EP0610945B1 (de) | 1997-11-05 |
JPH06250092A (ja) | 1994-09-09 |
US5450201A (en) | 1995-09-12 |
IL104708A (en) | 1995-12-31 |
EP0610945A1 (de) | 1994-08-17 |
IL104708A0 (en) | 1993-06-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |