DE69009909D1 - Gesteuertes Verfahren zur Herstellung mehrfacher optischer Rasterfilter. - Google Patents

Gesteuertes Verfahren zur Herstellung mehrfacher optischer Rasterfilter.

Info

Publication number
DE69009909D1
DE69009909D1 DE69009909T DE69009909T DE69009909D1 DE 69009909 D1 DE69009909 D1 DE 69009909D1 DE 69009909 T DE69009909 T DE 69009909T DE 69009909 T DE69009909 T DE 69009909T DE 69009909 D1 DE69009909 D1 DE 69009909D1
Authority
DE
Germany
Prior art keywords
production
multiple optical
controlled process
optical raster
filters
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69009909T
Other languages
English (en)
Other versions
DE69009909T2 (de
Inventor
James T Hall
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Raytheon Co
Original Assignee
Hughes Aircraft Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hughes Aircraft Co filed Critical Hughes Aircraft Co
Publication of DE69009909D1 publication Critical patent/DE69009909D1/de
Application granted granted Critical
Publication of DE69009909T2 publication Critical patent/DE69009909T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/289—Rugate filters
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S359/00—Optical: systems and elements
    • Y10S359/90—Methods

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Optical Filters (AREA)
DE69009909T 1989-08-17 1990-07-16 Gesteuertes Verfahren zur Herstellung mehrfacher optischer Rasterfilter. Expired - Fee Related DE69009909T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/394,909 US5009485A (en) 1989-08-17 1989-08-17 Multiple-notch rugate filters and a controlled method of manufacture thereof

Publications (2)

Publication Number Publication Date
DE69009909D1 true DE69009909D1 (de) 1994-07-21
DE69009909T2 DE69009909T2 (de) 1994-09-22

Family

ID=23560896

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69009909T Expired - Fee Related DE69009909T2 (de) 1989-08-17 1990-07-16 Gesteuertes Verfahren zur Herstellung mehrfacher optischer Rasterfilter.

Country Status (6)

Country Link
US (1) US5009485A (de)
EP (1) EP0416251B1 (de)
JP (1) JP2542114B2 (de)
KR (1) KR930007581B1 (de)
DE (1) DE69009909T2 (de)
HK (1) HK107094A (de)

Families Citing this family (39)

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US5525156A (en) * 1989-11-24 1996-06-11 Research Development Corporation Apparatus for epitaxially growing a chemical compound crystal
US5472748A (en) * 1990-10-15 1995-12-05 The United States Of America As Represented By The United States Department Of Energy Permanent laser conditioning of thin film optical materials
US5181143A (en) * 1991-10-03 1993-01-19 Rockwell International Corporation Multiple line rugate filter with index clipping
US5293548A (en) * 1992-03-25 1994-03-08 Hughes Aircraft Company Dispersive rugate coatings
US5289314A (en) * 1992-03-25 1994-02-22 Hughes Aircraft Company Coatings for laser detector etalons
GB9206463D0 (en) * 1992-03-25 1992-07-22 Marconi Gec Ltd Head-up display system
US5432638A (en) * 1992-04-03 1995-07-11 Hughes Aircraft Company Spatially tunable rugate narrow reflection band filter and applications therefor
US5488511A (en) * 1992-04-03 1996-01-30 Hughes Aircraft Company Spatially tunable rugate narrow reflection band filter
US5258872A (en) * 1992-10-01 1993-11-02 The United States Of America As Represented By The Secretary Of The Air Force Optical filter
US5354575A (en) * 1993-04-16 1994-10-11 University Of Maryland Ellipsometric approach to anti-reflection coatings of semiconductor laser amplifiers
PL178112B1 (pl) * 1993-04-16 2000-02-29 Libbey Owens Ford Co Sposób i urządzenie do nakładania powłoki na powierzchnię podłoża zwłaszcza na powierzchnię poruszającej się wstęgi gorącego szkła
EP0623834A1 (de) * 1993-05-06 1994-11-09 Hughes Aircraft Company Filter mit kontinuierlich varierendem Brechungsindex mit Unterdrückung von Oberwellen
US5330610A (en) * 1993-05-28 1994-07-19 Martin Marietta Energy Systems, Inc. Method of digital epilaxy by externally controlled closed-loop feedback
EP0665577A1 (de) * 1994-01-28 1995-08-02 Applied Materials, Inc. Verfahren und Vorrichtung zur Überwachung der Niederschlagsrate von Schichten während physikalischem Dampf-Niederschlag
US5549756A (en) * 1994-02-02 1996-08-27 Applied Materials, Inc. Optical pyrometer for a thin film deposition system
US5928713A (en) * 1994-09-22 1999-07-27 United States Of America As Represented By The Secretary Of The Air Force Method for fabricating a gradient refractive index optical filter
US5472505A (en) * 1994-12-19 1995-12-05 Electronics & Telecommunications Research Institute Apparatus for monitoring films during MOCVD
USH1572H (en) * 1995-01-03 1996-08-06 The United States Of America As Represented By The Secretary Of The Air Force Wavelength stabilizing laser mirror
US5724189A (en) * 1995-12-15 1998-03-03 Mcdonnell Douglas Corporation Methods and apparatus for creating an aspheric optical element and the aspheric optical elements formed thereby
US5871805A (en) * 1996-04-08 1999-02-16 Lemelson; Jerome Computer controlled vapor deposition processes
US6162488A (en) * 1996-05-14 2000-12-19 Boston University Method for closed loop control of chemical vapor deposition process
DE19747597B4 (de) * 1997-02-12 2006-10-05 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung zur Darstellung statischer und bewegter Bilder unter Verwendung einer Bildwand, Bildwand sowie Verfahren zur Darstellung und zur Herstellung
US6038525A (en) * 1997-04-30 2000-03-14 Southwest Research Institute Process control for pulsed laser deposition using raman spectroscopy
US6453264B1 (en) 1997-04-30 2002-09-17 Southwest Research Institute Surface flaw detection using spatial raman-based imaging
US6342265B1 (en) 1997-08-20 2002-01-29 Triumf Apparatus and method for in-situ thickness and stoichiometry measurement of thin films
US6179039B1 (en) 1999-03-25 2001-01-30 Visteon Global Technologies, Inc. Method of reducing distortion in a spray formed rapid tool
EP1229356A3 (de) * 2001-01-31 2004-01-21 Planar Systems, Inc. Verfahren und Vorrichtung zur Herstellung von optischen Filtern
JP3848571B2 (ja) * 2001-12-28 2006-11-22 Ｈｏｙａ株式会社 薄膜形成方法及び装置
TWI315091B (en) * 2001-12-31 2009-09-21 Tokyo Electron Limite Method of fault detection for material process system
JP2003342728A (ja) * 2002-05-24 2003-12-03 Alps Electric Co Ltd 光学薄膜の成膜装置及び成膜方法
US6956702B2 (en) * 2003-04-23 2005-10-18 Hewlett-Packard Development Company, L.P. Projector with spectral filter
FR2859485B1 (fr) * 2003-09-04 2006-09-15 Essilor Int Procede de realisation d'un traitement anti-reflets sur un substrat optique, substrat optique obtenu par ce procede et dispositif de mise en oeuvre du procede
US7901870B1 (en) 2004-05-12 2011-03-08 Cirrex Systems Llc Adjusting optical properties of optical thin films
US7565084B1 (en) 2004-09-15 2009-07-21 Wach Michael L Robustly stabilizing laser systems
US7130062B2 (en) * 2005-01-28 2006-10-31 Raytheon Company Rapid-response electron-beam deposition system having a controller utilizing leading and trailing deposition indicators
GB0516477D0 (en) * 2005-08-11 2005-09-14 Optical Reference Systems Ltd Apparatus for measuring semiconductor physical characteristics
US7903338B1 (en) 2006-07-08 2011-03-08 Cirrex Systems Llc Method and system for managing light at an optical interface
EP3208520B1 (de) * 2014-10-16 2023-05-03 Toppan Printing Co., Ltd. Quantenpunkt-schutzfolie, quantenpunktfolie damit und hintergrundbeleuchtungseinheit
CN111687143B (zh) * 2020-05-20 2021-09-24 中国民用航空飞行学院 一种飞机蒙皮激光分层除漆的实时监测控制方法及系统

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4332833A (en) * 1980-02-29 1982-06-01 Bell Telephone Laboratories, Incorporated Method for optical monitoring in materials fabrication
DE3135443A1 (de) * 1981-09-08 1983-03-24 Leybold-Heraeus GmbH, 5000 Köln Verfahren und fotometrische anordnung zur dickenmessung und -steuerung optisch wirksamer schichten
US4545646A (en) * 1983-09-02 1985-10-08 Hughes Aircraft Company Process for forming a graded index optical material and structures formed thereby
US4582431A (en) * 1983-10-11 1986-04-15 Honeywell Inc. Optical monitor for direct thickness control of transparent films
US4676646A (en) * 1985-10-15 1987-06-30 Energy Conversion Devices, Inc. Method and apparatus for controlling thickness of a layer of an optical data storage device by measuring an optical property of the layer
IL79391A (en) * 1985-08-14 1994-06-24 Hughes Aircraft Co Non-spherical patch with a stepped key and a display system that uses it
US4837044A (en) * 1987-01-23 1989-06-06 Itt Research Institute Rugate optical filter systems
US4915476A (en) * 1988-05-31 1990-04-10 Hughes Aircraft Company Single-notch rugate filters and a controlled method of manufacture thereof

Also Published As

Publication number Publication date
EP0416251B1 (de) 1994-06-15
JPH03149501A (ja) 1991-06-26
EP0416251A2 (de) 1991-03-13
HK107094A (en) 1994-10-14
KR930007581B1 (ko) 1993-08-13
EP0416251A3 (en) 1991-10-09
US5009485A (en) 1991-04-23
JP2542114B2 (ja) 1996-10-09
KR910005070A (ko) 1991-03-29
DE69009909T2 (de) 1994-09-22

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: RAYTHEON CO. (N.D.GES.D. STAATES DELAWARE), LEXING

8339 Ceased/non-payment of the annual fee