DE60334275D1 - Methode und System zur Einteilung eines Schaltkreises für optische Näherungseffektkorrekturen - Google Patents

Methode und System zur Einteilung eines Schaltkreises für optische Näherungseffektkorrekturen

Info

Publication number
DE60334275D1
DE60334275D1 DE60334275T DE60334275T DE60334275D1 DE 60334275 D1 DE60334275 D1 DE 60334275D1 DE 60334275 T DE60334275 T DE 60334275T DE 60334275 T DE60334275 T DE 60334275T DE 60334275 D1 DE60334275 D1 DE 60334275D1
Authority
DE
Germany
Prior art keywords
classifying
circuit
optical proximity
proximity effect
effect corrections
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60334275T
Other languages
English (en)
Inventor
Alexandre E Andreev
Ivan Pavisic
Lav D Ivanovic
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
LSI Corp
Original Assignee
LSI Logic Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by LSI Logic Corp filed Critical LSI Logic Corp
Application granted granted Critical
Publication of DE60334275D1 publication Critical patent/DE60334275D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70433—Layout for increasing efficiency or for compensating imaging errors, e.g. layout of exposure fields for reducing focus errors; Use of mask features for increasing efficiency or for compensating imaging errors
    • G03F7/70441—Optical proximity correction [OPC]
DE60334275T 2002-12-20 2003-11-14 Methode und System zur Einteilung eines Schaltkreises für optische Näherungseffektkorrekturen Expired - Lifetime DE60334275D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/327,304 US7093228B2 (en) 2002-12-20 2002-12-20 Method and system for classifying an integrated circuit for optical proximity correction

Publications (1)

Publication Number Publication Date
DE60334275D1 true DE60334275D1 (de) 2010-11-04

Family

ID=32393140

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60334275T Expired - Lifetime DE60334275D1 (de) 2002-12-20 2003-11-14 Methode und System zur Einteilung eines Schaltkreises für optische Näherungseffektkorrekturen

Country Status (4)

Country Link
US (1) US7093228B2 (de)
EP (1) EP1431820B1 (de)
JP (1) JP2004226965A (de)
DE (1) DE60334275D1 (de)

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Also Published As

Publication number Publication date
EP1431820A3 (de) 2004-12-29
EP1431820B1 (de) 2010-09-22
US20040123265A1 (en) 2004-06-24
US7093228B2 (en) 2006-08-15
JP2004226965A (ja) 2004-08-12
EP1431820A2 (de) 2004-06-23

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