DE60138930D1 - Mikroherstellungsverfahren für organische optische Bauteile - Google Patents
Mikroherstellungsverfahren für organische optische BauteileInfo
- Publication number
- DE60138930D1 DE60138930D1 DE60138930T DE60138930T DE60138930D1 DE 60138930 D1 DE60138930 D1 DE 60138930D1 DE 60138930 T DE60138930 T DE 60138930T DE 60138930 T DE60138930 T DE 60138930T DE 60138930 D1 DE60138930 D1 DE 60138930D1
- Authority
- DE
- Germany
- Prior art keywords
- manufacturing process
- optical components
- organic optical
- micro manufacturing
- photodefinable
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/10—Processes of additive manufacturing
- B29C64/188—Processes of additive manufacturing involving additional operations performed on the added layers, e.g. smoothing, grinding or thickness control
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
- G03C1/73—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/10—Processes of additive manufacturing
- B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
- B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
- B29C64/129—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask
- B29C64/135—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask the energy source being concentrated, e.g. scanning lasers or focused light sources
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y70/00—Materials specially adapted for additive manufacturing
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/02—Simple or compound lenses with non-spherical faces
- G02B3/06—Simple or compound lenses with non-spherical faces with cylindrical or toric faces
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
- G02B6/1221—Basic optical elements, e.g. light-guiding paths made from organic materials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/13—Integrated optical circuits characterised by the manufacturing method
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/13—Integrated optical circuits characterised by the manufacturing method
- G02B6/138—Integrated optical circuits characterised by the manufacturing method by using polymerisation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0387—Polyamides or polyimides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
- B29L2011/00—Optical elements, e.g. lenses, prisms
- B29L2011/0075—Light guides, optical cables
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y10/00—Processes of additive manufacturing
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Mechanical Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optical Integrated Circuits (AREA)
- Polymerisation Methods In General (AREA)
- Graft Or Block Polymers (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US21170100P | 2000-06-15 | 2000-06-15 |
Publications (1)
Publication Number | Publication Date |
---|---|
DE60138930D1 true DE60138930D1 (de) | 2009-07-16 |
Family
ID=22787995
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60114820T Expired - Lifetime DE60114820T2 (de) | 2000-06-15 | 2001-06-14 | Mikroherstellungsverfahren für organische optische bauteile |
DE60138930T Expired - Lifetime DE60138930D1 (de) | 2000-06-15 | 2001-06-14 | Mikroherstellungsverfahren für organische optische Bauteile |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60114820T Expired - Lifetime DE60114820T2 (de) | 2000-06-15 | 2001-06-14 | Mikroherstellungsverfahren für organische optische bauteile |
Country Status (8)
Country | Link |
---|---|
US (1) | US6855478B2 (de) |
EP (1) | EP1292852B1 (de) |
JP (1) | JP4965052B2 (de) |
KR (1) | KR100810546B1 (de) |
AT (2) | ATE433129T1 (de) |
AU (1) | AU2001266905A1 (de) |
DE (2) | DE60114820T2 (de) |
WO (1) | WO2001096915A2 (de) |
Families Citing this family (80)
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JP2004503831A (ja) * | 2000-06-15 | 2004-02-05 | スリーエム イノベイティブ プロパティズ カンパニー | マルチパス多光子吸収方法および装置 |
US7265161B2 (en) | 2002-10-02 | 2007-09-04 | 3M Innovative Properties Company | Multi-photon reactive compositions with inorganic particles and method for fabricating structures |
US7118845B2 (en) | 2000-06-15 | 2006-10-10 | 3M Innovative Properties Company | Multiphoton photochemical process and articles preparable thereby |
KR100811018B1 (ko) * | 2000-06-15 | 2008-03-14 | 쓰리엠 이노베이티브 프로퍼티즈 캄파니 | 물품에 구조를 형성 또는 추가하는 방법 |
US7381516B2 (en) | 2002-10-02 | 2008-06-03 | 3M Innovative Properties Company | Multiphoton photosensitization system |
US7005229B2 (en) | 2002-10-02 | 2006-02-28 | 3M Innovative Properties Company | Multiphoton photosensitization method |
EP1292861B1 (de) * | 2000-06-15 | 2014-11-19 | 3M Innovative Properties Company | Mehrstrahliges fotolithographisches absorptionsverfahren |
WO2001096917A2 (en) * | 2000-06-15 | 2001-12-20 | 3M Innovative Properties Company | Multiphoton curing to provide encapsulated optical elements |
JP2002316363A (ja) * | 2001-02-16 | 2002-10-29 | Fuji Photo Film Co Ltd | 光造形装置及び露光ユニット |
JP4284889B2 (ja) * | 2001-05-28 | 2009-06-24 | パナソニック電工株式会社 | 光導波路、光配線板、電気・光混載回路基板及び光導波路の製造方法 |
US20040012872A1 (en) * | 2001-06-14 | 2004-01-22 | Fleming Patrick R | Multiphoton absorption method using patterned light |
US7237893B2 (en) * | 2001-12-28 | 2007-07-03 | Chang Shiao H | Light adjustable lenses capable of post-fabrication power modification via multi-photon processes |
US6750266B2 (en) | 2001-12-28 | 2004-06-15 | 3M Innovative Properties Company | Multiphoton photosensitization system |
DE10252563A1 (de) * | 2002-06-27 | 2004-01-29 | Atotech Deutschland Gmbh | Verfahren zur Herstellung von integrierten Wellenleitern, Polymersysteme zur Herstellung solcher Wellenleiter sowie Verfahren zur Erzeugung von planaren Wellenleiterkanälen |
US7235195B2 (en) | 2002-09-06 | 2007-06-26 | Novartis Ag | Method for making opthalmic devices |
AU2002951841A0 (en) * | 2002-09-30 | 2002-10-24 | Swinburne University Of Technology | Apparatus |
US7232650B2 (en) | 2002-10-02 | 2007-06-19 | 3M Innovative Properties Company | Planar inorganic device |
JP4814522B2 (ja) * | 2002-10-16 | 2011-11-16 | ジョージア・テック・リサーチ・コーポレーション | ポリマーの使用方法 |
JP3987787B2 (ja) * | 2002-11-25 | 2007-10-10 | 日東電工株式会社 | 三次元ポリイミド光導波路の製造方法 |
US20030155667A1 (en) * | 2002-12-12 | 2003-08-21 | Devoe Robert J | Method for making or adding structures to an article |
FR2859543B1 (fr) * | 2003-09-08 | 2005-12-09 | Pascal Joffre | Systeme de fabrication d'un objet a trois dimensions dans un materiau photo polymerisable |
JP2005092177A (ja) * | 2003-09-12 | 2005-04-07 | Rohm & Haas Electronic Materials Llc | 光学部品形成方法 |
EP1723455B1 (de) * | 2003-12-05 | 2009-08-12 | 3M Innovative Properties Company | Prozess zur herstellung von photonischen kristallen |
US20050124712A1 (en) * | 2003-12-05 | 2005-06-09 | 3M Innovative Properties Company | Process for producing photonic crystals |
AT413891B (de) * | 2003-12-29 | 2006-07-15 | Austria Tech & System Tech | Leiterplattenelement mit wenigstens einem licht-wellenleiter sowie verfahren zur herstellung eines solchen leiterplattenelements |
US20060078802A1 (en) * | 2004-10-13 | 2006-04-13 | Chan Kwok P | Holographic storage medium |
US7582685B2 (en) * | 2004-12-29 | 2009-09-01 | 3M Innovative Properties Company | Multi-photon polymerizable pre-ceramic polymeric compositions |
US20060228386A1 (en) * | 2005-02-22 | 2006-10-12 | University Of Tennessee Research Foundation | Polymeric microstructures |
AR075744A1 (es) * | 2005-06-10 | 2011-04-27 | Consejo Nac Invest Cient Tec | Metodos para observacion microscopica de uno o mas objetos, calibrar aparatos de medicion de fluorescencia, realizar estudios electrofisiologicos sobre celulas hacer microestructurados sobre un sustrato imprimible, hacer modelos de proteinas sobre un soporte, separar biomoleculas sobre un soporte y |
US9069256B2 (en) * | 2005-10-03 | 2015-06-30 | Carnegie Mellon University | Method of optical fabrication of three-dimensional polymeric structures with out of plane profile control |
US7799885B2 (en) | 2005-11-30 | 2010-09-21 | Corning Incorporated | Photo or electron beam curable compositions |
US7893410B2 (en) * | 2005-12-21 | 2011-02-22 | 3M Innovative Properties Company | Method and apparatus for processing multiphoton curable photoreactive compositions |
US7583444B1 (en) | 2005-12-21 | 2009-09-01 | 3M Innovative Properties Company | Process for making microlens arrays and masterforms |
KR100741110B1 (ko) * | 2006-02-15 | 2007-07-19 | 삼성에스디아이 주식회사 | 광 파이버 및 플라즈마 디스플레이 패널의 전극 형성 방법 |
US7728955B2 (en) * | 2006-03-21 | 2010-06-01 | Asml Netherlands B.V. | Lithographic apparatus, radiation supply and device manufacturing method |
WO2007112309A2 (en) * | 2006-03-24 | 2007-10-04 | 3M Innovative Properties Company | Process for making microneedles, microneedle arrays, masters, and replication tools |
AT503585B1 (de) | 2006-05-08 | 2007-11-15 | Austria Tech & System Tech | Leiterplattenelement sowie verfahren zu dessen herstellung |
US7941013B2 (en) * | 2006-05-18 | 2011-05-10 | 3M Innovative Properties Company | Process for making light guides with extraction structures and light guides produced thereby |
US20080083886A1 (en) | 2006-09-14 | 2008-04-10 | 3M Innovative Properties Company | Optical system suitable for processing multiphoton curable photoreactive compositions |
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CN101796443A (zh) * | 2007-09-06 | 2010-08-04 | 3M创新有限公司 | 具有提供输出光区域控制的光提取结构的光导装置 |
US9102083B2 (en) | 2007-09-06 | 2015-08-11 | 3M Innovative Properties Company | Methods of forming molds and methods of forming articles using said molds |
CN101795961B (zh) * | 2007-09-06 | 2013-05-01 | 3M创新有限公司 | 用于制备微结构化制品的工具 |
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CN101946305B (zh) | 2007-12-12 | 2014-02-12 | 3M创新有限公司 | 用于制备具有改善的边缘清晰度的结构的方法 |
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US9152043B2 (en) * | 2008-05-22 | 2015-10-06 | Georgia Tech Research Corporation | Negative tone molecular glass resists and methods of making and using same |
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EP3556330A1 (de) * | 2010-03-19 | 2019-10-23 | Avedro, Inc. | System zur anwendung und überwachung einer augentherapie |
DE102010020158A1 (de) * | 2010-05-11 | 2011-11-17 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Vorrichtung sowie Verfahren zur Erzeugung dreidimensionaler Strukturen |
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DE102011050894A1 (de) * | 2011-06-07 | 2012-12-13 | Freie Universität Berlin | Verfahren zur Polymerisierung von Monomer- und/oder Oligomereinheiten durch Infrarotlichtimpulse |
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EP3089861B1 (de) | 2013-12-31 | 2020-01-22 | 3M Innovative Properties Company | Volumenbasierte gradientenindexlinse durch additive fertigung |
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EP3182184A1 (de) * | 2015-12-17 | 2017-06-21 | Universite De Haute Alsace | Verfahren zur herstellung eines selbstausgerichteten optischen leiters zwischen einer optischen quelle und einer optischen faser sowie zugehöriges kit |
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-
2001
- 2001-06-14 WO PCT/US2001/019038 patent/WO2001096915A2/en active IP Right Grant
- 2001-06-14 DE DE60114820T patent/DE60114820T2/de not_active Expired - Lifetime
- 2001-06-14 DE DE60138930T patent/DE60138930D1/de not_active Expired - Lifetime
- 2001-06-14 AT AT05020361T patent/ATE433129T1/de not_active IP Right Cessation
- 2001-06-14 US US10/297,957 patent/US6855478B2/en not_active Expired - Lifetime
- 2001-06-14 AT AT01944497T patent/ATE309553T1/de not_active IP Right Cessation
- 2001-06-14 JP JP2002510984A patent/JP4965052B2/ja not_active Expired - Fee Related
- 2001-06-14 KR KR1020027017031A patent/KR100810546B1/ko not_active IP Right Cessation
- 2001-06-14 EP EP01944497A patent/EP1292852B1/de not_active Expired - Lifetime
- 2001-06-14 AU AU2001266905A patent/AU2001266905A1/en not_active Abandoned
Also Published As
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WO2001096915A2 (en) | 2001-12-20 |
EP1292852B1 (de) | 2005-11-09 |
KR20030008219A (ko) | 2003-01-24 |
US20040126694A1 (en) | 2004-07-01 |
JP2004503413A (ja) | 2004-02-05 |
JP4965052B2 (ja) | 2012-07-04 |
ATE433129T1 (de) | 2009-06-15 |
DE60114820D1 (de) | 2005-12-15 |
AU2001266905A1 (en) | 2001-12-24 |
KR100810546B1 (ko) | 2008-03-18 |
EP1292852A2 (de) | 2003-03-19 |
WO2001096915A3 (en) | 2002-04-25 |
DE60114820T2 (de) | 2006-09-14 |
ATE309553T1 (de) | 2005-11-15 |
US6855478B2 (en) | 2005-02-15 |
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