CN102343500B - High precision collimator and processing method thereof - Google Patents
High precision collimator and processing method thereof Download PDFInfo
- Publication number
- CN102343500B CN102343500B CN201010244429.7A CN201010244429A CN102343500B CN 102343500 B CN102343500 B CN 102343500B CN 201010244429 A CN201010244429 A CN 201010244429A CN 102343500 B CN102343500 B CN 102343500B
- Authority
- CN
- China
- Prior art keywords
- tantalum piece
- tantalum
- collimater
- high precision
- piece
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000003672 processing method Methods 0.000 title claims abstract description 32
- 229910052715 tantalum Inorganic materials 0.000 claims abstract description 204
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims abstract description 203
- 238000012545 processing Methods 0.000 claims abstract description 33
- 238000000034 method Methods 0.000 claims abstract description 23
- 238000005520 cutting process Methods 0.000 claims abstract description 15
- 238000004026 adhesive bonding Methods 0.000 claims abstract description 12
- 230000000007 visual effect Effects 0.000 claims description 26
- 239000000463 material Substances 0.000 claims description 15
- 239000003292 glue Substances 0.000 claims description 11
- 229910000838 Al alloy Inorganic materials 0.000 claims description 6
- 230000015572 biosynthetic process Effects 0.000 claims description 4
- 238000001514 detection method Methods 0.000 abstract description 9
- 238000003466 welding Methods 0.000 abstract description 7
- 238000010586 diagram Methods 0.000 description 12
- 238000003754 machining Methods 0.000 description 9
- 238000005516 engineering process Methods 0.000 description 8
- 238000011160 research Methods 0.000 description 7
- 230000008901 benefit Effects 0.000 description 6
- 238000013461 design Methods 0.000 description 4
- 230000005855 radiation Effects 0.000 description 4
- 238000004458 analytical method Methods 0.000 description 3
- 238000003780 insertion Methods 0.000 description 3
- 230000037431 insertion Effects 0.000 description 3
- 238000009434 installation Methods 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 239000011733 molybdenum Substances 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 241000193935 Araneus diadematus Species 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- -1 certain thickness Cu Chemical class 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- VYQRBKCKQCRYEE-UHFFFAOYSA-N ctk1a7239 Chemical compound C12=CC=CC=C2N2CC=CC3=NC=CC1=C32 VYQRBKCKQCRYEE-UHFFFAOYSA-N 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000007123 defense Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 229910001385 heavy metal Inorganic materials 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 238000011112 process operation Methods 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Images
Abstract
The invention discloses a high precision collimator and a processing method thereof. The high precision collimator comprises a collimator body, a first-class collimating aperture and three second-class collimating apertures. In the processing of the first-class collimating aperture, after the collimator body is processed, a grid through hole is formed in the collimator body through wire cutting; and a method for processing the second-class collimating apertures comprises the following steps of: mutually inserting a first tantalum sheet and a second tantalum sheet to obtain a grid hole; welding the mutually inserted tantalum sheets through laser, and putting into a mounting hole, wherein the mounting hole is formed in the collimator body after the collimator body is processed and is used for accommodating the mutually inserted tantalum sheets to form the second-class collimating aperture; and fixing the fixed connected tantalum sheets in the mounting hole in a gluing mode. The application range of the collimator is widened, and a foundation is laid for higher precision scientific detection.
Description
Technical field
The present invention relates to a kind of collimater, relate in particular to the processing method of a kind of high precision collimator and described high precision collimator.
Background technology
High precision collimator (depth of parallelism and perpendicularity precision can guarantee the collimater within 1 jiao minute) is to be widely used in aerospace to survey, the key equipment in the field such as pulsar navigation and medicine equipment, its application principle is that by collimater, X ray is collimated and be converted to by detector can deal with data, analyse scientifically, wherein the optional material category of collimater internal grid structure is few, requirement on machining accuracy is high, and the power of applied environment, heat, the complicated conditions such as radiation, but Ge Jia research institute processing technology is various at present, poor and the machining accuracy of reproducibility is difficult to ensure, become the key issue of X-ray detection technology.
Current, China is quickening one's step and is developing Aero-Space cause, under numerous scientists' effort, obtained distinguished achievement, but at astronomical science, survey this field and still belong to exploration and Preliminary development stage, and astronomical telescope, satellite become as effective detection means and carrier the forward position that research is fallen over each other in current countries in the world, wherein main physical target is to survey universe nova, black hole and dark matter etc.Aspect civilian scientific research, as Medical CT equipment etc., also precision and the reproducibility of collimation device have proposed very high requirement to up-to-date medical device research.The research of the pulsar navigation technology of rising in recent years, more gets up the close ties such as astronomical radiation detection and national defense and military, national economy.The major way that astronomical radiation is surveyed is " collimater+detector " pattern, and by collimater, space X ray being collimated and be converted to by detector can deal with data, and then analyses scientifically.Wherein the precision of collimater, dutycycle require highly, and circumstance complications such as space background, power, heat, radiation, therefore the processing method of further investigation high precision collimator becomes extremely urgent scientific research task.
The application demand of collimater, determined that its Structural Design Requirement precision is high and complicated, main physics requires to have: according to the principle of astrosurveillance, by the detection of X ray being analyzed and the distribution of definite celestial X-ray source, collimater is as the collimation passage of X ray, require its collimating aperture inner side to be formed by metals such as certain thickness Cu, Ta, Au, region and angle incident that light is limited with collimating aperture, thus facilitate detection study; And generally survey background and dutycycle index all requires the quality of collimater as far as possible little, thus improving detection efficient, the lightweight of space flight and spatial limitation require collimater quality and volume all to limit within the specific limits; Collimater will be mated use with detector, and collimating aperture should be corresponding one by one with detector area, just can complete detection process; The pointing accuracy of collimater is determining the detection accuracy of satellite, so the processing of collimater and installation accuracy requirement are very high; These requirements make collimater become key and the vitals of a plurality of projects.Especially for undersized collimating aperture processing technology and measuring technique, be the Focal point and difficult point of collimater design and technical study.
In addition, the collimater of prior art is generally all designed to square grid hole (or claiming grid through hole), and light or various ray are realized to the effect collimating.But Ge Jia research institute processing technology is also various at present, what wherein have is designed to bow-shaped structural by tantalum piece, as shown in Figure 1, the process in its formation square grid hole as shown in Figure 2, first on the sidewall of collimating aperture, slot, the installing hole that packs arc tantalum piece into collimating aperture along groove is successively to form square grid hole, and the advantage of this scheme is that assembling is more convenient, and structural rigidity is good; It is arc that shortcoming is that tantalum piece will be processed into, and need annealing fall stress concentration, but after moulding, distortion is larger, and the depth of parallelism is bad; Rounding during arc tantalum piece moulding (R angle) also cannot be ignored, and the distance of the abutting edge between R angle is larger, so the method reproducibility is poor, and machining accuracy is difficult to ensure.
Summary of the invention
Object of the present invention is for a kind of processing method of high precision collimator is provided, to solve the technical problem that reproducibility is poor, cost is high and machining accuracy is difficult to guarantee of the collimater processing method of prior art.
Another object of the present invention is for a kind of high precision collimator is provided, to solve the technical problem that reproducibility is poor, cost is high, precision is difficult to guarantee of the high precision collimator of prior art.
For achieving the above object, technical scheme of the present invention is as follows:
A kind of processing method of high precision collimator, described high precision collimator comprise collimater body with at intrinsic four collimating apertures of described collimater, described four collimating apertures comprise a first kind collimating aperture and three Equations of The Second Kind collimating apertures, and the processing of described first kind collimating aperture is by line, to cut on described collimater body and form grid through hole after described collimater body machines; The procedure of processing of described Equations of The Second Kind collimating aperture is: step S1: the first tantalum piece and the second tantalum piece are carried out to interfix formation grid hole; Step S2: after described the first tantalum piece after interfix and described the second tantalum piece being fixed and being connected by laser weld, insert in installing hole, described installing hole forms after being machined by described collimater body on described collimater body, for tantalum piece after described interfix being installed to form described Equations of The Second Kind collimating aperture; Step S3: the mode that sticks with glue is fixed on described installing hole by the tantalum piece after being fixedly connected with.
The processing method of high precision collimator of the present invention, preferred, step S1 comprises: step S11: on described the first tantalum piece and described the second tantalum piece, cutting is used for the first slot and the second slot to inserting respectively; Step S12: by mold complete described the first tantalum piece and the second tantalum piece to inserting, form rectangular grid hole, longitudinal offside of described mold and laterally offside offer respectively for inserting cannelure and the transverse groove of the first tantalum piece and the second tantalum piece; In step S2, the top of laser weld the first tantalum piece and the second tantalum piece infall.
The processing method of high precision collimator of the present invention, preferred, the material of described collimater body is LY12 type aluminium alloy, in step S1, the specification of described grid hole is 1mm * 5.47mm, and the degree of depth is 52mm, and the thickness of described the first tantalum piece and described the second tantalum piece is 0.05mm.
The processing method of high precision collimator of the present invention, preferred, described the first tantalum piece is 1mm tantalum piece, and described the second tantalum piece is 5.47mm tantalum piece, and the length of described the first slot is 14mm, and the length of described the second slot is 38mm.
The processing method of high precision collimator of the present invention, preferably, in step S3, respectively between adjacent the first tantalum piece and the first tantalum piece, put into cross key, the longitudinal key processing between the second tantalum piece and the second tantalum piece, described cross key, longitudinal key are close to four sides of described installing hole inwall and are compressed described the first tantalum piece and the second tantalum piece, and the mode that sticks with glue is fixed on described inwall by the combining structure of tantalum piece and key; Or, on described installing hole inwall, process grooving, along described grooving, pack the tantalum piece after being fixedly connected with into described installing hole, and the mode that sticks with glue is fixed on described grooving by described tantalum piece two ends.
The processing method of high precision collimator of the present invention, preferably, before carrying out described laser weld, in described mold, by put into standard gauge block in described grid hole, calibrate described grid hole, described in when carrying out described laser weld, standard gauge block is still in described grid hole, and described gauge block inserts after described grid hole lower than described grid hole top certain distance.
Another object of the present invention is realized by following technical scheme:
A kind of high precision collimator, described high precision collimator comprises collimater body and at intrinsic four collimating apertures of described collimater, described four collimating apertures comprise a first kind collimating aperture and three Equations of The Second Kind collimating apertures, described first kind collimating aperture has the grid through hole that line cutting processing forms, Equations of The Second Kind collimating aperture comprises the first tantalum piece and the second tantalum piece after the interfix of installing in installing hole and installing hole, and described the first tantalum piece is fixedly connected with by laser weld with described the second tantalum piece and is gluing in described installing hole.
High precision collimator of the present invention, preferably, between adjacent the first tantalum piece and the first tantalum piece, be provided with cross key, longitudinal key between the second tantalum piece and the second tantalum piece, described cross key, longitudinal key are close to four sides of installing hole inwall and are compressed described the first tantalum piece and the second tantalum piece, and the combining structure of tantalum piece and key is gluing in described installing hole inwall; Or, at described installing hole inwall, thering is grooving, the tantalum piece two ends after being fixedly connected with are gluing in described grooving.
High precision collimator of the present invention, preferably, the material of described collimater body is LY12 type aluminium alloy, the specification of the grid through hole of described first kind collimating aperture is 4.55mm * 4.55mm, the specification of the grid hole of described Equations of The Second Kind collimating aperture is 1mm * 5.47mm, the degree of depth is 52mm, and the thickness of described the first tantalum piece and described the second tantalum piece is 0.05mm.
High precision collimator of the present invention, preferred, on described the first tantalum piece and described the second tantalum piece, have respectively for the first slot and the second slot to slotting; Four bight grid holes and the described installing hole of described Equations of The Second Kind collimating aperture are one-body molded, and described the first tantalum piece is 1mm tantalum piece, and described the second tantalum piece is 5.47mm tantalum piece, and the length of described the first slot is 14mm, and the length of described the second slot is 38mm.
Beneficial effect of the present invention is, collimater of the present invention is small dimension, high precision collimator, in the mode of simple economy, to produce the technology of high-precision collimater in batches, realized with process processing simple to operation and can reach its required precision, processing method of the present invention is reproducible, interchangeability good, has solved the defect of the high and portable difference of the existing processing charges of collimater processing method of prior art.Innovation of the present invention is also not machine at present the collimater of small size of the present invention, high accuracy lattice structure both at home and abroad.The present invention has widened the application of collimater, for more high-precision scientific exploration lays the foundation.
Accompanying drawing explanation
Fig. 1 processes collimater arc tantalum piece used in prior art.
Fig. 2 is the installation diagram of arc tantalum piece collimater of the prior art.
Fig. 3 is the visual field layout of high precision collimator of the present invention.
Fig. 4 is the collimater body schematic diagram of the high precision collimator of first embodiment of the invention.
Fig. 5 A is the schematic diagram of the 1mm tantalum piece of high precision collimator of the present invention.
Fig. 5 B is the B portion enlarged diagram in Fig. 5 A.
Fig. 6 A is the schematic diagram of the 5.47mm tantalum piece of high precision collimator of the present invention.
Fig. 6 B is the A portion enlarged diagram in Fig. 6 A.
Fig. 7 is the tantalum piece interfix schematic diagram of high precision collimator of the present invention.
Fig. 8 is the tantalum piece interfix process schematic diagram of high precision collimator of the present invention.
Fig. 9 is the overall structure assembling schematic diagram of high precision collimator of the present invention.
Figure 10 is the installing hole undercut slots schematic diagram of the high precision collimator of second embodiment of the invention.
Figure 11 is the collimating aperture dimensional discrepancy schematic diagram of the processing method of the embodiment of the present invention.
Figure 12 is the parallelism precision schematic diagram of the processing method of the embodiment of the present invention.
The specific embodiment
The exemplary embodiments that embodies feature & benefits of the present invention will describe in detail in the following description.Be understood that the present invention can have various variations on different embodiment, it neither departs from the scope of the present invention, and explanation wherein and accompanying drawing be when the use that explain in itself, but not in order to limit the present invention.
The high precision collimator of the embodiment of the present invention, is mainly used in hard X-ray Modulation Telescope low energy region telescope project, needs to consider to install and the big or small structure that designs collimater in visual field, and visual field is wherein determined by Imaging Simulation.As shown in Figure 3, in Fig. 3, two rows are eight collimaters altogether for this telescopical visual field layout.Four visual fields of the collimater in the lower right corner are the visual field of (60 ° * 2.5 °); Seven collimaters except the collimater in the lower right corner, the visual field of the upper left of each collimater, lower-left and bottom right is the visual field of (1.1 ° * 6 °); The lower row from left to right visual field, upper right of the 3rd collimater is entirely to block visual field.And, four collimaters of upper row and two collimaters that collimater is same model of lower row left side, the visual field, upper right of each collimater of these six collimaters is the visual field of (5 ° * 5 °), the processing method of the high precision collimator of embodiments of the invention, it is exactly mainly the collimater of processing this type, the collimater of below mentioning is the collimater of the type, its upper left, lower-left and visual field, bottom right are the visual field of (1.1 ° * 6 °), and visual field, upper right is the visual field of (5 ° * 5 °).
As shown in Figure 4, collimater of the present invention comprises collimater body (or claiming collimater shell) 2 and collimating aperture 1, and collimater body 2 bottoms are collimater mounting flange 21.For processing the collimating aperture (being Equations of The Second Kind collimating aperture) of (1.1 ° * 6 °) visual field of this collimater, the lattice structure that need be 1mm * 5.47mm at the interior processing wall thickness of collimating aperture 1 0.05mm, hole dimension, and the height of collimating aperture 1 is 52mm, it is infeasible that direct machined or line cutting processing are integrated material, must adopt the foil material of the processes 0.05mm such as extension, then assemble.
Carry out first being processed, needing the material of the collimation screen of collimation device body 1 and formation grid hole to select.
LY12 type high-strength hard aluminum alloy has advantages of that quality is light, mechanical performance is high, processing cost is low, corrosion resistance is good, is the conventional materials of Aero-Space.Therefore, collimater body 2 can adopt it to do whole manufacture.
Tantalum is black gray expandable metal, has ductility, 2996 ℃ of fusing points, and 5425 ℃ of boiling points, 16.6 grams/cc of density, quality is very hard, and hardness can reach 6-6.5 (Mohs' hardness), is only second to tungsten and rhenium, occupies the 3rd.Tantalum is rich in ductility, can pull into filament, can thin foil processed.Its thermal coefficient of expansion is also very little.In addition, its toughness is very strong, also more excellent than copper.
Consider physical property, mechanical performance, material cost and difficulty of processing, plumbous and tantalum is the preferred material of collimater.Plumbous and tantalum belongs to heavy metal, and density is very high, and the collimater monomer weight that all uses them to manufacture is inevitable very large.The advantages such as wherein tantalum has X ray good absorbing, and hardness is large, good rigidly simultaneously physically require to increase dutycycle as far as possible, therefore consider and select tantalum piece that 0.05mm is thick as collimation screen.
Therefore, the high precision collimator processing method of the embodiment of the present invention, manufactures collimater body 2 with LY12, with the thick tantalum piece of 0.05mm, as collimation screen, is the best of breed of realizing collimater total technical index.
After having selected above-mentioned material, the processing method of high precision collimator of the present invention, as shown in Figure 4, will be according to the drawing of collimater body 2, the processing of device body 2 collimates, and form four collimating apertures 1, four collimating apertures comprise a first kind collimating aperture 1 and three Equations of The Second Kind collimating apertures 1, according to visual field, design, the size of the grid hole that the visual field of (1.1 ° * 6 °) is corresponding is 1mm * 5.47mm, (aforesaid grid hole is also through hole to the grid through hole 11 corresponding to visual field of (5 ° * 5 °), in order to distinguish grid (leading to) hole of two kinds of specifications, adopt different names) size be 4.55mm * 4.55mm.Visual field for (1.1 ° * 6 °) is to utilize the method that the tantalum piece after interfix is installed in the installing hole being processed to form after collimater body machines to form, be that collimating aperture structurally comprises the tantalum piece after installing hole and interfix, for the visual field of (5 ° * 5 °), take the directly way of processing, need not insert tantalum piece, directly line cuts into the hole dimension of 4.55mm * 4.55mm, and between hole, wall thickness is 0.2mm.The benefit of doing is like this that machining accuracy is high, and one of them collimating aperture need not be installed tantalum piece again, and flatness and the depth of parallelism are good; But the collimating aperture material of the visual field of (5 ° * 5 °) is LY-12 type high-strength hard aluminum alloy entirely, there is no tantalum piece, and X-ray absorbability is slightly poor, and each collimating aperture spacing is larger.
The processing method of high precision collimator of the present invention, tantalum piece interfix completes by mold, and in mold, completes the calibration of grid hole, and the tantalum piece after interfix packs into after installing hole, need fix tantalum piece with two kinds of keys.Therefore, before carrying out following steps, need have make mold, processing for the calibration grid checkerwork cell standard gauge block (specification is 1mm * 5.47mm * 51.5mm) of (or claiming hole, visual field), process and cut tantalum piece and form described two kinds of keys and (be respectively longitudinal key, specification 1.5mm * 5.47mm * 52mm; Cross key, specification is 1.5mm * 1mm * 52mm) step, it should be noted that between these four steps, and these four steps and processing collimater body form between the step of installing hole there is no whose first restriction after whom.And in the situation that forming batch machining, mold, standard gauge block can be repeatedly used, therefore can cut down finished cost.
Form crisscross lattice structure, the present invention adopts tantalum piece to realize inserting mode, and due to the thick tantalum piece of 0.05mm deformed damaged very easily, actual process operation difficulty is very large.
Will on collimater body, install between tantalum piece that 0.05mm is thick, tantalum piece and will need on tantalum piece, offer slot to inserting, described slot is through slot; Meanwhile, then two tantalum pieces complete in mold inserts installing hole to inserting, thereby also will process grooving on the inwall of mold.And be to guarantee precision, the width of grooving and slot should not surpass 0.07mm, so wire cutting technology requirement is high.Can adopt AR2300 NC wirecut EDM machine (this model line cutting off machine that for example An Dejianqi DEC in Beijing produces), its precision can reach 0.01mm, can select middling speed wire, with the molybdenum filament line of engagement cutting off machine of 0.07mm, carry out cutting operation.
As shown in Fig. 5 A-Fig. 6 B, at the first tantalum piece and the second tantalum piece, offer slot respectively.The first tantalum piece shown in Fig. 5 A and Fig. 5 B is 1mm tantalum piece, and the spacing of the first slot on it is 1mm, and the length of the first slot on it is 14mm.The second tantalum piece shown in Fig. 6 A and Fig. 6 B is 5.47mm tantalum piece, and the spacing of the second slot on it is 5.47mm, and the length of the second slot on it is 38mm.Not being both in order to meet the requirement of formed grid hole specification of slot spacing, the difference of slot length is in order to increase structural strength and the rigidity after interfix, and on the more sparse tantalum piece of slot, be also easy to offer longer slot, be convenient to the processing of slot.Slot length also can have other different values, the value such as gets respectively 10: 42,17: 35,20: 32,24: 28 all can such as the Length Ratio of the first slot and the second slot; The length of certain the first slot and the second slot also can equate, even also the length of the first slot is greater than the length of the second slot.
The interfix of tantalum piece will be by means of mold, the Main Function of mold imitates installing hole exactly, therefore mold need to have a space similar with installing hole specification, can be referred to as " imitative installing hole ", the height in this space can equal the height of collimating aperture, be 52mm, and its long and wide (or claiming longitudinal length and lateral length) can be slightly less than the length of installing hole and wide.Mold can be made the apperance of similar collimater, has four installing holes, also can only have an installing hole, and the material of mold can be selected the material identical with collimater body.On the inwall of described imitative installing hole, be processed with grooving, first the first tantalum piece inserted to described imitative installing hole along its grooving, during insertion, the first slot of the first tantalum piece upward; Then the second tantalum piece is prolonged to its grooving and insert described imitative installing hole, during insertion, the second slot of the second tantalum piece is down to inserting the first slot of the first tantalum piece, and the shape after part tantalum piece inserts as shown in Figure 7 and Figure 8.The rectangular grid hole completing by tantalum piece interfix method is standard, there is no rounding, meets the physics requirement that collimates grid hole.
At all tantalum pieces, all insert after the imitative installing hole of described mold, the operation of calibrating, the standard gauge block previously having processed is put into successively to the grid hole forming after tantalum piece interfix, if all standard gauge blocks all can be put into smoothly, perpendicularity and the depth of parallelism that grid hole is described meet the demands, meanwhile, the bending forming can be by tantalum piece interfix time of inserting also of standard gauge block is calibrated.Certainly, the processing method of high precision collimator of the present invention, the process of its calibration can not carried out in mold yet, and carries out in the installing hole of collimater.
When showing that by calibration grid hole meets the demands, be in no hurry to take out described standard gauge block, but first carry out the operation of laser weld.Now, thin-walled lattice structure in installing hole forms the frame structure that can effectively support by the enough interfix tantalum pieces of Rigidity and strength, but the connectivity problem between the first tantalum piece and the second tantalum piece can produce again, because fill any excess stock in connection seam, all can cause the loss of collimater dutycycle.The processing method of high precision collimator of the present invention, adopts laser weld mode to fix tantalum piece, and method for laser welding need not add scolder, adopts self-dissolving mode, can reach and firmly weld object, welding jail, difficult drop-off; Because need not add scolder, therefore can not cause the loss of collimater dutycycle.When carrying out laser weld, any two form the tantalum piece intersecting, and only need the top of its cross spider of welding, can guarantee the intensity that it is fixedly connected with.The welding current of laser need be debugged according to actual conditions.
When welding, described standard gauge block is to be positioned at grid hole, the specification of standard gauge block is 1mm * 5.47mm * 51.5mm, it is highly slightly less than the height of collimating aperture, the benefit of doing is like this to play the effect of calibration tantalum piece, the distance that leaves again 0.5mm facilitates laser weld, and preventing from welding standard gauge block cannot extract.
After the step of above-mentioned calibration and laser weld completes, again the tantalum piece after being fixedly connected with is taken out from mold together with standard gauge block, vertically put into installing hole, as shown in Fig. 4 and Fig. 9, four bight grids 12 in installing hole are also to process in advance and put into installing hole, or integrated with installing hole.The tantalum piece structure assembling is inserted after described installing hole together with standard gauge block, the cross key processing in advance 15 and longitudinal key 16 are put into respectively to the first tantalum piece, between the second tantalum piece, cross key 15 and longitudinal key 16 are close to four sides of collimating aperture inwall, adjust the position between tantalum piece and key, by cross key 15, longitudinal key 16 is respectively by the first parallel tantalum piece, the second tantalum piece compresses, take out described standard gauge block, with glue, tantalum piece and key (are comprised to cross key 15 and longitudinal key 16, lower same) between, between tantalum piece and installing hole inwall, between key and installing hole inwall, be fixed and be connected, also the combining structure that is about to tantalum piece and key is fixed on installing hole inwall, be fixedly connected with installing hole inwall, be equivalent to be fixedly connected with collimater body 2.Selected glue can be the rubber toughened type epoxy resin of E2019.
After completing gluing step, a complete collimater has just machined.
The above gluing mode in installing hole of the tantalum piece by after interfix can be called " key fixed form ", in addition, can also pass through " grooving mode ", and the tantalum piece after combination is gluing in installing hole.If adopted " grooving mode ", as shown in figure 10, the internal diameter of installing hole should be suitable with the internal diameter of mold, on installing hole inwall, be processed with grooving, described grooving comprises transection slot 17 and slitting slot 18, between transection slot 17, be spaced apart 1mm, between slitting slot, be spaced apart 5.47mm, after the step of above-mentioned calibration and laser weld completes, again the tantalum piece after being fixedly connected with is taken out from mold together with standard gauge block, along described grooving, vertically put into installing hole, then with glue, the two ends of tantalum piece are fixed in grooving, just completed being fixedly connected with between tantalum piece after being fixedly connected with and installing hole.
Both compare " key fixed form " and " grooving mode ", and the former introduces key the tantalum piece after being fixedly connected with is assemblied in to described installing hole without grooving, finally with glue, fixes; The latter need not process key, is at installing hole inwall processing grooving, along grooving, the tantalum piece after being fixedly connected with is assemblied in to described installing hole, but finally also with glue, fixes; The collimater line cutting processing equipment that is exactly in addition these two kinds of modes is different, during key fixed form needs wire cutting equipment coordinate the molybdenum filament of 0.07mm carry out cutting operation just can, high to the machining accuracy of key and installation accuracy requirement; The collimater of grooving mode is owing to there is no key, so linear cutting equipment is required high, need to coordinate the copper wire of 0.05mm process described grooving with slow wire feeding linear cutting equipment.
As shown in Figure 9, the collimater machining by high precision collimator processing method of the present invention is high precision collimator of the present invention in other words, there is following structure, described high precision collimator comprises collimater body 2 and collimating aperture 1, four collimating apertures 1 comprise a first kind collimating aperture and three Equations of The Second Kind collimating apertures, first kind collimating aperture 1 has the grid through hole 11 that line cutting processing forms, Equations of The Second Kind collimating aperture 1 comprises the first tantalum piece and the second tantalum piece after the interfix of installing in installing hole and installing hole, described the first tantalum piece is fixedly connected with by laser weld after forming grid hole with described the second tantalum piece interfix, in the situation that processing with " key fixed form ", as shown in Fig. 4 and Fig. 9, the high precision collimator of first embodiment of the invention, between adjacent the first tantalum piece and the first tantalum piece, between the second tantalum piece and the second tantalum piece, be provided with cross key 15, longitudinal key 16, described cross key 15, longitudinal key 16 is close to four sides of installing hole inwall and is compressed described the first tantalum piece and the second tantalum piece, the combining structure of tantalum piece and key is gluing in described installing hole inwall, in the situation that processing with " grooving mode ", as shown in figure 10, installing hole inwall has transverse groove 17 and cannelure 18, and the tantalum piece two ends after being fixedly connected with are gluing in transverse groove 17 and cannelure 18 respectively.
Described grid hole is rectangle grid hole, has respectively for the first slot and the second slot to slotting on described the first tantalum piece and described the second tantalum piece; Four bight grid holes and the described installing hole of described Equations of The Second Kind collimating aperture are one-body molded.The specification of the grid through hole 11 of described first kind collimating aperture is 4.55mm * 4.55mm, and the specification of the grid hole of described Equations of The Second Kind collimating aperture is 1mm * 5.47mm, and the degree of depth is 52mm, and the thickness of described the first tantalum piece and described the second tantalum piece is 0.05mm.Described the first tantalum piece is 1mm tantalum piece, and described the second tantalum piece is 5.47mm, and the length of described the first slot is 14mm, and the length of described the second slot is 38mm.
Finally introduce high precision collimator that the processing method of high precision collimator of the present invention processes and the precision measure of high precision collimator of the present invention.Described precision measure comprises and utilizes perpendicularity, flatness and the tantalum piece of various apparatus measures collimaters and the perpendicularity of collimater mounting flange 21 and the depth of parallelism between tantalum piece.
The precision analysis result of the high precision collimator that the processing method of high precision collimator of the present invention is processed and high precision collimator of the present invention is as shown in Figure 11 and Figure 12.Figure 11 refers to the precision of collimating aperture dimensional discrepancy, and Figure 12 refers to the precision of the depth of parallelism of tantalum piece insertion.
Can utilize autocollimator and parallel light tube to measure the depth of parallelism and perpendicularity that tantalum piece is installed.As shown in figure 11, MSD maximum standard deviation is 0.05mm to data after measurement, and lowest standard deviation is 0.0159mm, and Figure 11 is the histogram that utilizes measurement data to do.As shown in figure 12, from data, visible maximum parallel deviation value is 0.29mm, and minimum of a value is 0.0708mm; Mean value 0.0999mm, MSD maximum standard deviation is 0.064mm, lowest standard deviation is 0.022mm.
From above data, the precision of collimating aperture of the present invention is 0.05mm, and parallelism precision is 0.0999mm.The requirement on machining accuracy that meets high precision collimator.
Technical scheme of the present invention is disclosed as above by preferred embodiment.Those skilled in the art should recognize in the situation that do not depart from change and the retouching that scope and spirit of the present invention that the appended claim of the present invention discloses are done, within all belonging to the protection domain of claim of the present invention.
Claims (10)
1. the processing method of a high precision collimator, described high precision collimator is surveyed for aerospace, the incident visual field of restriction X ray, described high precision collimator comprise collimater body with at intrinsic four collimating apertures of described collimater, it is characterized in that, intrinsic described four collimating apertures of same described collimater comprise a first kind collimating aperture and three Equations of The Second Kind collimating apertures, and the processing of described first kind collimating aperture is by line, to cut on described collimater body and form grid through hole after described collimater body machines; The procedure of processing of described Equations of The Second Kind collimating aperture is:
Step S1: the first tantalum piece and the second tantalum piece are carried out to interfix formation grid hole, have respectively on described the first tantalum piece and described the second tantalum piece for a plurality of the first slots that are parallel to each other and a plurality of the second slot being parallel to each other to slotting; The length of described the first slot and described the second slot and equal described the first tantalum piece and second smooth length;
Step S2: after described the first tantalum piece after interfix and described the second tantalum piece being fixed and being connected by laser weld, insert in installing hole, described installing hole forms after being machined by described collimater body on described collimater body, for tantalum piece after described interfix being installed to form described Equations of The Second Kind collimating aperture;
Step S3: the mode that sticks with glue is fixed on described installing hole by the tantalum piece after being fixedly connected with.
2. the processing method of high precision collimator as claimed in claim 1, is characterized in that, step S1 comprises:
Step S11: cut respectively described the first slot and described the second slot on described the first tantalum piece and described the second tantalum piece;
Step S12: by mold complete described the first tantalum piece and the second tantalum piece to inserting, form rectangular grid hole, longitudinal offside of described mold and laterally offside offer respectively for inserting cannelure and the transverse groove of the first tantalum piece and the second tantalum piece;
In step S2, the top of laser weld the first tantalum piece and the second tantalum piece infall.
3. the processing method of high precision collimator as claimed in claim 1, it is characterized in that, the material of described collimater body is LY12 type aluminium alloy, in step S1, the specification of described grid hole is 1mm * 5.47mm, the degree of depth is 52mm, and the thickness of described the first tantalum piece and described the second tantalum piece is 0.05mm.
4. the processing method of high precision collimator as claimed in claim 3, is characterized in that, described the first tantalum piece is 1mm tantalum piece, and described the second tantalum piece is 5.47mm tantalum piece, and the length of described the first slot is 14mm, and the length of described the second slot is 38mm.
5. the processing method of high precision collimator as claimed in claim 2, it is characterized in that, in step S3, respectively between adjacent the first tantalum piece and the first tantalum piece, put into cross key, the longitudinal key processing between the second tantalum piece and the second tantalum piece, described cross key, longitudinal key are close to four sides of described installing hole inwall and are compressed described the first tantalum piece and the second tantalum piece, and the mode that sticks with glue is fixed on described inwall by the combining structure of tantalum piece and key;
Or, on described installing hole inwall, process grooving, along described grooving, pack the tantalum piece after being fixedly connected with into described installing hole, and the mode that sticks with glue is fixed on described grooving by described tantalum piece two ends.
6. the processing method of high precision collimator as claimed in claim 5, it is characterized in that, before carrying out described laser weld, in described mold, by put into standard gauge block in described grid hole, calibrate described grid hole, described in when carrying out described laser weld, standard gauge block is still in described grid hole, and described gauge block inserts after described grid hole lower than described grid hole top certain distance.
7. a high precision collimator, for aerospace, survey, the incident visual field of restriction X ray, it is characterized in that, described high precision collimator comprises collimater body and at intrinsic four collimating apertures of described collimater, intrinsic described four collimating apertures of same described collimater comprise a first kind collimating aperture and three Equations of The Second Kind collimating apertures, described first kind collimating aperture has the grid through hole that line cutting processing forms, Equations of The Second Kind collimating aperture comprises the first tantalum piece and the second tantalum piece after the interfix of installing in installing hole and installing hole, on described the first tantalum piece and described the second tantalum piece, have respectively for a plurality of the first slots that are parallel to each other and a plurality of the second slot being parallel to each other to slotting, the length of described the first slot and described the second slot and equal described the first tantalum piece and second smooth length, described the first tantalum piece is fixedly connected with by laser weld with described the second tantalum piece and is gluing in described installing hole.
8. high precision collimator as claimed in claim 7, it is characterized in that, between adjacent the first tantalum piece and the first tantalum piece, be provided with cross key, longitudinal key between the second tantalum piece and the second tantalum piece, described cross key, longitudinal key are close to four sides of installing hole inwall and are compressed described the first tantalum piece and the second tantalum piece, and the combining structure of tantalum piece and key is gluing in described installing hole inwall;
Or, at described installing hole inwall, thering is grooving, the tantalum piece two ends after being fixedly connected with are gluing in described grooving.
9. high precision collimator as claimed in claim 7 or 8, it is characterized in that, the material of described collimater body is LY12 type aluminium alloy, the specification of the grid through hole of described first kind collimating aperture is 4.55mm * 4.55mm, the specification of the grid hole of described Equations of The Second Kind collimating aperture is 1mm * 5.47mm, the degree of depth is 52mm, and the thickness of described the first tantalum piece and described the second tantalum piece is 0.05mm.
10. high precision collimator as claimed in claim 9, it is characterized in that, four bight grid holes and the described installing hole of described Equations of The Second Kind collimating aperture are one-body molded, described the first tantalum piece is 1mm tantalum piece, described the second tantalum piece is 5.47mm tantalum piece, the length of described the first slot is 14mm, and the length of described the second slot is 38mm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201010244429.7A CN102343500B (en) | 2010-08-04 | 2010-08-04 | High precision collimator and processing method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201010244429.7A CN102343500B (en) | 2010-08-04 | 2010-08-04 | High precision collimator and processing method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102343500A CN102343500A (en) | 2012-02-08 |
| CN102343500B true CN102343500B (en) | 2014-04-02 |
Family
ID=45542771
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201010244429.7A Active CN102343500B (en) | 2010-08-04 | 2010-08-04 | High precision collimator and processing method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN102343500B (en) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106226916A (en) * | 2016-07-26 | 2016-12-14 | 中国科学院高能物理研究所 | Optics collimator and processing method thereof |
| WO2019167146A1 (en) * | 2018-02-27 | 2019-09-06 | 株式会社ＡＮＳｅｅＮ | Collimator production method |
| RU2716142C2 (en) * | 2018-05-21 | 2020-03-06 | Российская Федерация, от имени которой выступает Государственная корпорация по атомной энергии "Росатом" | Neutron collimator |
| CN110238521B (en) * | 2019-06-26 | 2022-04-22 | 北京工业大学 | Laser precision welding device and method for collimator grid structure |
| CN112276487B (en) * | 2020-10-18 | 2022-12-06 | 西安电子工程研究所 | Processing method of terahertz waveguide piston adjusting block |
| CN114054874B (en) * | 2021-11-19 | 2022-08-16 | 厦门虹鹭钨钼工业有限公司 | High-precision 3D printing two-dimensional collimator positioning and processing method |
| CN114488554B (en) * | 2022-01-28 | 2023-03-24 | 中国科学院高能物理研究所 | Collimator suitable for Einstein probe satellite and manufacturing process thereof |
| CN115014713A (en) * | 2022-05-13 | 2022-09-06 | 中国科学院高能物理研究所 | Ultraviolet parallel light detection device and detection method for micro-channel plate collimator |
| CN115488350B (en) * | 2022-08-15 | 2024-04-09 | 无锡伽马睿电子科技有限公司 | Collimator of Spect system and processing method thereof |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4047037A (en) * | 1976-02-09 | 1977-09-06 | The Ohio State University | Gamma ray camera for nuclear medicine |
| US5099134A (en) * | 1988-05-27 | 1992-03-24 | Kabushiki Kaisha Toshiba | Collimator and a method of producing a collimator for a scintillator |
| CN2809813Y (en) * | 2005-04-19 | 2006-08-23 | 深圳市益普生医疗设备发展有限公司 | An automatic multi-field grating |
| CN201222039Y (en) * | 2008-05-09 | 2009-04-15 | 清华大学 | Equipment for examining object by forward scatter radiation |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4510823B2 (en) * | 2003-09-12 | 2010-07-28 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | Device for collimating electromagnetic radiation |
-
2010
- 2010-08-04 CN CN201010244429.7A patent/CN102343500B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4047037A (en) * | 1976-02-09 | 1977-09-06 | The Ohio State University | Gamma ray camera for nuclear medicine |
| US5099134A (en) * | 1988-05-27 | 1992-03-24 | Kabushiki Kaisha Toshiba | Collimator and a method of producing a collimator for a scintillator |
| CN2809813Y (en) * | 2005-04-19 | 2006-08-23 | 深圳市益普生医疗设备发展有限公司 | An automatic multi-field grating |
| CN201222039Y (en) * | 2008-05-09 | 2009-04-15 | 清华大学 | Equipment for examining object by forward scatter radiation |
Non-Patent Citations (4)
| Title |
|---|
| HXMT准直器方案的优化设计;金颖康等;《高能物理与核物理》;20070731;第31卷(第7期);第612-616页 * |
| 硬X射线调制望远镜准直器的有限元分析;祁技超等;《机械设计与制造》;20031231(第6期);第58-60页 * |
| 祁技超等.硬X射线调制望远镜准直器的有限元分析.《机械设计与制造》.2003,(第6期),第58-60页. |
| 金颖康等.HXMT准直器方案的优化设计.《高能物理与核物理》.2007,第31卷(第7期),第612-616页. |
Also Published As
| Publication number | Publication date |
|---|---|
| CN102343500A (en) | 2012-02-08 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN102343500B (en) | High precision collimator and processing method thereof | |
| Beltrán et al. | Rotating toroids in G10. 62–0.38, G19. 61–0.23, and G29. 96–0.02 | |
| CN103453849B (en) | The complex curved surface parts method for three-dimensional measurement that many optical sensors are collaborative and system | |
| CN108536970B (en) | Method for testing residual stress in aluminum alloy pre-stretched plate | |
| CN104647028A (en) | Digital assembly tooling of wing box | |
| CN106568379B (en) | A method of based on sterically defined survey aircraft component interface shape | |
| CN108120394A (en) | The high-speed train curved face quality determining method of flexibility | |
| CN106017352B (en) | A kind of measurement method of honeycomb core face shape | |
| CN112050733A (en) | Multi-station conversion precision improving method based on high-precision virtual standard device | |
| CN117272522B (en) | Portable aircraft curved surface skin rivet hole profile measurement system and method thereof | |
| CN109166173A (en) | More precision three-dimensional surveying and mapping data fusion methods based on BIM | |
| CN109623692B (en) | Supporting and connecting device for strength test of thin-wall capillary tube | |
| CN107977529B (en) | Weldment modeling method based on three-dimensional software | |
| CN101894182B (en) | Method for accurately acquiring section form of beam structure and corresponding sectional dimension data | |
| Cardenas et al. | Design and fabrication of opacity targets for the national ignition facility | |
| CN106323587A (en) | Monocular video high precision measuring method for wing wind tunnel test model elastic deformation | |
| CN106826393B (en) | A kind of integral panel milling deformation control method | |
| CN105203131A (en) | Orientation method of laser tracker | |
| CN110238699A (en) | Mechanical processing and positioning system and method without the large-scale double-deck complex curved surface part of benchmark | |
| CN114440765A (en) | Special-shaped component measuring and positioning device and method | |
| CN105737757B (en) | A kind of aircraft configuration line detecting method | |
| CN107243756B (en) | Support tool for inner barrel assembly of heat exchange unit of high-temperature gas cooled reactor and preparation method | |
| CN106514018A (en) | Assembly method of flexible combination fixture for laser cutting tool | |
| CN105619045B (en) | Utilize the method for fluted shape common shaft assembly tooling hanger component | |
| CN214502358U (en) | Multifunctional impact sample notch detection projection screen |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant |